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1. 发明申请

US20180067294A1 SCANNING MICROSCOPE 审中-公开
公开(公告)号：US20180067294A1
公开(公告)日：2018-03-08
申请号：US15692418
申请日：2017-08-31
申请人： HITACHI, LTD.
发明人： Ryoko ARAKI , Hyejin KIM , Daisuke BIZEN
IPC分类号： G02B21/00 , G01B9/04
CPC分类号： G02B21/008 , G01B9/04 , G02B21/0016 , G02B21/0032 , G02B21/0036 , G02B21/0052 , H01J37/263 , H01J37/265 , H01J37/28 , H01J2237/022 , H01J2237/244 , H01J2237/2485
摘要： A scanning microscope includes: a charged particle beam source configured to output a charged particle beam to be emitted to a sample; a detector configured to detect charged particles from the sample; and a controller configured to control the charged particle beam source and the detector, wherein the controller changes one or more variable parameters to determine a plurality of different parameter value sets, acquires a measurement result of a temporal change of absorption current in a target sample material under each of the plurality of different parameter value sets, and, based on the measurement results, selects a parameter value set for use in measurement of the target sample from the plurality of different parameter value sets.

2. 发明授权

US09673028B2 Arc management with voltage reversal and improved recovery 有权
公开(公告)号：US09673028B2
公开(公告)日：2017-06-06
申请号：US15095745
申请日：2016-04-11
申请人： Advanced Energy Industries, Inc.
发明人： Hendrik Walde , Joshua Brian Pankratz , David Christie , Brian D. Kowal
IPC分类号： G05F1/00 , H01J37/32 , H05H1/24 , H05H1/36 , H05H1/48 , H01J37/24 , H01J37/244 , H05H1/34
CPC分类号： H01J37/32944 , H01J37/24 , H01J37/244 , H01J2237/0206 , H01J2237/244 , H05H1/24 , H05H1/36 , H05H1/48 , H05H2001/3494
摘要： Systems and methods for arc handling in plasma processing operations are disclosed. The method includes providing current with a power supply to a plasma load at a first voltage polarity and energizing an energy storage device so when it is energized, the energy storage device applies a reverse polarity voltage that has a magnitude that is as least as great as the first voltage polarity. When an arc is detected, power is applied from the energy storage device to the plasma load with a reverse polarity voltage that has a polarity that is opposite of the first voltage polarity, the application of the reverse polarity voltage to the plasma load decreases a level of the current that is provided to the plasma load.

3. 发明申请

US20160189927A1 Method of Measuring Vertical Beam Profile in an Ion Implantation System Having a Vertical Beam Angle Device 有权
标题翻译：在具有垂直光束角度装置的离子植入系统中测量垂直光束轮廓的方法
公开(公告)号：US20160189927A1
公开(公告)日：2016-06-30
申请号：US14972334
申请日：2015-12-17
申请人： Axcelis Technologies, Inc.
发明人： Shu Satoh
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： H01J37/3045 , H01J37/304 , H01J37/3171 , H01J2237/244 , H01J2237/24405 , H01J2237/24542
摘要： An ion implantation system measurement system has a scan arm that rotates about an axis and a workpiece support to translate a workpiece through the ion beam. A first measurement component downstream of the scan arm provides a first signal from the ion beam. A second measurement component with a mask is coupled to the scan arm to provide a second signal from the ion beam with the rotation of the scan arm. The mask permits varying amounts of the ion radiation from the ion beam to enter a Faraday cup based on an angular orientation between the mask and the ion beam. A blocking plate selectively blocks the ion beam to the first faraday based on the rotation of the scan arm. A controller determines an angle and vertical size of the ion beam based on the first signal, second signal, and orientation between the mask and ion beam as the second measurement component rotates.
摘要翻译：离子注入系统测量系统具有围绕轴线旋转的扫描臂和工件支撑件，以使工件平移通过离子束。扫描臂下游的第一测量部件提供来自离子束的第一信号。具有掩模的第二测量部件耦合到扫描臂，以提供来自离子束的第二信号与扫描臂的旋转。掩模允许来自离子束的不同量的离子辐射基于掩模和离子束之间的角度取向进入法拉第杯。阻挡板基于扫描臂的旋转选择性地将离子束阻挡到第一法拉第。当第二测量部件旋转时，控制器基于第一信号，第二信号和掩模和离子束之间的取向来确定离子束的角度和垂直尺寸。

4. 发明授权

US09366954B2 Inspection of a lithographic mask that is protected by a pellicle 有权
标题翻译：检查由防护薄膜组件保护的光刻掩模
公开(公告)号：US09366954B2
公开(公告)日：2016-06-14
申请号：US13948975
申请日：2013-07-23
申请人： Applied Materials Israel, Ltd.
发明人： Alon Litman , Nir Ben-David Dodzin , Albert Karabekov , Alex Goldenshtein
IPC分类号： G01N23/00 , G03F1/86 , H01J37/28 , G21K1/06
CPC分类号： G03F1/86 , G03F1/62 , G21K1/062 , H01J37/28 , H01J2237/164 , H01J2237/2002 , H01J2237/244 , H01J2237/2449 , H01J2237/2809 , H01J2237/2817
摘要： A system and a method for evaluating a lithography mask, the system may include: (a) electron optics for directing primary electrons towards a pellicle that is positioned between the electron optics and the lithography mask; wherein the primary electrons exhibit an energy level that allows the primary electrons to pass through the pellicle and to impinge on the lithographic mask; (b) at least one detector for detecting detected emitted electrons and for generating detection signals; wherein detected emitted electrons are generated as a result of an impingement of the primary electrons on the lithographic mask; and (c) a processor for processing the detection signals to provide information about the lithography mask.
摘要翻译：一种用于评估光刻掩模的系统和方法，该系统可以包括：（a）用于将一次电子引导到位于电子光学器件和光刻掩模之间的防护薄膜的电子光学器件; 其中所述一次电子显示出允许所述一次电子通过所述防护薄膜并撞击所述光刻掩模的能级; （b）至少一个检测器，用于检测检测到的发射电子并产生检测信号; 其中由于一次电子撞击在光刻掩模上而产生检测到的发射电子; 和（c）用于处理检测信号以提供关于光刻掩模的信息的处理器。

5. 发明申请

US20140070730A1 ARC MANAGEMENT WITH VOLTAGE REVERSAL AND IMPROVED RECOVERY 有权
标题翻译：电弧管理与电压反转和改进恢复
公开(公告)号：US20140070730A1
公开(公告)日：2014-03-13
申请号：US14012847
申请日：2013-08-28
申请人： Advanced Energy Industries, Inc.
发明人： Hendrik Walde , Joshua Brian Pankratz , David Christie , Brian D. Kowal
IPC分类号： H05H1/24
CPC分类号： H01J37/32944 , H01J37/24 , H01J37/244 , H01J2237/0206 , H01J2237/244 , H05H1/24 , H05H1/36 , H05H1/48 , H05H2001/3494
摘要： Systems and methods for arc handling in plasma processing operations are disclosed. The method includes providing current with a power supply to a plasma load at a first voltage polarity and energizing an energy storage device so when it is energized, the energy storage device applies a reverse polarity voltage that has a magnitude that is as least as great as the first voltage polarity. When an arc is detected, power is applied from the energy storage device to the plasma load with a reverse polarity voltage that has a polarity that is opposite of the first voltage polarity, the application of the reverse polarity voltage to the plasma load decreases a level of the current that is provided to the plasma load.
摘要翻译：公开了用于等离子体处理操作中的电弧处理的系统和方法。该方法包括向第一电压极性的等离子体负载提供电源并为能量存储装置通电，因此当其被通电时，能量存储装置施加相反极性的电压，该极性电压的幅度至少与第一电压极性。当检测到电弧时，利用具有与第一电压极性相反的极性的反极性电压从能量存储装置向等离子体负载施加电力，对等离子体负载施加反极性电压降低等级提供给等离子体负载的电流。

6. 发明申请

US20110068266A1 METHOD AND DEVICE FOR VISUALIZING DISTRIBUTION OF LOCAL ELECTRIC FIELD 有权
标题翻译：用于可视化局部电场分布的方法和装置
公开(公告)号：US20110068266A1
公开(公告)日：2011-03-24
申请号：US12921991
申请日：2009-03-13
申请人： Jun-ichi Fujita
发明人： Jun-ichi Fujita
IPC分类号： G01N23/225
CPC分类号： G01N23/2251 , G01N23/2206 , H01J2237/244
摘要： A method which visualizes the distribution of a local electric field formed near a sample 2 is disclosed. A primary electron beam 1 which passes through the local electric field formed near the sample 2 is deflected by the local electric field, secondary electrons which are generated and emitted from a detection element provided downstream of an orbit of the deflected primary electron beam 1 are detected by a secondary electron detector 6, and an image formed based on the detected signal and a scanning electron beam image obtained by scanning the sample 2 are synthesized thus visualizing the distribution of the local electric field in multiple tones. Due to such an operation, it is possible to provide a method for visualizing the distribution of a local electric field in which the distribution of a local electric field can be obtained in multiple tone and in real time by performing image scanning one time using a usual electron beam scanning optical system.
摘要翻译：公开了一种可视化样品2附近形成的局部电场分布的方法。通过在样品2附近形成的局部电场的一次电子束1被局部电场偏转，检测从设置在偏转的一次电子束1的轨道下游的检测元件产生并发射的二次电子通过二次电子检测器6，并且基于检测信号形成的图像和通过扫描样本2获得的扫描电子束图像被合成，从而可视化多个色调中的局部电场的分布。由于这样的操作，可以提供一种用于使局部电场的分布可视化的方法，其中可以通过使用通常的方式执行图像扫描一次执行多次色调并且实时地获得局部电场的分布电子束扫描光学系统。

7. 发明申请

US20080201091A1 Sample electrification measurement method and charged particle beam apparatus 有权
标题翻译：样品充电测量方法和带电粒子束装置
公开(公告)号：US20080201091A1
公开(公告)日：2008-08-21
申请号：US12076355
申请日：2008-03-17
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G01R19/00 , G01N23/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices.To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
摘要翻译：本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动由于在指定位置处的静电电荷的波动而发生。

8. 发明申请

US20080135755A1 Scanning Electron Microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20080135755A1
公开(公告)日：2008-06-12
申请号：US11953496
申请日：2007-12-10
申请人： Naomasa SUZUKI , Hiroyuki Ito , Ichiro Tachibana
发明人： Naomasa SUZUKI , Hiroyuki Ito , Ichiro Tachibana
IPC分类号： H01J37/28
CPC分类号： H01J37/141 , H01J37/28 , H01J2237/1405 , H01J2237/141 , H01J2237/244
摘要： The present invention was made in view of a problem of an electron microscope in which a reduction in detection efficiency of electrons detected by a detector should be prevented by eliminating any influence of a leakage magnetic field through a gap in an objective lens onto the electrons emitted from a specimen. To solve the problem, the present invention provides an electron microscope having a configuration with: a pole piece electrode for accelerating primary electrons emitted at an electrons source; and an objective lens including the pole piece electrode. In the objective lens, an electrically and magnetically insulated gap is formed between the pole piece electrode and other pole piece, and an auxiliary coil is concentrically disposed with the objective lens at a middle position between the gap and a detection surface of the electron detector, with an electric current flowing through the auxiliary coil in the opposite direction from that of an electric current flowing through the objective lens coil.
摘要翻译：本发明考虑到电子显微镜的问题，其中通过消除通过物镜中的间隙的泄漏磁场对发射的电子的任何影响来防止检测器检测到的电子的检测效率的降低从标本。为了解决该问题，本发明提供一种具有以下结构的电子显微镜：具有用于加速在电子源发射的一次电子的极片电极; 以及包括极片电极的物镜。在物镜中，在极片电极和其它极片之间形成电气且磁绝缘的间隙，并且辅助线圈与物镜同心地设置在间隙和电子检测器的检测表面之间的中间位置，电流以与流过物镜线圈的电流相反的方向流过辅助线圈。

9. 发明授权

US07235799B2 System and method for evaluation using electron beam and manufacture of devices 失效
标题翻译：使用电子束进行评估的系统和方法以及器件的制造
公开(公告)号：US07235799B2
公开(公告)日：2007-06-26
申请号：US10998160
申请日：2004-11-29
申请人： Mamoru Nakasuji , Tohru Satake , Takao Kato , Nobuharu Noji
发明人： Mamoru Nakasuji , Tohru Satake , Takao Kato , Nobuharu Noji
IPC分类号： H01J1/50
CPC分类号： H01J37/141 , B82Y10/00 , B82Y15/00 , H01J37/09 , H01J37/12 , H01J37/1474 , H01J37/28 , H01J2237/0453 , H01J2237/06316 , H01J2237/244 , H01J2237/2538 , H01J2237/2817
摘要： An electron beam apparatus having a longer life time of cathode, and allowing a plurality of electron beams to be arranged adequately around an optical axis and five or more electron beams to be formed from a single electron gun. The electron beams emitted from a cathode made of ZrO/W (tungsten zirconium oxide) or a cathode made of carbide of transition metal to the off-optical axis directions may be converged on a sample to scan it. The apparatus includes a plate for reducing a vacuum conductance defined between the electron gun chamber side and the sample side, and apertures are formed through the plate at locations offset from the optical axis allowing for the passage of the electron beams. In order to evaluate a pattern on the sample, the electron beam emitted from the electron gun is incident to the sample surface via an objective lens. The objective lens is composed of a flat electrode having an aperture centered on the optical axis and placed in parallel with the sample surface and an electromagnetic lens including a gap formed in a side facing to the sample. Further, in order to inspect a mask, spacing among a plurality of electron beams after having passed through the mask are extended by a magnifying lens and thus widely spaced electron beams are then converted into optical signal in a scintillator.
摘要翻译：一种电子束装置，具有较长的阴极使用寿命，并允许多个电子束在光轴周围适当布置，并可由单个电子枪形成五个或更多个电子束。从由ZrO / W（钨氧化锆）制成的阴极或由过渡金属的碳化物制成的阴极发射到离轴方向的电子束可以会聚在样品上以进行扫描。该装置包括用于减小限定在电子枪室侧和样品侧之间的真空电导的板，并且在偏离光轴的位置处穿过板形成允许电子束通过的孔。为了评估样品上的图案，从电子枪发射的电子束通过物镜入射到样品表面。物镜由平面电极构成，该平面电极具有以光轴为中心并且与样品表面平行放置的孔，以及包括在面向样品的一侧形成的间隙的电磁透镜。此外，为了检查掩模，在通过掩模之后的多个电子束之间的间隔通过放大透镜延伸，并且因此在闪烁体中将大量间隔的电子束转换成光信号。

10. 发明申请

US20060219918A1 Sample electrification measurement method and charged particle beam apparatus 有权
公开(公告)号：US20060219918A1
公开(公告)日：2006-10-05
申请号：US11429237
申请日：2006-05-08
申请人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
发明人： Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/265 , G01N23/2251 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0041 , H01J2237/216 , H01J2237/244 , H01J2237/24564 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

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