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    • 1. 发明授权
    • Image forming apparatus
    • 图像形成装置
    • US08608162B2
    • 2013-12-17
    • US13434175
    • 2012-03-29
    • Kazutoshi NakamuraTakashi Saito
    • Kazutoshi NakamuraTakashi Saito
    • B65H31/26
    • B41J13/106B65H31/26B65H2402/46B65H2404/63B65H2405/1114B65H2801/06G03G15/6552
    • An image forming apparatus including an image forming unit, a discharger, and a presser including a swingable member and a contact member is provided. The contact member is partially attached to the swingable member in a condition to create clearance between an unattached part and the swingable member. Weights of the contact member and the swingable member affect the sheet when the recording medium contacts the contact member and the contact member is moved to swing upward along with the swingable member by the recording medium. Resilient force is provided by the contact member to affect the recording medium when the recording medium contacts the contact member and the contact member is moved in a direction to narrow the clearance.
    • 提供一种包括图像形成单元,放电器和包括可摆动构件和接触构件的按压器的图像形成设备。 接触构件在形成未连接部分和可摆动构件之间的间隙的状态下部分地附接到可摆动构件。 当记录介质接触接触构件时,接触构件和可摆动构件的重量影响片材,并且接触构件通过记录介质与可摆动构件一起向上移动。 当记录介质接触接触构件并且接触构件沿使间隙变窄的方向移动时,接触构件提供弹性力以影响记录介质。
    • 7. 发明申请
    • SEMICONDUCTOR APPARATUS AND POWER SOURCE CIRCUIT
    • 半导体器件和电源电路
    • US20110031952A1
    • 2011-02-10
    • US12851396
    • 2010-08-05
    • Kazutoshi NAKAMURA
    • Kazutoshi NAKAMURA
    • G05F1/10H01L27/088
    • H01L21/823425H01L21/823475H01L27/088H02M3/1588Y02B70/1466
    • According to one embodiment, a semiconductor apparatus includes a substrate, a semiconductor layer of a first conductivity type, a first semiconductor region of a second conductivity type, a first main electrode, a second semiconductor layer of the second conductivity type, a third semiconductor layer of the first conductivity type, a second main electrode, a gate insulating film, and a gate electrode. An electron injected from the first semiconductor region into the semiconductor layer is recombined with an electron hole injected from the third semiconductor region into the semiconductor layer in a state of a body diode is biased in a forward direction. The body diode includes the semiconductor layer, the first semiconductor region, and the third semiconductor region.
    • 根据一个实施例,半导体装置包括基板,第一导电类型的半导体层,第二导电类型的第一半导体区域,第一主电极,第二导电类型的第二半导体层,第三半导体层 的第一导电类型,第二主电极,栅极绝缘膜和栅电极。 将从第一半导体区域注入到半导体层中的电子与从第三半导体区域注入到半导体层中的电子空穴与身体二极管的状态向正方向偏置。 体二极管包括半导体层,第一半导体区域和第三半导体区域。
    • 9. 发明授权
    • Semiconductor device
    • 半导体器件
    • US07554160B2
    • 2009-06-30
    • US11333281
    • 2006-01-18
    • Kazutoshi Nakamura
    • Kazutoshi Nakamura
    • H01L23/62
    • H01L29/0847H01L27/0251H01L29/1083H01L29/7302H01L29/7393H01L29/7835
    • A semiconductor device has a source region, a channel region and a drain region formed in order along a surface of a substrate, a vertical type bipolar transistor formed from the source region below the substrate, a base contact region of the vertical type bipolar transistor, a buried layer connected to the vertical type bipolar transistor, a buried contact layer which electrically conducts the drain region and the buried layer and a drift region formed between the drain region and the channel region, which has the same conductive type as that of the drain region and has impurity concentration less than that of the drain region.
    • 半导体器件具有源极区,沟道区和漏极区,沿着衬底的表面依次形成,垂直型双极晶体管由衬底下面的源极区形成,垂直型双极晶体管的基极接触区, 连接到垂直型双极晶体管的掩埋层,导电漏极区和掩埋层的掩埋接触层和形成在漏极区和沟道区之间的漂移区,其具有与漏极相同的导电类型 并且杂质浓度小于漏极区的杂质浓度。
    • 10. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20080251838A1
    • 2008-10-16
    • US12118159
    • 2008-05-09
    • Syotaro OnoYoshihiro YamaguchiYusuke KawaguchiKazutoshi NakamuraNorio YasuharaKenichi MatsushitaShinichi HodamaAkio Nakagawa
    • Syotaro OnoYoshihiro YamaguchiYusuke KawaguchiKazutoshi NakamuraNorio YasuharaKenichi MatsushitaShinichi HodamaAkio Nakagawa
    • H01L29/78
    • H01L29/7802H01L21/26586H01L29/0653H01L29/0696H01L29/0847H01L29/0878H01L29/1095H01L29/402H01L29/407H01L29/42368H01L29/42376H01L29/4238H01L29/66712H01L29/7809
    • A semiconductor device includes: a semiconductor substrate, at least a surface portion thereof serving as a low-resistance drain layer of a first conductivity type; a first main electrode connected to the low-resistance drain layer; a high-resistance epitaxial layer of a second-conductivity type formed on the low-resistance drain layer; a second-conductivity type base layer selectively formed on the high-resistance epitaxial layer; a first-conductivity type source layer selectively formed in a surface portion of the second-conductivity type base layer; a trench formed in a region sandwiched by the second-conductivity type base layers with a depth extending from the surface of the high-resistance epitaxial layer to the semiconductor substrate; a jfet layer of the first conductivity type formed on side walls of the trench; an insulating layer formed in the trench; an LDD layer of the first-conductivity type formed in a surface portion of the second-conductivity type base layer so as to be connected to the first-conductivity type jfet layer around a top face of the trench; a control electrode formed above the semiconductor substrate so as to be divided into a plurality of parts, and formed on a gate insulating film formed on a part of the surface of the LDD layer, on surfaces of end parts of the first-conductivity type source layer facing each other across the trench, and on a region of the surface of the second-conductivity type base layer sandwiched by the LDD layer and the first-conductivity type source layer; and a second main electrode in ohmic contact with the first-conductivity type source layer and the second-conductivity type base layer so as to sandwich the control electrode.
    • 半导体器件包括:半导体衬底,至少其表面部分用作第一导电类型的低电阻漏极层; 连接到所述低电阻漏极层的第一主电极; 形成在低电阻漏极层上的第二导电类型的高电阻外延层; 选择性地形成在高电阻外延层上的第二导电型基极层; 选择性地形成在所述第二导电型基底层的表面部分中的第一导电型源极层; 在由所述第二导电型基底层夹持的区域中形成的沟槽,其深度从所述高电阻外延层的表面延伸到所述半导体衬底; 形成在沟槽的侧壁上的第一导电类型的jfet层; 形成在沟槽中的绝缘层; 形成在第二导电型基底层的表面部分中的第一导电类型的LDD层,以便围绕沟槽的顶面连接到第一导电型jfet层; 控制电极,其形成在所述半导体衬底上,以被分成多个部分,并形成在形成在所述LDD层的一部分表面上的栅极绝缘膜上,所述第一导电型源的端部 并且在由LDD层和第一导电型源极层夹在第二导电型基底层的表面的区域上, 以及与所述第一导电型源极层和所述第二导电型基极欧姆接触以便夹持所述控制电极的第二主电极。