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    • 75. 发明授权
    • TMR device with novel free layer structure
    • TMR器件具有新颖的自由层结构
    • US08385027B2
    • 2013-02-26
    • US13317485
    • 2011-10-19
    • Tong ZhaoHui-Chuan WangMin LiKunliang Zhang
    • Tong ZhaoHui-Chuan WangMin LiKunliang Zhang
    • G11B5/33G11B5/127H01L29/82
    • G11B5/3909B82Y10/00B82Y25/00G01R33/098G11B5/3906H01L43/08H01L43/10H01L43/12
    • A composite free layer having a FL1/insertion/FL2 configuration is disclosed for achieving high dR/R, low RA, and low λ in TMR or GMR sensors. Ferromagnetic FL1 and FL2 layers have (+) λ and (−) λ values, respectively. FL1 may be CoFe, CoFeB, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, or Nb. FL2 may be CoFe, NiFe, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, Nb, or B. The thin insertion layer includes at least one magnetic element such as Co, Fe, and Ni, and at least one non-magnetic element selected from Ta, Ti, W, Zr, Hf, Nb, Mo, V, Cr, or B. In a TMR stack with a MgO tunnel barrier, dR/R>60%, λ˜1×10−6, and RA=1.2 ohm-um2 when FL1 is CoFe/CoFeB/CoFe, FL2 is CoFe/NiFe/CoFe, and the insertion layer is CoTa or CoFeBTa.
    • 公开了具有FL1 /插入/ FL2配置的复合自由层,用于在TMR或GMR传感器中实现高dR / R,低RA和低λ。 铁磁FL1和FL2层分别具有(+)λ和( - )λ值。 FL1可以是CoFe,CoFeB或其与Ni,Ta,Mn,Ti,W,Zr,Hf,Tb或Nb的合金。 FL2可以是CoFe,NiFe或其与Ni,Ta,Mn,Ti,W,Zr,Hf,Tb,Nb或B的合金。薄插入层包括至少一种诸如Co,Fe和Ni 以及选自Ta,Ti,W,Zr,Hf,Nb,Mo,V,Cr或B中的至少一种非磁性元素。在具有MgO隧道势垒的TMR堆叠中,dR / R> 60%,λ 〜1×10-6,当FL1为CoFe / CoFeB / CoFe时,RA = 1.2ohm-um2,FL2为CoFe / NiFe / CoFe,插入层为CoTa或CoFeBTa。