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1. 发明授权

US5296653A Device having a multi-layered conductor structure 失效
标题翻译：具有多层导体结构的装置
公开(公告)号：US5296653A
公开(公告)日：1994-03-22
申请号：US987601
申请日：1992-12-09
申请人： Toshiya Kiyota , Mitsushi Ikeda , Meiko Ogawa , Yoshifumi Ogawa , Michio Murooka
发明人： Toshiya Kiyota , Mitsushi Ikeda , Meiko Ogawa , Yoshifumi Ogawa , Michio Murooka
IPC分类号： G02F1/1343 , G02F1/136 , G02F1/1362 , G02F1/1368 , G03G5/10 , H01B5/14 , H01L21/3205 , H01L23/52 , H01L27/146 , H01L29/78 , H01L29/786 , H01S5/042 , H05K1/00
CPC分类号： G03G5/104 , G02F1/136286 , G02F2001/13629 , H01S5/0425
摘要： A multi-layered conductor structure device has a substrate, a first conductor layer formed on the substrate, which provides an electrode or wiring, and an insulating film covering the first conductor layer and the substrate. On the insulating film, a second conductor layer is formed which comprises an indium tin oxide, and which provides an electrode or wiring. The first conductor layer is formed of an alloy of aluminum with copper, gold, boron, bismuth, cobalt, chromium, germanium, iron, molybdenum, niobium, nickel, palladium, platinum, tantalum, titanium, tungsten, and/or silver.
摘要翻译：多层导体结构器件具有衬底，形成在衬底上的第一导体层，其提供电极或布线，以及覆盖第一导体层和衬底的绝缘膜。在绝缘膜上形成包括氧化铟锡的第二导体层，并提供电极或布线。第一导体层由铝与铜，金，硼，铋，钴，铬，锗，铁，钼，铌，镍，钯，铂，钽，钛，钨和/或银的合金形成。

2. 发明授权

US5821622A Liquid crystal display device 失效
标题翻译：液晶显示装置
公开(公告)号：US5821622A
公开(公告)日：1998-10-13
申请号：US633346
申请日：1996-04-17
申请人： Yoshiko Tsuji , Mitsushi Ikeda , Hisao Toeda , Yoshifumi Ogawa , Toshiyuki Oka
发明人： Yoshiko Tsuji , Mitsushi Ikeda , Hisao Toeda , Yoshifumi Ogawa , Toshiyuki Oka
IPC分类号： G02F1/136 , H01L23/48 , H01L23/52 , H01L29/40
CPC分类号： H01L29/4908 , H01L27/124 , H01L27/1255 , H01L29/458 , G02F2001/136295 , H01L2924/0002
摘要： The present invention provides a liquid crystal display device including a plurality of address wiring lines formed of an Mo--W alloy, a plurality of data wiring lines intersecting the address wiring lines, with insulating films interposed at intersection portions of the data wiring lines and the address wiring lines, display regions having pixel electrodes arranged respectively for the intersection portions, and a plurality of switching elements provided adjacent to the intersection portions and having control electrodes connected electrically to the address wiring lines, first main electrodes connected electrically to the data wiring liens, and second main electrodes connected electrically to the pixel electrodes.
摘要翻译：本发明提供一种液晶显示装置，包括由Mo-W合金形成的多条地址布线，与地址布线相交的多条数据布线，绝缘膜夹在数据布线和地址布线，具有分别为交叉部分布置的像素电极的显示区域以及与该交点相邻设置的多个开关元件，并具有与地址布线电连接的控制电极，与数据布线留置片电连接的第一主电极和与像素电极电连接的第二主电极。

3. 发明授权

US5738948A Electrode-wiring material and electrode-wiring substrate using the same 失效
标题翻译：电极布线材料及使用其的电极布线基板
公开(公告)号：US5738948A
公开(公告)日：1998-04-14
申请号：US536608
申请日：1995-09-29
申请人： Mitsushi Ikeda , Yoshiko Tsuji , Yujiro Hara , Masaki Atsuta , Yoshifumi Ogawa , Toshiyuki Oka , Momoko Takemura
发明人： Mitsushi Ikeda , Yoshiko Tsuji , Yujiro Hara , Masaki Atsuta , Yoshifumi Ogawa , Toshiyuki Oka , Momoko Takemura
IPC分类号： G02F1/1362 , G02F1/1343 , C22C27/04
CPC分类号： G02F1/136286 , Y10T428/12826 , Y10T428/1284
摘要： The present invention discloses an electrode wiring material including at least one main element selected from the group consisting of Mo and W and an additional element selected from the group consisting of Kr and Xe in an amount of 0.0003 atomic % to 3 atomic %. The present invention further discloses an electrode wiring substrate including an electrode wiring formed on a glass substrate, wherein the electrode wiring is formed of at least one metal selected from the group consisting of Mo and W and the lattice constant of the electrode wiring material is almost equal to the lattice constant of the electrode wiring material in a bulk state.
摘要翻译：本发明公开了一种电极配线材料，其包含选自Mo和W中的至少一种主要元素和选自Kr3和Xe的另外的元素，其量为0.0003原子％至3原子％。本发明还公开了一种电极布线基板，其包括在玻璃基板上形成的电极布线，其中，所述电极布线由选自Mo和W中的至少一种金属形成，并且所述电极布线材料的晶格常数几乎为等于电极布线材料在大部分状态下的晶格常数。

4. 发明授权

US09245780B2 Vacuum processing apparatus and operating method of the same 有权
标题翻译：真空处理装置及其操作方法
公开(公告)号：US09245780B2
公开(公告)日：2016-01-26
申请号：US13592408
申请日：2012-08-23
申请人： Takahiro Shimomura , Yoshifumi Ogawa , Susumu Tauchi
发明人： Takahiro Shimomura , Yoshifumi Ogawa , Susumu Tauchi
IPC分类号： H01L21/677 , H01L21/67
CPC分类号： H01L21/67161 , H01L21/67184
摘要： A vacuum processing apparatus includes a row of containers of vacuum transfer chambers connected to each other behind a lock chamber, a wafer being transferred through depressurized inside of the row of the containers of the vacuum transfer containers, an intermediate chamber disposed between the containers of the vacuum transfer chambers, a plurality of processing units including processing containers respectively connected to left or right side walls of the containers of the vacuum transfer chambers and the wafer is processed therein, and a bypass chamber which constitutes a bypass path connecting the processing units, where only either the wafer which is being transferred from the lock chamber toward one of the processing units or the wafer which was processed in one of the processing units and is being transferred toward the lock chamber is transferred through the containers of the vacuum transfer chambers.
摘要翻译：真空处理装置包括一排在锁室后面彼此连接的真空传送室的容器，通过真空传送容器的容器排中的减压内部传送的晶片，设置在真空传送容器的容器之间的中间室在真空传送室中处理多个处理单元，包括分别连接到真空传送室的容器的左侧壁或右侧壁的处理容器和晶片，以及构成连接处理单元的旁路的旁路室，其中，只有从锁定室转移到处理单元之一的晶片或在一个处理单元中被处理并且被转移到锁定室的晶片被传送通过真空传送室的容器。

5. 发明授权

US06544379B2 Method of holding substrate and substrate holding system 失效
公开(公告)号：US06544379B2
公开(公告)日：2003-04-08
申请号：US09778780
申请日：2001-02-08
申请人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
发明人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
IPC分类号： H05H100
CPC分类号： H01L21/6835 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L2924/3025 , Y10T279/23
摘要： A method and system of holding a substrate where foreign substances on the back surface can be decreased. The substrate holding system comprises a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.

6. 发明授权

US5646489A Plasma generator with mode restricting means 失效
标题翻译：具有模式限制装置的等离子发生器
公开(公告)号：US5646489A
公开(公告)日：1997-07-08
申请号：US432861
申请日：1995-05-02
申请人： Yutaka Kakehi , Yoshinao Kawasaki , Keizo Suzuki , Kazuo Nojiri , Hiromichi Enami , Tetsunori Kaji , Seiichi Watanabe , Yoshifumi Ogawa
发明人： Yutaka Kakehi , Yoshinao Kawasaki , Keizo Suzuki , Kazuo Nojiri , Hiromichi Enami , Tetsunori Kaji , Seiichi Watanabe , Yoshifumi Ogawa
IPC分类号： C23C16/511 , H01J37/32 , H05H1/46
CPC分类号： H01J37/32229 , C23C16/511 , H01J37/32192 , H01J37/32266 , H01J37/32284
摘要： A plasma processing apparatus has a waveguide along which microwaves are propagated from a microwave generator to a plasma-forming region in a low-pressure processing chamber. The waveguide has a large cross-sectional area, to enable a large region of plasma to be achieved. Uniformity and stability of the plasma are improved by a mode restrictor which inhibits mixing of propagation modes which is otherwise liable to occur in a wide waveguide. The mode restrictor consists of electrically conductive dividers which divide the waveguide cross-section into an array of sub-guides before the plasma-forming region.
摘要翻译：等离子体处理装置具有微波从微波发生器传播到低压处理室中的等离子体形成区域的波导。波导具有大的横截面面积，以实现等离子体的大区域。等离子体的均匀性和稳定性通过抑制混合传播模式的模式限制器来改善，否则传播模式容易发生在宽波导中。模式限制器由导电分配器组成，其在等离子体形成区域之前将波导横截面分成子导子阵列。

7. 发明授权

US06676805B2 Method of holding substrate and substrate holding system 失效
标题翻译：保持基板和基板保持系统的方法
公开(公告)号：US06676805B2
公开(公告)日：2004-01-13
申请号：US10107138
申请日：2002-03-28
申请人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
发明人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
IPC分类号： H05H100
CPC分类号： H01L21/6835 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L2924/3025 , Y10T279/23
摘要： A method and system of holding a substrate where foreign substances on the back surface can be decreased. The substrate holding system comprises a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.
摘要翻译：可以减少背面上的异物的保持基板的方法和系统。基板保持系统包括：在与基板周边相对应的样品台上具有光滑表面的环形防漏表面，在基板周边内的多个接触保持部分，以及用于固定基板的静电吸引装置通过使基板的背面与环状的防漏面和接触保持部接触。基板在环状防漏面与冷却面接触，接触保持部位置于环状防漏面内。衬底的背面和冷却表面在剩余区域的大部分中彼此不接触。

8. 发明授权

US5906684A Method of holding substrate and substrate holding system 失效
标题翻译：保持基板和基板保持系统的方法
公开(公告)号：US5906684A
公开(公告)日：1999-05-25
申请号：US50417
申请日：1998-03-31
申请人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
发明人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
IPC分类号： H01L21/00 , H01L21/68 , H01L21/683 , C23C16/00 , H05H1/00
CPC分类号： H01L21/6835 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L2924/3025 , Y10T279/23
摘要： In a method of holding a substrate and a substrate holding system where, the amount of foreign substances on the back surface of the substrate can be decreased and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exposed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.
摘要翻译：在保持基板和基板保持系统的方法中，可以减少基板的背面上的异物量，并且只有少量的异物从安装台传递到基板。为此，基板保持系统具有环形防漏表面，在对应于基板的周边的样品台上提供平滑的支撑表面，多个接触保持部分抵靠在样品台上的基板上，与基板周边相对应的位置和与基板中心相对应的位置，以及静电吸引装置，用于通过使基板的背面与环状的防漏表面接触而固定基板，以及接触保持部。将基板暴露于环状防漏表面处的冷却表面和位于环形防漏表面内的位置处的接触保持部。基板的后表面和冷却表面在剩余区域的大部分中彼此不接触。

9. 发明授权

US5685684A Vacuum processing system 失效
标题翻译：真空加工系统
公开(公告)号：US5685684A
公开(公告)日：1997-11-11
申请号：US612465
申请日：1996-03-07
申请人： Shigekazu Kato , Naoyuki Tamura , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou , Kenji Nakata , Yoshifumi Ogawa
发明人： Shigekazu Kato , Naoyuki Tamura , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou , Kenji Nakata , Yoshifumi Ogawa
IPC分类号： B65G49/07 , H01L21/677 , B65H5/08
CPC分类号： H01L21/67778 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A vacuum treating apparatus having a vacuum treating chamber for treating a to-be-treated substrate in vacuum, includes a plurality of substrate cassettes which are installed in the open air and hold substrates that are to be conveyed into the vacuum treating chamber, a device for conveying the substrates between the substrate cassettes and the vacuum treating chamber, and a device which selects either that the to-be-treated substrate after treated in the vacuum treating chamber be held in the substrate cassette from which the to-be-treated substrate was taken out or that the to-be-treated substrate after treated in the vacuum treating chamber be held in another substrate cassette which is different from the substrate cassette.
摘要翻译：一种具有真空处理室的真空处理装置，其特征在于，包括：多个基板盒，其安装在所述露天空间中并保持要被输送到所述真空处理室的基板;装置用于在基板盒和真空处理室之间输送基板，以及选择在真空处理室中处理后的被处理基板被保持在待处理基板的基板盒中的装置或将真空处理室中处理后的被处理基板保持在与基板盒不同的另一基板盒中。

10. 发明授权

US06645871B2 Method of holding substrate and substrate holding system 失效
公开(公告)号：US06645871B2
公开(公告)日：2003-11-11
申请号：US10024723
申请日：2001-12-21
申请人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
发明人： Naoyuki Tamura , Kazue Takahashi , Youichi Ito , Yoshifumi Ogawa , Hiroyuki Shichida , Tsunehiko Tsubone
IPC分类号： H05H100
CPC分类号： H01L21/6835 , H01L21/67109 , H01L21/6831 , H01L21/6833 , H01L2924/3025 , Y10T279/23
摘要： A method and system of holding a substrate where foreign substances on the back surface can be decreased. The substrate holding system comprises a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.

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