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1. 发明申请

US20040057030A1 Reticle-holding pods and methods for holding thin, circular reticles, and reticle-handling systems utilizing same 失效
标题翻译：用于保持薄的圆形掩模版和使用其的掩模版处理系统的掩模保持盒和方法
公开(公告)号：US20040057030A1
公开(公告)日：2004-03-25
申请号：US10635803
申请日：2003-08-05
申请人： Nikon Corporation , Sendai Nikon Corporation
发明人： Yukiharu Okubo , Hidekazu Kikuchi
IPC分类号： G03B027/42
CPC分类号： G03F1/66 , G03F7/70741 , Y10S414/11 , Y10S414/137
摘要： Reticle-holding devices (reticle nullpodsnull) are disclosed for holding circular reticles as used microlithography systems that use circular reticles. An exemplary reticle pod includes a base and cover. Mounted to the base are multiple (desirably three) reticle-support blocks providing three respective, equally spaced, reticle-contact surfaces that support a reticle in the peripheral nullhandling zonenull of the reticle. Mounted to the inside surface of the cover are corresponding compliant pressure-application members (desirably respective flat springs terminating with respective reticle-contact members) that apply a holding force to the reticle. A respective portion of the reticle is situated between each pressure-application member and a respective reticle-support surface. Thus, the reticle, configured as a SEMI standard wafer, is stably held at three points in the handling zone of the reticle without damaging the reticle.
摘要翻译：公开了用于保持圆形掩模版的标线片保持装置（掩模版“荚”），这是使用环形掩模版的微光刻系统。示例性掩模托架包括底座和盖。安装到基座上是多个（期望地三个）掩模版支撑块，其提供三个相应的，等间隔的光罩接触表面，其支撑掩模版的外围“处理区”中的掩模版。安装到盖的内表面的是相应的柔性压力施加构件（期望地相应于各个标线接触构件的平板弹簧），其将保持力施加到掩模版。标线片的相应部分位于每个压力施加构件和相应的掩模版支撑表面之间。因此，配置为SEMI标准晶片的掩模版被稳定地保持在掩模版的处理区域中的三个点处，而不会损坏掩模版。

2. 发明申请

US20040223132A1 Mask exchanging method and exposure apparatus 失效
标题翻译：面膜交换方法和曝光装置
公开(公告)号：US20040223132A1
公开(公告)日：2004-11-11
申请号：US10781661
申请日：2004-02-20
申请人： Nikon Corporation , Sendai Nikon Corporation
发明人： Kenji Nishi , Katsunobu Ogura , Hidekazu Kikuchi
IPC分类号： G03B027/00
CPC分类号： G03F7/70733 , G03F7/70741
摘要： When a reticle stage capable of moving while holding a reticle is at a predetermined unloading position, an unloading arm performs unloading of a reticle. Also, the instant or immediately after the reticle is separated from the reticle stage by the unloading arm, the reticle stage is moved to a predetermined loading position where a reticle is loaded onto the reticle stage by a loading arm. This allows the reticle to be loaded onto the reticle stage before the unloading arm completely withdraws from the unloading position, which reduces the downtime between the retile unloading and the reticle loading. Accordingly, the throughput of the exposure apparatus can be improved, since the time required for reticle exchange is reduced.
摘要翻译：当保持掩模版时能够移动的标线片台处于预定的卸载位置时，卸载臂执行掩模版的卸载。此外，在通过卸载臂将掩模版与刻划台分隔开之后或之后，通过装载臂将标线片载物台移动到预定的装载位置，在该装载位置将掩模版装载到标线片台上。这样就可以在卸载臂从卸载位置完全退出之前，将掩模版加载到标线片台上，从而减少了沉淀物卸载与掩模版加载之间的停机时间。因此，由于减少了掩模版交换所需的时间，因此能够提高曝光装置的生产量。

3. 发明申请

US20040027552A1 Reticle manipulators and related methods for conveying thin, circular reticles as used in charged-particle-beam microlithography 失效
标题翻译：光栅操纵器和相关方法用于输送薄带圆形光罩，用于带电粒子束微光刻
公开(公告)号：US20040027552A1
公开(公告)日：2004-02-12
申请号：US10635661
申请日：2003-08-05
申请人： Nikon Corporation , Sendai Nikon Corjporation
发明人： Hidekazu Kikuchi , Akihiro Yamamoto
IPC分类号： G03B027/62
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03B27/62 , G03F7/70741 , H01L21/67766 , H01L21/68707 , Y10S414/135 , Y10S414/136 , Y10S414/14 , Y10S414/141
摘要： Robotic reticle manipulators are disclosed for use in holding and conveying, with good stability, thin, circular reticles as used in charged-particle-beam (e.g., electron-beam) microlithography. An embodiment of such a manipulator includes at least one arm configured for executing movements in the X-, Y-, and Z-directions. Connected to the distal end of the at least one arm is a U-shaped fork (as an exemplary reticle-support member) defining recessed surfaces and vacuum ports for holding the reticle at the reticle's narrow handling zone located along the periphery of the reticle. Each vacuum port includes an upwardly extending lip that defines, on its nullupwardnull-facing surface, a respective reticle-contact surface. Three such vacuum ports are provided on the fork and are situated so as to be nearly equidistantly separated from one another. Thus, as the reticle is being held and conveyed by the manipulator, the reticle is securely held to prevent reticle damage.
摘要翻译：公开了用于保持和输送具有良好稳定性的带电粒子束（例如电子束）微光刻中的薄的圆形掩模版的机器人掩模版操纵器。这种操纵器的一个实施例包括配置成执行X，Y和Z方向的运动的至少一个臂。连接到至少一个臂的远端是U形叉（作为示例性的掩模版支撑构件），其形成凹部表面和真空端口，用于将掩模版保持在沿着掩模版周边设置的掩模版的窄处理区域。每个真空端口包括向上延伸的唇缘，其在其“向上”表面上限定相应的掩模版接触表面。三个这样的真空端口设置在叉子上并且被设置成彼此几乎等距离地分开。因此，当通过操纵器保持和传送掩模版时，可以牢固地保持掩模版以防止掩模版损坏。

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