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91. 发明授权

US09555499B2 Method of cutting super-hard materials using an electron beam and a range of beam scanning velocities 有权
标题翻译：使用电子束切割超硬材料和射束扫描速度范围的方法
公开(公告)号：US09555499B2
公开(公告)日：2017-01-31
申请号：US14419523
申请日：2013-08-14
申请人： ELEMENT SIX TECHNOLOGIES LIMITED
发明人： Christopher John Howard Wort
IPC分类号： B23K15/08 , B23K15/10 , B23K15/00 , B28D5/00 , H01J37/31 , B26D5/00 , C30B33/08
CPC分类号： B23K15/08 , B23K15/00 , B23K15/0006 , B23K15/10 , B23K2103/08 , B23K2103/50 , B23K2103/52 , B26D5/00 , B28D5/00 , C30B33/08 , H01J37/31
摘要： A method of cutting a super-hard material (8) using an electron beam (6), wherein the electron beam (6) is directed onto a surface of the super-hard material (8) and moved relative to the surface such that the electron beam (6) moves across the surface of the super-hard material (8) at an electron beam scanning velocity in a range 100 to 5000 mms−1 to cut the super-hard material (8).
摘要翻译：一种使用电子束（6）切割超硬材料（8）的方法，其中电子束（6）被引导到超硬材料（8）的表面上并相对于表面移动，使得电子束（6）以100-5000mms-1的电子束扫描速度跨过超硬材料（8）的表面移动，以切割超硬材料（8）。

92. 发明授权

US09362088B2 Charged particle beam device and sample preparation method 有权
标题翻译：带电粒子束装置和样品制备方法
公开(公告)号：US09362088B2
公开(公告)日：2016-06-07
申请号：US14434687
申请日：2013-10-09
申请人： Hitachi High-Technologies Corporation
发明人： Takahiro Sato , Akinari Morikawa , Isamu Sekihara
IPC分类号： H01J37/317 , G01N1/28 , H01J37/28 , H01J37/30 , H01J37/31
CPC分类号： H01J37/3178 , G01N1/28 , G01N1/286 , G01N2001/2873 , H01J37/28 , H01J37/3005 , H01J37/3007 , H01J37/31 , H01J2237/063 , H01J2237/08 , H01J2237/208 , H01J2237/24564 , H01J2237/2813 , H01J2237/2817 , H01J2237/304 , H01J2237/31745 , H01J2237/31749
摘要： Provided is a charged particle beam device provided with: a charged particle source; an objective lens for focusing a charged particle beam emitted from the charged particle source onto a sample; a detector for detecting a secondary charged particle emitted from the sample; a probe capable of coming into contact with the sample; a gas nozzle for emitting conductive gas to the sample; and a control unit for controlling the drive of the probe and gas emission from the gas nozzle, wherein before bringing the probe into contact with the sample after applying the charged particle beam to the sample to machine the sample, the control unit emits gas toward a machining position from the gas nozzle and applies the charged particle beam to form a conductive film on a machining portion of the sample, and the charged particle beam device is provided with a contact detection unit for determining that the conductive film formed on the machining portion and the probe have come into contact with each other.
摘要翻译：提供一种带电粒子束装置，具有：带电粒子源; 用于将从带电粒子源发射的带电粒子束聚焦到样品上的物镜; 用于检测从样品发射的二次带电粒子的检测器; 能够与样品接触的探针; 用于向样品发射导电气体的气体喷嘴; 以及控制单元，用于控制探头的驱动和来自气体喷嘴的气体发射，其中在将带电粒子束施加到样品以加样样品之前，在使探针与样品接触之前，控制单元朝向从气体喷嘴加工位置并施加带电粒子束以在样品的加工部分上形成导电膜，并且带电粒子束装置设置有接触检测单元，用于确定形成在加工部分上的导电膜和探针相互接触。

93. 发明授权

US09318395B2 Systems and methods for preparation of samples for sub-surface defect review 有权
标题翻译：用于亚表面缺陷检查的样品的制备和方法
公开(公告)号：US09318395B2
公开(公告)日：2016-04-19
申请号：US13687244
申请日：2012-11-28
申请人： KLA-TENCOR CORPORATION
发明人： Cecelia Campochiaro , Hong Xiao , Michael Van Riet , Benjamin James Thomas Clarke , Harsh Sinha
IPC分类号： H01J37/31 , H01L21/66 , H01J37/28
CPC分类号： H01L22/20 , H01J37/28 , H01J37/31 , H01J2237/2817 , H01L22/12
摘要： One embodiment relates to a method of preparation of a sample of a substrate for sub-surface review using a scanning electron microscope apparatus. A defect at a location indicated in a first results file is re-detected, and the location of the defect is marked with at least one discrete marking point having predetermined positioning relative to the location of the defect. The location of the defect may be determined relative to the design for the device, and a cut location and a cut angle may be determined in at least a partly-automated manner using that information. Another embodiment relates to a system for preparing a sample for sub-surface review. Another embodiment relates to a method for marking a defect for review on a target substrate. Other embodiments, aspects and feature are also disclosed.
摘要翻译：一个实施方案涉及使用扫描电子显微镜装置制备用于亚表面评价的基材的样品的方法。重新检测在第一结果文件中指示的位置处的缺陷，并且使用至少一个相对于缺陷的位置具有预定定位的离散标记点标记缺陷的位置。可以相对于设备的设计来确定缺陷的位置，并且可以使用该信息至少部分自动化地确定切割位置和切割角度。另一实施例涉及一种用于准备用于子表面检查的样品的系统。另一实施例涉及用于在目标衬底上标记用于复查的缺陷的方法。还公开了其它实施例，方面和特征。

94. 发明授权

US08993962B2 Method and apparatus for sample extraction and handling 有权
标题翻译：样品提取和处理方法和设备
公开(公告)号：US08993962B2
公开(公告)日：2015-03-31
申请号：US13746124
申请日：2013-01-21
申请人： FEI Company
发明人： Enrique Agorio , James Edgar Hudson , Gerhard Daniel , Michael Tanguay , Jason Arjavac
IPC分类号： H01J37/295 , G01N1/28 , H01J37/20 , G01N1/32 , H01J37/26 , H01J37/28 , H01J37/31 , G01R31/28
CPC分类号： H01J37/20 , G01N1/286 , G01N1/32 , G01N2001/2873 , G01N2001/2886 , G01R31/2893 , H01J37/26 , H01J37/28 , H01J37/285 , H01J37/31 , H01J2237/202 , H01J2237/2802 , H01J2237/2812 , H01J2237/3109 , H01J2237/3114 , H01J2237/31745
摘要： An improved method and apparatus for extracting and handling samples for S/TEM analysis. Preferred embodiments of the present invention make use of a micromanipulator and a hollow microprobe probe using vacuum pressure to adhere the microprobe tip to the sample. By applying a small vacuum pressure to the lamella through the microprobe tip, the lamella can be held more securely and its placement controlled more accurately than by using electrostatic force alone. By using a probe having a beveled tip and which can also be rotated around its long axis, the extracted sample can be placed down flat on a sample holder. This allows sample placement and orientation to be precisely controlled, thus greatly increasing predictability of analysis and throughput.
摘要翻译：一种用于提取和处理样品用于S / TEM分析的改进方法和装置。本发明的优选实施例利用显微操纵器和使用真空压力的中空微探针探针将微针尖附着到样品上。通过通过微针尖向薄片施加小的真空压力，可以比通过单独使用静电力更牢固地保持薄片并且其布置更准确。通过使用具有倾斜尖端并且也可围绕其长轴旋转的探针，所提取的样品可以平放放置在样品架上。这样可以精确控制样品放置和取向，从而大大提高分析和产量的可预测性。

95. 发明申请

US20150083928A1 METHOD FOR DETERMINING BEAM PARAMETERS OF A CHARGE CARRIER BEAM, MEASURING DEVICE, AND CHARGE CARRIER BEAM DIVCE 有权
标题翻译：用于确定充电载波波束，测量装置和充电载波波束的波束参数的方法
公开(公告)号：US20150083928A1
公开(公告)日：2015-03-26
申请号：US13261962
申请日：2013-03-11
申请人： RWTH Aachen Koerperschaft des oeffentlichen Rechts , aixACCT Systems GmbH
发明人： Uwe Reisgen , Jens De Vries , Alexander Backhaus , Hans-Peter Bauer , Sebastian Ufer , Bernd Reichenberg , Thorsten Schmitz-Kempen
IPC分类号： G01M11/00 , G21K1/04 , H01J37/30 , H01J37/31 , H01J37/315
CPC分类号： G01R19/0061 , B23K15/0013 , B23K15/0026 , G21K1/04 , H01J37/244 , H01J37/3007 , H01J37/3053 , H01J37/31 , H01J37/315 , H01J2237/24514 , H01J2237/24542 , H01J2237/303
摘要： The application relates to a method for determining beam parameters of a charge carrier beam, a measuring device, and a charge carrier beam device. The charge carrier beam (4) from a charge carrier beam device (1) is guided, by means of a beam deflection unit (3), over a slit aperture arrangement which is provided in an aperture device (7) and which has one or more slit apertures (8). Measurement plane coordinates of the beam components that penetrate the slit aperture arrangement are determined. On the basis of the measurement plane coordinates, the aperture device automatically moves in such a way that a measuring aperture (9) arranged in the aperture device moves over a predefined measurement reference point. The beam parameter is measured by the measuring aperture. In a measuring device (5) suitable for carrying out said method, the slit aperture arrangement has at least two non-parallel slit aperture sections (12, 13, 15, 16) which can be part of a single continuous slit aperture.
摘要翻译：本申请涉及一种用于确定电荷载流子束的波束参数的方法，测量装置和电荷载流子束装置。来自电荷载流子束装置（1）的电荷载流子束（4）通过光束偏转单元（3）被引导到设置在孔径装置（7）中的狭缝孔布置上，并且具有一个或更多的狭缝孔（8）。确定穿透狭缝孔布置的梁部件的测量平面坐标。基于测量平面坐标，孔径装置以这样的方式自动移动，使得布置在孔径装置中的测量孔（9）在预定义的测量参考点上移动。光束参数由测量孔测量。在适于执行所述方法的测量装置（5）中，狭缝孔布置具有至少两个非平行狭缝孔部分（12,13,15,16），其可以是单个连续狭缝孔的一部分。

96. 发明授权

US08610060B2 Charged particle beam device 有权
标题翻译：带电粒子束装置
公开(公告)号：US08610060B2
公开(公告)日：2013-12-17
申请号：US13202554
申请日：2009-10-23
申请人： Suyo Asai , Tsuyoshi Onishi , Toshihide Agemura
发明人： Suyo Asai , Tsuyoshi Onishi , Toshihide Agemura
IPC分类号： H01J37/31 , H01J37/00
CPC分类号： H01J37/244 , H01J37/265 , H01J37/28 , H01J2237/024 , H01J2237/24455 , H01J2237/24475
摘要： An object of the present invention is related to detecting of a detection signal at an optimum position in such a case that a sample plane is inclined with respect to a charged particle beam.The present invention is related to a charged particle beam apparatus for irradiating a charged particle beam to a sample, in which a detector is moved to a plurality of desirable positions around the sample so as to optimize positions of the detector. In accordance with the present invention, since it is possible to obtain an optimum detection signal in response to an attitude and a shape of the sample, a highly accurate sample observation, for instance, an SEM observation, an STEM observation, and an FIB observation can be carried out. Moreover, in an FIB-SEM apparatus, it is possible to highly accurately detect an end point of an FIB process.
摘要翻译：本发明的目的是在样品平面相对于带电粒子束倾斜的情况下，在最佳位置检测检测信号。本发明涉及一种用于将带电粒子束照射到样品的带电粒子束装置，其中检测器移动到样品周围的多个期望位置，以便优化检测器的位置。根据本发明，由于可以根据样品的姿态和形状获得最佳检测信号，所以可以进行高精度的样本观察，例如SEM观察，STEM观察和FIB观察可以进行此外，在FIB-SEM装置中，可以高精度地检测FIB处理的终点。

97. 发明申请

US20130209740A1 Apparatus and Method of Cleaving Thin Layer from Bulk Material 有权
标题翻译：从散装材料切割薄层的装置和方法
公开(公告)号：US20130209740A1
公开(公告)日：2013-08-15
申请号：US13766522
申请日：2013-02-13
申请人： Silicon Genesis Corporation
发明人： Francois J. Henley
IPC分类号： H01J37/31
CPC分类号： C30B33/04 , C30B29/20 , C30B33/00 , C30B33/06 , H01J37/31 , H01J2237/3109 , Y10T156/1052 , Y10T428/24479 , Y10T428/31515
摘要： Embodiments relate to use of a particle accelerator beam to form thin layers of material from a bulk substrate. In particular embodiments, a bulk substrate (e.g. donor substrate) having a top surface is exposed to a beam of accelerated particles. In certain embodiments, this bulk substrate may comprise a core of crystalline sapphire (Al2O3) material. Then, a thin layer of the material is separated from the bulk substrate by performing a controlled cleaving process along a cleave region formed by particles implanted from the beam. Embodiments may find particular use as hard, scratch-resistant covers for personal electric device displays, or as optical surfaces for fingerprint, eye, or other biometric scanning.
摘要翻译：实施例涉及使用粒子加速器束从大块衬底形成薄层材料。在具体的实施方案中，具有顶表面的本体衬底（例如，施主衬底）暴露于加速颗粒束。在某些实施例中，该本体衬底可以包括晶体蓝宝石（Al2O3）材料的核心。然后，通过沿着从梁注入的颗粒形成的切割区域进行受控的切割过程，将薄层的材料与本体基板分离。实施例可以特别用作个人电子设备显示器的硬的防刮盖，或用作指纹，眼睛或其它生物特征扫描的光学表面。

98. 发明申请

US20120027681A1 Low-Aspect Ratio Carbon Nanostructures 审中-公开
标题翻译：低纵横比碳纳米结构
公开(公告)号：US20120027681A1
公开(公告)日：2012-02-02
申请号：US13255697
申请日：2010-03-11
申请人： Yung Joon Jung , Hyunkyung Chun , Latika Menon
发明人： Yung Joon Jung , Hyunkyung Chun , Latika Menon
IPC分类号： A61K49/00 , A61K9/00 , A61K33/00 , B05D5/00 , H01J37/31 , B32B1/00 , C23C16/26 , B82Y5/00 , B82Y40/00
CPC分类号： B82Y40/00 , C01B32/16 , C01B32/18 , C01B2202/08 , C01B2202/10 , C01B2202/34 , C01B2202/36 , Y10T428/13
摘要： Low-aspect ratio nanostructures, such as nanocups, nanorings, and arrays of nanocups and nanorings, methods of fabrication of nanostructures, and methods of using nanostructures are disclosed.
摘要翻译：公开了低纵横比纳米结构，例如纳米结构，纳米结构和纳米结构和纳米阵列，纳米结构的制造方法和使用纳米结构的方法。

99. 发明授权

US06958476B2 Methods to improve resolution of cross sectioned features created using an ion beam 失效
标题翻译：提高使用离子束产生的横截面特征分辨率的方法
公开(公告)号：US06958476B2
公开(公告)日：2005-10-25
申请号：US10682416
申请日：2003-10-10
申请人： Todd J. Davis , Theodore Allen Paxton
发明人： Todd J. Davis , Theodore Allen Paxton
IPC分类号： G01N23/225 , G01N1/28 , G01N1/32 , H01J37/31 , H01J37/317 , H01L21/027 , H01L21/66 , H01J37/304
CPC分类号： H01L22/24 , G01N1/286 , H01L2924/0002 , H01L2924/00
摘要： Methods for creating a cross section of at least one feature located on a substrate are disclosed. The methods include coating the feature with a layer of contrast enhancing material, recoating the feature with a second material that is different from the contrast enhancing material, and milling the feature. The second material has substantially similar milling characteristics as the feature. The methods may further include creating an image of the feature and saving the image of the feature.
摘要翻译：公开了用于产生位于基板上的至少一个特征的横截面的方法。所述方法包括用对比度增强材料层涂覆该特征，用与对比度增强材料不同的第二材料重新涂覆该特征，以及研磨该特征。第二种材料具有与特征基本相似的研磨特性。所述方法还可以包括创建特征的图像并保存特征的图像。

100. 发明申请

US20050211922A1 Minute three dimensional structure producing apparatus and method 审中-公开
标题翻译：分钟三维结构制作装置及方法
公开(公告)号：US20050211922A1
公开(公告)日：2005-09-29
申请号：US11086492
申请日：2005-03-22
申请人： Masanao Munekane , Kouji Iwasaki
发明人： Masanao Munekane , Kouji Iwasaki
IPC分类号： B81C99/00 , A61N5/00 , B82B3/00 , G21G5/00 , H01J37/30 , H01J37/31 , H01J37/317
CPC分类号： H01J37/20 , B23K15/08 , B23P15/32 , B81C99/0095 , B81C2201/0143 , H01J37/3056 , H01J37/31 , H01J2237/20214 , H01J2237/206 , H01J2237/31732 , H01J2237/31735 , H01J2237/3174
摘要： A structure having arbitrary rotational symmetry is produced by attaching a sample stage (turntable) to a precision rotational shaft that is continuously rotated as high precision, performing FIB deposition inside an FIB chamber while causing continuous rotation of the sample stage, or performing cut-way processing from a side surface or upper surface, like a general purpose lathe, using FIB etching.
摘要翻译：具有任意旋转对称性的结构通过将样品台（转盘）附接到精度高的连续旋转的精密旋转轴上，在FIB室内进行FIB沉积，同时使样品台连续旋转，或进行切割使用FIB蚀刻从侧表面或上表面加工，如通用车床。

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