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31. 发明授权

US08094924B2 E-beam defect review system 有权
标题翻译：电子束缺陷检查系统
公开(公告)号：US08094924B2
公开(公告)日：2012-01-10
申请号：US12335458
申请日：2008-12-15
申请人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
发明人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N23/04 , G01N2223/102 , G01N2223/426 , G01N2223/611 , G06T2207/10061 , G06T2207/30148
摘要： An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus; and a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam. The modified SORIL column further includes a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.
摘要翻译：一种装置包括成像单元以对待审查的晶片进行成像，其中成像单元是经修改的SORIL柱。改进的SORIL柱包括由于晶片表面拓扑而进行微聚焦的聚焦子系统，其中聚焦子系统验证从晶片表面反射的光栅图像的位置以调整焦点; 以及表面电荷控制，用于调节在复查过程期间由于电子辐射引起的电荷累积，其中气体分子在洪水枪光束下而不是在主光束下方注入。改进的SORIL列还包括用于存储晶片设计数据库的存储单元; 以及用于管理缺陷定位，缺陷采样和缺陷分类的主计算机，其中主计算机和存储单元通过高速网络链接。

32. 发明申请

US20110215241A1 Charged Particle Beam Detection Unit with Multi Type Detection Subunits 有权
标题翻译：带多种检测子单元的带电粒子束检测单元
公开(公告)号：US20110215241A1
公开(公告)日：2011-09-08
申请号：US12715766
申请日：2010-03-02
申请人： Joe Wang , Xu Zhang , Zhongwei Chen
发明人： Joe Wang , Xu Zhang , Zhongwei Chen
IPC分类号： G01N23/00 , G01N23/225 , G01N23/04 , H01J37/26
CPC分类号： G01N23/00 , G01N23/04 , G01N23/225 , H01J37/26
摘要： A detection unit of a charged particle imaging system includes a multi type detection subunit in the charged particle imaging system, with the assistance of a Wien filter (also known as an E×B charged particle analyzer). The imaging system is suitable for a low beam current, high resolution mode and a high beam current, high throughput mode. The unit can be applied to a scanning electron inspection system as well as to other systems that use a charged particle beam as an observation tool.
摘要翻译：带电粒子成像系统的检测单元在Wien滤波器（也称为E×B带电粒子分析器）的帮助下，包括带电粒子成像系统中的多类型检测子单元。该成像系统适用于低光束电流，高分辨率模式和高光束电流，高通量模式。该单元可以应用于扫描电子检查系统以及使用带电粒子束作为观察工具的其他系统。

33. 发明授权

US07973283B2 Method for regulating scanning sample surface charge in continuous and leap-and-scan scanning mode imaging process 有权
标题翻译：在连续扫描和扫描扫描模式成像过程中调节扫描样品表面电荷的方法
公开(公告)号：US07973283B2
公开(公告)日：2011-07-05
申请号：US12232834
申请日：2008-09-25
申请人： Joe Wang , Jack Jau
发明人： Joe Wang , Jack Jau
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/026 , H01J2237/0044 , H01J2237/006 , H01J2237/2817
摘要： A method for regulating sample surface charge has been proposed in this invention. The processes of applying a charged particle beam to a first area and applying a flood energized beam gun with gaseous molecules to a second area are executed in the method when the sample is in both continuous and Leap & Scan movements. The second area is located at a predetermined distance from the first area behind or ahead of the first area being scanned with respect to the movement of the sample. Thus, the surface of the sample may be regulated.
摘要翻译：本发明提出了一种调节样品表面电荷的方法。当样品处于连续和Leap＆Scan移动中时，在方法中执行将带电粒子束施加到第一区域并将带有气态分子的泛光束枪施加到第二区域的过程。第二区域位于相对于样品的运动被扫描的第一区域的后面或之前的第一区域的预定距离处。因此，可以调节样品的表面。

34. 发明授权

US07960697B2 Electron beam apparatus 有权
标题翻译：电子束装置
公开(公告)号：US07960697B2
公开(公告)日：2011-06-14
申请号：US12257304
申请日：2008-10-23
申请人： Zhongwei Chen , Weiming Ren , Joe Wang , Xuedong Liu , Juying Dou , Fumin He , Feng Cao , Yan Ren , Xiaoli Guo , Wei He , Qingpo Xi
发明人： Zhongwei Chen , Weiming Ren , Joe Wang , Xuedong Liu , Juying Dou , Fumin He , Feng Cao , Yan Ren , Xiaoli Guo , Wei He , Qingpo Xi
IPC分类号： H01J49/44
CPC分类号： H01J37/073 , H01J37/244 , H01J37/28 , H01J2237/06341 , H01J2237/24592
摘要： The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review.The present invent provides solution of improving imaging resolution by utilizing a field emission cathode tip with a large tip radius, applying a large accelerating voltage across ground potential between the cathode and anode, positioning the beam limit aperture before condenser lens, utilizing condenser lens excitation current to optimize image resolution, applying a high tube bias to shorten electron travel time, adopting and modifying SORIL objective lens to ameliorate aberration at large field of view and under electric drifting and reduce the urgency of water cooling objective lens while operating material analysis.The present invent provides solution of improving throughput by utilizing fast scanning ability of SORIL and providing a large voltage difference between sample and detectors.
摘要翻译：本发明涉及采用扫描电子显微镜进行样品检查和缺陷检查的带电粒子束装置。本发明提供了通过利用具有大的尖端半径的场致发射阴极尖端来提高成像分辨率的解决方案，在阴极和阳极之间的地电位上施加大的加速电压，将光束极限孔定位在聚光透镜之前，利用聚光透镜激发电流优化图像分辨率，应用高管偏压缩短电子行进时间，采用和修正SORIL物镜，以改善大视野和电漂移下的像差，并减少水冷物镜在操作材料分析时的紧迫性。本发明提供了通过利用SORIL的快速扫描能力并在样品和检测器之间提供大的电压差来提高产量的解决方案。

35. 发明授权

US07872236B2 Charged particle detection devices 失效
标题翻译：带电粒子检测装置
公开(公告)号：US07872236B2
公开(公告)日：2011-01-18
申请号：US11668846
申请日：2007-01-30
申请人： Xu Zhang , Joe Wang , Zhong-Wei Chen
发明人： Xu Zhang , Joe Wang , Zhong-Wei Chen
IPC分类号： G01T1/20
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2443 , H01J2237/24435 , H01J2237/2445 , H01J2237/24465
摘要： A charged particle detector consists of four independent light guide modules assembled together to form a segmented on-axis annular detector, with a center opening for allowing the primary charged particle beam to pass through. One side of the assembly facing the specimen is coated with or bonded to scintillator material as the charged particle detection surface. Each light guide module is coupled to a photomultiplier tube to allow light signals transmitted through each light guide module to be amplified and processed separately. A charged particle detector is made from a single block of light guide material processed to have a cone shaped circular cutout from one face, terminating on the opposite face to an opening to allow the primary charged particle beam to pass through. The opposite face is coated with or bonded to scintillator material as the charged particle detection surface. The outer region of the light guide block is shaped into four separate light guide output channels and each light guide output channel is coupled to a photomultiplier tube to allow light signal output from each channel to be amplified and processed separately.
摘要翻译：带电粒子检测器由四个独立的光导模块组成，组合在一起以形成分段的轴上环形探测器，其中心开口允许初级带电粒子束通过。面向样品的组件的一侧作为带电粒子检测表面涂覆或结合到闪烁体材料。每个光导模块耦合到光电倍增管，以允许通过每个光导模块传输的光信号被单独放大和处理。带电粒子检测器由一块光导材料制成，被处理成具有从一个面的锥形圆形切口，终止在与开口相对的面上以允许初级带电粒子束通过。相反的面被涂覆或与闪烁体材料结合，作为带电粒子检测表面。导光块的外部区域被成形为四个分开的光导输出通道，并且每个光导输出通道耦合到光电倍增管，以允许来自每个通道的光信号输出被单独放大和处理。

36. 发明申请

US20110002962A1 Immunogenic PcpA Polypeptides and Uses Thereof 审中-公开
标题翻译：免疫原性PcpA多肽及其用途
公开(公告)号：US20110002962A1
公开(公告)日：2011-01-06
申请号：US12377446
申请日：2007-08-17
申请人： David E. Briles , Susan K. Hollingshead , Jeremy Yethon , Joe Wang
发明人： David E. Briles , Susan K. Hollingshead , Jeremy Yethon , Joe Wang
IPC分类号： A61K39/09 , C07K14/195 , A61K39/116 , A61P31/04
CPC分类号： C07K14/3156 , G01N33/56944 , G01N2400/10
摘要： Provided herein are compositions and methods for eliciting an immune response against Streptococcus pneumoniae. More particularly, the compositions and methods relate to immunogenic polypeptides, including fragments of PcpA and variants thereof, and nucleic acids, vectors and transfected cells that encode or express the polypeptides. Methods of making and using the immunogenic polypeptides are also described.
摘要翻译：本文提供了用于引发针对肺炎链球菌的免疫应答的组合物和方法。更具体地，组合物和方法涉及免疫原性多肽，包括PcpA及其变体的片段，以及编码或表达多肽的核酸，载体和转染的细胞。还描述了制备和使用免疫原性多肽的方法。

37. 发明授权

US07747062B2 Methods, defect review tools, and systems for locating a defect in a defect review process 有权
标题翻译：方法，缺陷评估工具和用于在缺陷评估过程中定位缺陷的系统
公开(公告)号：US07747062B2
公开(公告)日：2010-06-29
申请号：US11270771
申请日：2005-11-09
申请人： Da Chen , Christophe Fouquet , Saibal Banerjee , Santosh Bhattacharyya , Joe Wang , Lian Yao , Mike van Riet , Igor Germanenko
发明人： Da Chen , Christophe Fouquet , Saibal Banerjee , Santosh Bhattacharyya , Joe Wang , Lian Yao , Mike van Riet , Igor Germanenko
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N21/95607 , G06T2207/30148
摘要： Methods, defect review tools, and systems for locating a defect in a defect review process are provided. One method includes acquiring one or more images and data from an inspection tool. The one or more images illustrate an area on a specimen in which a defect to be reviewed is located. The data indicates a position and features of the defect within the area. The method also includes acquiring one or more additional images of the specimen proximate the position of the defect indicated in the data using an imaging subsystem of a defect review tool. In addition, the method includes identifying a portion of the one or more additional images that corresponds to the one or more images. The method further includes determining a position of the defect within the portion of the one or more additional images using the data.
摘要翻译：提供了用于定位缺陷评估过程中的缺陷的方法，缺陷评估工具和系统。一种方法包括从检查工具获取一个或多个图像和数据。一个或多个图像示出了待检查的缺陷所在的样本上的区域。数据表示该区域内缺陷的位置和特征。该方法还包括使用缺陷评估工具的成像子系统获取在数据中指示的缺陷的位置附近的样本的一个或多个附加图像。此外，该方法包括识别对应于一个或多个图像的一个或多个附加图像的一部分。所述方法还包括使用所述数据确定所述一个或多个附加图像的所述部分内的所述缺陷的位置。

38. 发明申请

US20100140498A1 OPERATION STAGE FOR WAFER EDGE INSPECTION AND REVIEW 失效
标题翻译：水边检查和审查的操作阶段
公开(公告)号：US20100140498A1
公开(公告)日：2010-06-10
申请号：US12331336
申请日：2008-12-09
申请人： JACK JAU , HONG XIAO , JOE WANG , ZHONGWEI CHEN , YI XIANG WANG , EDWARD TSENG
发明人： JACK JAU , HONG XIAO , JOE WANG , ZHONGWEI CHEN , YI XIANG WANG , EDWARD TSENG
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/202 , H01J2237/2817 , H01L21/67288 , H01L21/6831
摘要： The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review. In order to keep the substrate in focus and avoid a large position shift during altering the substrate observation angle by rotation the pendulum stage, one embodiment of the present invention discloses a method such that the rotation axis of the pendulum stage consist of the tangent of upper edge of the substrate to be inspected. The electrostatic chuck of the present invention has a diameter smaller than which of the substrate to be inspected. During the inspection process the substrate on the electrostatic chuck may be rotated about the central axis on the electrostatic chuck to a desired position, this design insures all position on the bevel and apex are able to be inspected.
摘要翻译：本发明涉及用于基板（晶片）边缘和背面缺陷检查或缺陷检查的扫描电子显微镜中的带电粒子束装置的操作阶段。然而，应当认识到，本发明具有更广泛的应用范围。根据本发明的系统和方法提供了用于衬底边缘检查或审查的操作阶段。检查区域包括顶部近边缘，斜面，顶点和底部斜面。操作台包括支撑台，z台，X-Y台，静电卡盘，摆台和旋转轨道。具有静电卡盘的摆台安装具有从0°摆动到180°的能力，同时执行基板顶部斜面，顶部和底部斜面检查或检查。为了将基板保持在对焦状态，并且通过旋转摆锤台来改变基板观察角度而避免大的位置偏移，本发明的一个实施例公开了一种方法，使得摆台的旋转轴线由上部的切线要检查的基板的边缘。本发明的静电卡盘的直径小于要检查的基板的直径。在检查过程中，静电卡盘上的基板可以围绕静电卡盘上的中心轴线旋转到期望的位置，该设计确保能够检查斜面上的所有位置和顶点。

39. 发明授权

US07658934B2 Chlamydia antigens and protein vaccine 失效
标题翻译：衣原体抗原和蛋白疫苗
公开(公告)号：US07658934B2
公开(公告)日：2010-02-09
申请号：US12367955
申请日：2009-02-09
申请人： Andrew D. Murdin , Raymond P. Oomen , Joe Wang , Pamela Dunn
发明人： Andrew D. Murdin , Raymond P. Oomen , Joe Wang , Pamela Dunn
IPC分类号： A61K39/118
CPC分类号： C12N15/85 , A61K39/00 , A61K2039/505 , A61K2039/53 , C07K14/295 , C07K2319/00 , C12N2830/42 , Y02A50/472 , Y02A50/476 , Y10S435/975
摘要： The present invention provides vaccines for immunizing a host, including humans, against disease caused by infection by a strain of Chlamydia, specifically C. pneumoniae. The vaccine and method employ a full-length, 5′-truncated or 3′-truncated 76 kDa protein of a strain of Chlamydia pneumoniae. Modifications are possible within the scope of this invention.
摘要翻译：本发明提供用于免疫宿主（包括人）免疫衣原体特异性肺炎衣原体感染引起的疾病的疫苗。疫苗和方法使用肺炎衣原体菌株的全长5'截短或3'截短的76kDa蛋白质。在本发明的范围内可以进行修改。

40. 发明授权

US07595058B2 Chlamydia antigens and vaccine uses of the protein 失效
标题翻译：衣原体抗原和疫苗用途的蛋白质
公开(公告)号：US07595058B2
公开(公告)日：2009-09-29
申请号：US11118381
申请日：2005-05-02
申请人： Andrew D. Murdin , Raymond P. Oomen , Joe Wang , Pamela Dunn
发明人： Andrew D. Murdin , Raymond P. Oomen , Joe Wang , Pamela Dunn
IPC分类号： A61K39/118
CPC分类号： C12N15/85 , A61K39/00 , A61K2039/505 , A61K2039/53 , C07K14/295 , C07K2319/00 , C12N2830/42 , Y02A50/472 , Y02A50/476 , Y10S435/975
摘要： The present invention provides vaccines and methods for immunizing a host, including humans, against disease caused by infection by a strain of Chlamydia, specifically C. pneumoniae. The vaccine and method employ a full-length, 5′-truncated or 3′-truncated 76kDa protein of a strain of Chlamydia pneumoniae. Modifications are possible within the scope of this invention.
摘要翻译：本发明提供用于免疫宿主（包括人）免疫衣原体特异性肺炎衣原体感染引起的疾病的疫苗和方法。疫苗和方法使用肺炎衣原体菌株的全长5'截短或3'截短的76kDa蛋白。在本发明的范围内可以进行修改。

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