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1. 发明申请

US20040057030A1 Reticle-holding pods and methods for holding thin, circular reticles, and reticle-handling systems utilizing same 失效
标题翻译：用于保持薄的圆形掩模版和使用其的掩模版处理系统的掩模保持盒和方法
公开(公告)号：US20040057030A1
公开(公告)日：2004-03-25
申请号：US10635803
申请日：2003-08-05
申请人： Nikon Corporation , Sendai Nikon Corporation
发明人： Yukiharu Okubo , Hidekazu Kikuchi
IPC分类号： G03B027/42
CPC分类号： G03F1/66 , G03F7/70741 , Y10S414/11 , Y10S414/137
摘要： Reticle-holding devices (reticle nullpodsnull) are disclosed for holding circular reticles as used microlithography systems that use circular reticles. An exemplary reticle pod includes a base and cover. Mounted to the base are multiple (desirably three) reticle-support blocks providing three respective, equally spaced, reticle-contact surfaces that support a reticle in the peripheral nullhandling zonenull of the reticle. Mounted to the inside surface of the cover are corresponding compliant pressure-application members (desirably respective flat springs terminating with respective reticle-contact members) that apply a holding force to the reticle. A respective portion of the reticle is situated between each pressure-application member and a respective reticle-support surface. Thus, the reticle, configured as a SEMI standard wafer, is stably held at three points in the handling zone of the reticle without damaging the reticle.
摘要翻译：公开了用于保持圆形掩模版的标线片保持装置（掩模版“荚”），这是使用环形掩模版的微光刻系统。示例性掩模托架包括底座和盖。安装到基座上是多个（期望地三个）掩模版支撑块，其提供三个相应的，等间隔的光罩接触表面，其支撑掩模版的外围“处理区”中的掩模版。安装到盖的内表面的是相应的柔性压力施加构件（期望地相应于各个标线接触构件的平板弹簧），其将保持力施加到掩模版。标线片的相应部分位于每个压力施加构件和相应的掩模版支撑表面之间。因此，配置为SEMI标准晶片的掩模版被稳定地保持在掩模版的处理区域中的三个点处，而不会损坏掩模版。

2. 发明申请

US20040238740A1 Scanning device and method including electric charge movement 有权
标题翻译：包括电荷运动的扫描装置和方法
公开(公告)号：US20040238740A1
公开(公告)日：2004-12-02
申请号：US10705497
申请日：2003-11-12
申请人： Nikon Corporation
发明人： Yoshiaki Kohama , Akihiro Goto , Muneki Hamashima , Yukiharu Okubo
IPC分类号： G21K007/00 , G01N023/00
CPC分类号： H01J37/28 , H01J2237/2817
摘要： New and improved scanning device and corresponding method that include and involve a movable stage on which a specimen is positioned, irradiation means which irradiates an electron beam onto an irradiation region of the specimen, secondary beam detection means used in generating a picture of the irradiation region by detecting a secondary beam which consists of at least one of secondary electrons or reflected electrons from the irradiation region of the electron beam, an imaging electron optical system which causes imaging of the secondary beam on a detection surface of the secondary beam detection means, and which is arranged between the specimen and the secondary beam detection means. The secondary beam detection means is equipped with a fluorescent unit which is arranged on the detection surface, and which converts the secondary beam into light, and one-dimensional line sensors which have a structure arrayed in two dimensions forming electric charge by photoelectric conversion, an array imaging element which continuously adds up the electric charge of the accumulated image in a predetermined line of the line sensors, and the electric charge of the line of the image which moves accompanying the movement of the stage, and a two-dimensional imaging element which emits electric charge by means of photoelectric conversion. The scanning device and corresponding method further include and involve changeover means for selectively irradiating the light converted by means of the fluorescent unit to an imaging element which is either one of the array imaging elements and the two-dimensional imaging element.
摘要翻译：新的改进的扫描装置及其相应的方法，其包括并涉及其上放置试样的可移动台，将电子束照射到试样的照射区域上的照射装置，用于产生照射区域的图像的二次束检测装置通过检测由来自电子束的照射区域的二次电子或反射电子中的至少一种构成的次级光束，使次光束在二次光束检测装置的检测表面上成像的成像电子光学系统，以及其布置在样本和次级束检测装置之间。二次光束检测装置配备有布置在检测表面上并将次光束转换为光的荧光单元和具有通过光电转换形成电荷的二维排列的结构的一维线传感器，阵列成像元件，其连续地将累积图像的电荷累积在行传感器的预定线中，以及伴随舞台移动移动的图像线的电荷，以及二维成像元件通过光电转换发射电荷。扫描装置和相应的方法还包括并包括切换装置，用于选择性地将通过荧光单元转换的光照射到作为阵列成像元件和二维成像元件之一的成像元件。

3. 发明申请

US20030178579A1 Stage devices exhibiting reduced deformation, and microlithography systems comprising same 审中-公开
标题翻译：表现出减小的变形的阶段装置，以及包括它们的微光刻系统
公开(公告)号：US20030178579A1
公开(公告)日：2003-09-25
申请号：US10355446
申请日：2003-01-31
申请人： Nikon Corporation
发明人： Keiichi Tanaka , Yasushi Yoda , Yukiharu Okubo , Hiroaki Narushima
IPC分类号： G01J001/00
CPC分类号： G03F7/70708 , F16C23/04 , F16C32/067 , G03F7/707 , G03F7/70716 , G03F7/70816 , H01J2237/202 , H01J2237/3175
摘要： Stage apparatus are disclosed that exhibit reduced deformation that otherwise arises during assembly, as well as reduced deformation that otherwise accompanies vacuum evacuation of a vacuum chamber in which the stage apparatus is mounted. The stage apparatus include spherical static-pressure bearings situated between a stage base and the wall of the vacuum chamber to which the stage apparatus is mounted. Torque or other deformation-inducing stress otherwise exerted on the stage base and/or vacuum chamber is ameliorated by respective rotations of the spherical static-pressure bearings. By ameliorating such stress, stage deformation otherwise arising during assembly and chamber deformation otherwise arising during vacuum evacuation are reduced.
摘要翻译：展示了在装配过程中出现减小的变形的阶段装置，以及否则伴随真空室的真空抽真空的减小的变形，其中安装了平台装置。舞台装置包括位于舞台底座和安装舞台装置的真空室壁之间的球形静压轴承。通过球形静压轴承的相应旋转，可以改善施加在台架底座和/或真空室上的扭矩或其它变形诱发应力。通过改善这种应力，减少了在真空排气过程中否则出现的装配和室变形过程中出现的阶段变形。

4. 发明申请

US20020181808A1 Static pressure air bearing 有权
公开(公告)号：US20020181808A1
公开(公告)日：2002-12-05
申请号：US10205200
申请日：2002-07-26
申请人： NIKON CORPORATION
发明人： Takuma Tsuda , Shinji Shinohara , Shinobu Tokushima , Yukiharu Okubo , Toshimasa Shimoda , Douglas C. Watson , W. Thomas Novak
IPC分类号： F16C032/06
CPC分类号： F16C32/06 , B23Q1/0027 , B23Q1/38 , B23Q1/621 , F16C29/025 , F16C32/0603 , F16C33/748 , F16C2300/62 , F16C2322/39 , G03F7/70816 , Y10T29/49639 , Y10T29/49641
摘要： In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

5. 发明申请

US20020158198A1 Charged particle beam apparatus 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20020158198A1
公开(公告)日：2002-10-31
申请号：US09800481
申请日：2001-03-08
申请人： NIKON CORPORATION
发明人： Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： G21K007/00 , G01N023/00
CPC分类号： G01N23/225 , H01J37/21 , H01J37/26 , H01J2237/1501 , H01J2237/216
摘要： It is an object of the present invention to provide a charged particle beam apparatus which can avoid charge-up without reducing the dose to a sample. For achieving such an object, the charged particle beam apparatus of the present invention is a charged particle beam apparatus comprising irradiating means for irradiating a sample with a charged particle beam, and imaging means for capturing a two-dimensional image of a secondary beam generated from the sample upon irradiation with the charged particle beam; wherein the irradiating means is means for irradiating a partial region within an imaging field of view of the imaging means with the charged particle beam by shaping a cross section of the charged particle beam; the apparatus further comprising moving means for moving the partial region such that the partial region scans the imaging field of view as a whole at least once.
摘要翻译：本发明的目的是提供一种带电粒子束装置，其可以避免在不降低样品剂量的情况下充电。为了实现这一目的，本发明的带电粒子束装置是一种带电粒子束装置，其包括用于用带电粒子束照射样品的照射装置，以及用于捕获由二次光束产生的二次光束的二维图像的成像装置照射带电粒子束时的样品; 其中所述照射装置是用于通过对所述带电粒子束的横截面进行成形而用所述带电粒子束照射所述成像装置的成像视场内的部分区域的装置; 所述装置还包括用于移动所述部分区域的移动装置，使得所述部分区域整体扫描成像视场至少一次。

6. 发明申请

US20020070699A1 Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same 失效
标题翻译：包括不含气体轴承的台架装置和包括它的微光刻装置
公开(公告)号：US20020070699A1
公开(公告)日：2002-06-13
申请号：US09899946
申请日：2001-07-06
申请人： Nikon Corporation
发明人： Keiichi Tanaka , Yukiharu Okubo , Hiroaki Narushima , Yukio Kakizaki , Yasushi Yoda
IPC分类号： G05B011/00
CPC分类号： G03F7/70816 , F16C29/025 , F16C32/0618 , G03F7/70716 , G03F7/70725 , G03F7/70758 , H01J37/20 , H01J2237/20278
摘要： Stage apparatus are disclosed for holding an object (e.g., substrate or reticle, for example) in a microlithography system, especially a system for performing microlithography in a vacuum environment. The stage apparatus provides movement of a stage (intended to hold the object) in X and Y directions of a guide plane. The stage is mounted to an arm member having at least first and second ends situated symmetrically relative to the stage. The ends include linear-motor movers that interact with corresponding stators, and include gas bearings on surfaces that slide relative to other surfaces as the stage is moved within the guide plane. The linear-motor movers can be one- or two-dimensional movers and desirably allow null-direction motion of the stage. Other configurations include guide members and sliders that undergo sliding motion relative to the guide members via non-contacting gas bearings. The sliders can be driven by a combination of a linear motor and a gas cylinder, the latter assisting the driving force by the linear motor during acceleration and deceleration of the stage.
摘要翻译：公开了用于在微光刻系统中保持物体（例如，基板或掩模版）的平台装置，特别是用于在真空环境中执行微光刻的系统。舞台装置提供在导向平面的X和Y方向上的舞台（用于保持物体）的运动。平台安装到臂构件，臂构件具有至少第一和第二端相对于平台对称设置。端部包括与相应的定子相互作用的线性马达驱动器，并且当载物台在引导平面内移动时，包括在相对于其它表面滑动的表面上的气体轴承。线性马达移动器可以是一维或二维移动器，并且期望地允许载物台的θ方向运动。其他构造包括引导构件和滑块，其经由非接触气体轴承相对于引导构件经历滑动运动。滑块可以通过线性马达和气瓶的组合来驱动，后者在加速和减速阶段通过线性马达来辅助驱动力。

7. 发明申请

US20030205668A1 Charged particle beam control element, method of fabricating charged particle beam control element, and charged particle beam apparatus 有权
标题翻译：带电粒子束控制元件，带电粒子束控制元件的制造方法和带电粒子束装置
公开(公告)号：US20030205668A1
公开(公告)日：2003-11-06
申请号：US10396559
申请日：2003-03-26
申请人： Nikon Corporation
发明人： Yukiharu Okubo
IPC分类号： G01N023/225
CPC分类号： H01J37/1477
摘要： An inspection method using an electron beam. Emitted charged particles from an electron gun located inside a primary column are accelerated to form a primary beam. A cross section of the primary beam is shaped a desired shape by a primary optical system located inside the primary column. A trajectory of the primary beam is deflected using a primary deflector located inside the primary column. A sample is illuminated using the primary beam, the sample being on a stage to which a retarding voltage is applied. At least one of secondary electrons, reflected electrons or backwardly scattered electrons that are emerging from the sample on the stage are accelerated toward a second column to form a secondary beam. A trajectory of the secondary beam is deflected using a secondary deflector located inside the secondary column. The secondary beam is guided to a detector located inside the secondary column.
摘要翻译：使用电子束的检查方法。来自位于主列内部的电子枪的带电粒子被加速以形成主光束。主梁的横截面通过位于主塔内部的主光学系统成型为期望的形状。主梁的轨迹使用位于主塔内部的主偏转器进行偏转。使用主光束照射样品，样品位于施加有延迟电压的台上。从载物台上的样品出现的二次电子，反射电子或向后散射的电子中的至少一个被加速朝向第二列形成次级光束。使用位于次级柱内部的次级偏转器使次级光束的轨迹偏转。次级束被引导到位于次级柱内的检测器。

8. 发明申请

US20020089657A1 Stage devices configured for use in a vacuum environment of a charged-particle-beam microlithography apparatus 审中-公开
标题翻译：配置用于带电粒子束微光刻设备的真空环境中的阶段装置
公开(公告)号：US20020089657A1
公开(公告)日：2002-07-11
申请号：US10008689
申请日：2001-11-08
申请人： Nikon Corporation
发明人： Yukiharu Okubo
IPC分类号： G03B027/62
CPC分类号： G03F7/70716 , G03B27/62
摘要： Stage devices are disclosed for use especially in a vacuum environment as encountered in a charged-particle-beam (CPB) microlithography (exposure) apparatus. An embodiment of the stage device includes a bottom plate that serves as a guide plate providing two opposing parallel edge planes that serve as respective guide planes. A top plate and a moving table are sandwiched between the guide planes. Extending from one edge of the moving table is a sample platform desirably configured to carry at least two objects such as two reticles or two wafer substrates. Between the top surface of the bottom plate and the bottom surface of the top plate are air pads that provide near frictionless motion of the moving table relative to the guide planes. The moving table is provided with multiple (e.g., three) linear motor coils that provide motion of the moving table in two dimensions relative to the guide planes (e.g., X and Y directions) as well as about an axis extending orthogonally to the guide planes (null-direction motion).
摘要翻译：公开了用于特别是在带电粒子束（CPB）微光刻（曝光）装置中遇到的真空环境中的阶段装置。舞台装置的实施例包括底板，其用作提供用作相应引导平面的两个相对的平行边缘平面的引导板。顶板和移动台夹在导向平面之间。从移动台的一个边缘延伸的是期望配置为承载至少两个物体的样品平台，例如两个掩模版或两个晶片衬底。在底板的顶表面和顶板的底表面之间是提供移动台相对于引导平面的近无摩擦运动的气垫。移动台设置有多个（例如，三个）线性电动机线圈，其提供移动台相对于导向平面（例如，X和Y方向）两维的运动，以及围绕与引导平面垂直延伸的轴线（θ方向运动）。

9. 发明申请

US20020074939A1 Charged particle beam apparatus 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20020074939A1
公开(公告)日：2002-06-20
申请号：US09789553
申请日：2001-02-22
申请人： NIKON CORPORATION
发明人： Yukiharu Okubo
IPC分类号： H01J031/50
CPC分类号： H01J37/32431 , H01J37/22 , H01J37/3045 , H01J2237/1501 , H01J2237/2482
摘要： The object of the present invention is to provide a charged particle beam apparatus which can inspect axial offset and cross-sectional states of charged particle beams accurately and easily. For achieving such an object, the charged particle beam apparatus in accordance with the present invention comprises charged particle beam outputting means for outputting a charged particle beam; a lens barrel through which the charged particle beam passes; a mark member having a light-emitting material on a surface on a side irradiated with the charged particle beam, and an opening, the light-emitting material emitting light upon irradiation with the charged particle beam; and viewing means for viewing the light-emitting material of the mark member.
摘要翻译：本发明的目的是提供一种能够精确且容易地检测带电粒子束的轴向偏移和横截面状态的带电粒子束装置。为了实现这一目的，根据本发明的带电粒子束装置包括用于输出带电粒子束的带电粒子束输出装置; 带电粒子束穿过的镜筒; 在被照射带电粒子束的一侧的表面上具有发光材料的标记构件和开口，该发光材料在照射带电粒子束时发光; 以及用于观看标记部件的发光材料的观察装置。

10. 发明申请

US20020034345A1 Static pressure air bearing 有权
公开(公告)号：US20020034345A1
公开(公告)日：2002-03-21
申请号：US09930285
申请日：2001-08-16
申请人： NIKON CORPORATION
发明人： Takuma Tsuda , Shinji Shinohara , Shinobu Tokushima , Yukiharu Okubo , Toshimasa Shimoda , Douglas C. Watson , W. Thomas Novak
IPC分类号： F16C032/06
CPC分类号： F16C32/06 , B23Q1/0027 , B23Q1/38 , B23Q1/621 , F16C29/025 , F16C32/0603 , F16C33/748 , F16C2300/62 , F16C2322/39 , G03F7/70816 , Y10T29/49639 , Y10T29/49641
摘要： In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

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