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    • 3. 发明授权
    • Method of manufacturing photoelectric conversion device
    • 制造光电转换装置的方法
    • US08207011B2
    • 2012-06-26
    • US12860283
    • 2010-08-20
    • Yoshikazu HiuraRiho KataishiShunpei Yamazaki
    • Yoshikazu HiuraRiho KataishiShunpei Yamazaki
    • H01L21/00
    • H01L31/1824C23C16/45557C23C16/45565C23C16/5096H01L21/02532H01L21/0262H01L31/03921H01L31/046H01L31/0463H01L31/0465H01L31/077Y02E10/545Y02P70/521
    • Provided is a technique for manufacturing a photoelectric conversion element using a dense crystalline semiconductor film without a cavity between crystal grains. A method of manufacturing a photoelectric conversion device having a first electrode, a unit cell, and a second electrode over a substrate includes the steps of: forming a plasma region between a first electrode and a second electrode by supplying high-frequency power of 60 MHz or less to the first electrode under a condition where a pressure of a reactive gas in a chamber of a plasma CVD apparatus is set to from 450 Pa to 13332 Pa, and a distance between the first electrode and the second electrode of the plasma CVD apparatus is set to from 1 mm to 20 mm, preferably, 4 mm to 16 mm; forming deposition precursors including a crystalline semiconductor in a gas phase including the plasma region; forming a crystal nucleus having a grain size of from 5 nm to 15 nm by depositing the deposition precursors; and forming a semiconductor film having a first conductivity type, a semiconductor film effective in photoelectric conversion, or a semiconductor film having a first conductivity type in the unit cell, by growing a crystal from the crystal nucleus.
    • 本发明提供一种使用在晶粒之间没有空腔的致密结晶半导体膜的光电转换元件的制造技术。 制造在基板上具有第一电极,单元电池和第二电极的光电转换装置的方法包括以下步骤:通过提供60MHz的高频功率在第一电极和第二电极之间形成等离子体区域 等离子体CVD装置的室内的反应气体的压力设定为450Pa〜13332Pa,等离子体CVD装置的第一电极和第二电极之间的距离设定为第一电极 设定为1mm至20mm,优选为4mm至16mm; 在包括所述等离子体区域的气相中形成包括结晶半导体的沉积前体; 通过沉积沉积前体形成晶粒尺寸为5nm至15nm的晶核; 以及通过从晶核生长晶体,形成具有第一导电类型的半导体膜,有效于光电转换的半导体膜或具有第一导电类型的半导体膜。