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1. 发明授权

US09543116B2 Method for verifying characteristics of an electron beam 有权
标题翻译：验证电子束特性的方法
公开(公告)号：US09543116B2
公开(公告)日：2017-01-10
申请号：US15190899
申请日：2016-06-23
申请人： Arcam AB
发明人： Tomas Lock
IPC分类号： A61N5/00 , H01J37/304 , B33Y10/00 , B33Y40/00 , B33Y50/02 , B28B1/00 , B28B17/00 , B29C67/00 , B22F3/105 , B23K15/00 , B23K15/02 , H01J37/30 , H01J37/317 , H01J37/305 , G01T1/29 , B33Y30/00
CPC分类号： H01J37/3045 , B22F3/1055 , B22F2003/1056 , B22F2003/1057 , B23K15/0013 , B23K15/002 , B23K15/0026 , B23K15/0086 , B23K15/02 , B28B1/001 , B28B17/00 , B28B17/0081 , B29C64/153 , B29C64/20 , B29C64/386 , B29C67/0077 , B29C67/0088 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B33Y50/02 , G01T1/295 , H01J37/09 , H01J37/244 , H01J37/30 , H01J37/3005 , H01J37/304 , H01J37/305 , H01J37/317 , H01J2237/0453 , H01J2237/2445 , H01J2237/2448 , H01J2237/24514 , H01J2237/2826 , H01J2237/30433 , H01J2237/3045 , H01J2237/30472 , H01J2237/3128 , Y02P10/295
摘要： A method is provided for forming a three-dimensional article through successive fusion of parts of a powder bed. The method includes the steps of: applying a first powder layer on a work table; directing an electron beam from an electron beam source over the work table, the directing of the electron beam causing the first powder layer to fuse in first selected locations according to a pre-determined model, so as to form a first part of a cross section of the three dimensional article, and intensity modulating X-rays from the powder layer or from a clean work table with a patterned aperture modulator and a patterned aperture resolver, wherein a verification of at least one of a size, position, scan speed, or shape of the electron beam is achieved by comparing detected intensity modulated X-ray signals with saved reference values.
摘要翻译：提供了一种用于通过粉末床的部分的连续熔融来形成三维制品的方法。该方法包括以下步骤：将第一粉末层施加在工作台上; 将来自电子束源的电子束引导到工作台上，根据预定模型引导使第一粉末层在第一选定位置熔化的电子束，以便形成横截面的第一部分以及强度调制来自粉末层的X射线或来自具有图案化孔径调制器和图案化孔径分解器的清洁工作台的X射线，其中验证尺寸，位置，扫描速度或通过将检测到的强度调制的X射线信号与保存的参考值进行比较来实现电子束的形状。

2. 发明授权

US09390889B2 Ion implanter and method of ion beam tuning 有权
标题翻译：离子注入机和离子束调谐方法
公开(公告)号：US09390889B2
公开(公告)日：2016-07-12
申请号：US14852037
申请日：2015-09-11
申请人： Sumitomo Heavy Industries Ion Technology Co., Ltd.
发明人： Kazuhiro Watanabe , Yuuji Takahashi , Yusuke Ueno
IPC分类号： H01J37/304 , H01J37/317 , H01J37/244
CPC分类号： H01J37/304 , H01J37/05 , H01J37/244 , H01J37/3171 , H01J2237/055 , H01J2237/24514
摘要： An energy analysis slit of an ion implanter is configured to enable switching between a standard slit opening used for implantation processing performed under a predetermined implantation condition and a high-precision slit opening having higher energy precision than the standard slit opening and used to tune an acceleration parameter for a radio frequency linear accelerator. The acceleration parameter is determined for the predetermined implantation condition so that at least a part of ions supplied to the radio frequency linear accelerator is accelerated to have target energy, and so that the beam current amount measured by a beam measurement unit is equivalent to a target beam current amount.
摘要翻译：离子注入机的能量分析狭缝被配置为能够在用于在预定注入条件下执行的注入处理的标准狭缝开口与具有比标准狭缝开口更高能量精度的高精度狭缝开口之间进行切换，并用于调节加速度射频线性加速器的参数。对于预定的注入条件确定加速度参数，使得提供给射频线性加速器的离子的至少一部分被加速以具有目标能量，并且由光束测量单元测量的束电流量等于目标光束电流量。

3. 发明授权

US09343263B2 Ion implanter, beam energy measuring device, and method of measuring beam energy 有权
标题翻译：离子注入机，光束能量测量装置和测量光束能量的方法
公开(公告)号：US09343263B2
公开(公告)日：2016-05-17
申请号：US14656132
申请日：2015-03-12
申请人： Sumitomo Heavy Industries Ion Technology Co., Ltd.
发明人： Haruka Sasaki , Kazuhiro Watanabe , Hiroyuki Kariya
IPC分类号： H01J37/00 , H01J37/244 , H01J37/317
CPC分类号： H01J37/244 , H01J37/3171 , H01J2237/057 , H01J2237/24514 , H01J2237/24528 , H01J2237/31703
摘要： A beam energy measuring device in an ion implanter includes a parallelism measuring unit that measures a parallelism of an ion beam at a downstream of a beam collimator of the ion implanter and an energy calculating unit that calculates an energy of the ion beam from the measured parallelism. The ion implanter may further include a control unit that controls a high energy multistage linear acceleration unit based on the measured energy of the ion beam so that the ion beam has a target energy.
摘要翻译：离子注入机中的光束能量测量装置包括平行度测量单元，其测量在离子注入机的光束准直器的下游处的离子束的平行度，以及能量计算单元，其计算来自所测量的平行度的离子束的能量。离子注入机还可以包括控制单元，其基于所测量的离子束的能量来控制高能量多级线性加速单元，使得离子束具有目标能量。

4. 发明授权

US09269532B2 Charged particle beam writing apparatus, and method for detecting irregularities in dose of charged particle beam 有权
标题翻译：带电粒子束写入装置，以及用于检测带电粒子束的剂量不均匀的方法
公开(公告)号：US09269532B2
公开(公告)日：2016-02-23
申请号：US14709200
申请日：2015-05-11
申请人： NUFLARE TECHNOLOGY, INC.
发明人： Hironori Mizoguchi , Hideo Inoue
IPC分类号： G21K5/04 , H01J37/244 , H01J37/317
CPC分类号： H01J37/244 , H01J37/045 , H01J37/3174 , H01J2237/24514 , H01J2237/24535 , H01J2237/31776
摘要： A charged particle beam writing apparatus includes a first limiting aperture member, in which a first opening is formed, to block a charged particle beam having been blanking-controlled to be beam “off”, and to let a part of the charged particle beam having been blanking-controlled to be beam “on” pass through the first opening, a first detector to detect a first electron amount irradiating the first limiting aperture member, in a state where beam “on” and beam “off” are repeated, a first integration processing unit to generate a first integrated signal by integrating components in a band sufficiently lower than a band of a repetition cycle of beam “on” and beam “off”, in a first detected signal detected for obtaining the first electron amount, and a first irregularity detection unit to detect irregularity in a dose amount of the charged particle beam by using the first integrated signal.
摘要翻译：一种带电粒子束写入装置包括：第一限制孔径构件，其中形成有第一开口，以阻挡被消隐控制的带电粒子束以使其“离开”，并且使带电粒子束的一部分具有被消隐控制为通过第一开口的光束“开”，在重复“光束”和光束“关”的状态下检测照射第一限制光圈部件的第一电子量的第一检测器，第一积分处理单元，用于通过在被检测以获得第一电子量的第一检测信号中积分足够低于波束“开”的重复周期的波段和波束“截止”的波段的分量的分量来产生第一积分信号，以及第一不规则检测单元，通过使用第一积分信号来检测带电粒子束的剂量的不均匀性。

5. 发明申请

US20150200073A1 Ion Implantation System and Method with Variable Energy Control 有权
标题翻译：离子注入系统和可变能量控制方法
公开(公告)号：US20150200073A1
公开(公告)日：2015-07-16
申请号：US14584252
申请日：2014-12-29
申请人： Axcelis Technologies, Inc.
发明人： Causon Ko-Chuan Jen , Marvin Farley
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/302 , H01J2237/047 , H01J2237/24514 , H01J2237/30483
摘要： An ion implantation system and method for implanting ions at varying energies across a workpiece is provided. The system comprises an ion source configured to ionize a dopant gas into a plurality of ions and to form an ion beam. A mass analyzer is positioned downstream of the ion source and configured to mass analyze the ion beam. A deceleration/acceleration stage is positioned downstream of the mass analyzer. An energy filter may form part of the deceleration/acceleration stage or may positioned downstream of the deceleration/acceleration stage. An end station is provided having a workpiece support associated therewith for positioning the workpiece before the ion beam is also provided. A scanning apparatus is configured to scan one or more of the ion beam and workpiece support with respect to one another. One or more power sources are operably coupled to one or more of the ion source, mass analyzer, deceleration/acceleration stage, and energy filter. A controller is configured to selectively vary one or more voltages respectively supplied to one or more of the deceleration/acceleration stage and the energy filter concurrent with the scanning of the ion beam and/or workpiece support, wherein the selective variation of the one or more voltages is based, at least in part, on a position of the ion beam with respect to the workpiece support.
摘要翻译：提供了一种用于在工件上以不同能量注入离子的离子注入系统和方法。该系统包括被配置为将掺杂剂气体离子化成多个离子并形成离子束的离子源。质量分析器位于离子源的下游并且被配置成质量分析离子束。减速/加速阶段位于质量分析仪的下游。能量过滤器可以形成减速/加速阶段的一部分，或者可以位于减速/加速阶段的下游。设置终端站，其具有与其相关联的工件支撑件，用于在还提供离子束之前定位工件。扫描装置被配置为相对于彼此扫描一个或多个离子束和工件支撑件。一个或多个电源可操作地耦合到离子源，质量分析器，减速/加速阶段和能量过滤器中的一个或多个。控制器被配置为选择性地改变与扫描离子束和/或工件支撑件同时提供给减速/加速阶段和能量过滤器中的一个或多个的一个或多个电压，其中一个或多个电压至少部分地基于离子束相对于工件支撑件的位置。

6. 发明申请

US20140117218A1 METHOD AND APPARATUS FOR MONITORING ELECTRON BEAM CONDITION OF SCANNING ELECTRON MICROSCOPE 有权
标题翻译：用于监测扫描电子显微镜电子束条件的方法和装置
公开(公告)号：US20140117218A1
公开(公告)日：2014-05-01
申请号：US13756148
申请日：2013-01-31
申请人： BoXiu CAI , Yi HUANG
发明人： BoXiu CAI , Yi HUANG
IPC分类号： H01J37/26
CPC分类号： H01J37/265 , H01J37/263 , H01J2237/24514 , H01J2237/2826
摘要： A method and an apparatus for monitoring an electron beam condition of an SEM are provided. The SEM includes an electron gun and an electromagnetic lens system. The method includes acquiring quality parameters of an input electron beam, wherein the input electron beam is provided by the electron gun to the electromagnetic lens system, acquiring a current set of operation parameters of the electromagnetic lens system, calculating quality parameters of an output electron beam of the electromagnetic lens system, based on the quality parameters of the input electron beam and one or more operation parameters of the current set of operation parameters, and determining, based on the quality parameters of the output electron beam, whether calibration of the SEM is required.
摘要翻译：提供了一种用于监测SEM的电子束条件的方法和装置。 SEM包括电子枪和电磁透镜系统。该方法包括获取输入电子束的质量参数，其中输入电子束由电子枪提供给电磁透镜系统，获取电磁透镜系统的当前一组操作参数，计算输出电子束的质量参数基于输入电子束的质量参数和当前操作参数组的一个或多个操作参数，并且基于输出电子束的质量参数确定SEM的校准是否为需要。

7. 发明申请

US20130313443A1 EXCITED GAS INJECTION FOR ION IMPLANT CONTROL 有权
标题翻译：激光注射用于离子植入控制
公开(公告)号：US20130313443A1
公开(公告)日：2013-11-28
申请号：US13955009
申请日：2013-07-31
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： Bon-Woong Koo , Victor Benveniste , Christopher A. Rowland , Craig R. Chaney , Frank Sinclair , Neil J. Bassom
IPC分类号： H01J27/02
CPC分类号： H01J27/022 , H01J37/08 , H01J37/3171 , H01J37/32357 , H01J37/32412 , H01J37/32422 , H01J2237/006 , H01J2237/061 , H01J2237/0815 , H01J2237/24514
摘要： An ion source includes an ion chamber housing defining an ion source chamber, the ion chamber housing having a side with a plurality of apertures. The ion source also includes an antechamber housing defining an antechamber. The antechamber housing shares the side with the plurality of apertures with the ion chamber housing. The antechamber housing has an opening to receive a gas from a gas source. The antechamber is configured to transform the gas into an altered state having excited neutrals that is provided through the plurality of apertures into the ion source chamber.
摘要翻译：离子源包括限定离子源室的离子室壳体，离子室壳体具有带有多个孔的侧面。离子源还包括限定前室的前室。前室与离子室外壳共享具有多个孔的侧面。前厅外壳有一个开口，可以接收来自气源的气体。前室被配置成将气体转变成具有通过多个孔提供到离子源室中的具有激发中性粒子的改变状态。

8. 发明申请

US20130134323A1 Electron Beam Profile Measurement System and Method with Optional Faraday Cup 有权
标题翻译：电子束轮廓测量系统和可选法拉第杯的方法
公开(公告)号：US20130134323A1
公开(公告)日：2013-05-30
申请号：US13723269
申请日：2012-12-21
申请人： ATTI INTERNATIONAL SERVICES COMPANY, INC.
发明人： Artush A. Abgaryan , Eli Levi , Thomas Leddy
IPC分类号： H01J3/26
CPC分类号： H01J3/14 , H01J3/26 , H01J37/244 , H01J2237/2446 , H01J2237/24507 , H01J2237/24514 , H01J2237/24542
摘要： Electron beam profile testing and analysis method is introduced using the MOMS apparatus. The MOMS apparatus includes a Faraday Cup with a knife-wires scanning system which together perform simultaneous measurements. The scanning system has a five-dimensional processing mechanism for measuring different cross sections of an e-beam profile in a path of the e-beam. Measurements are conducted using the scanning system by virtually dividing each cross section into a plurality of subsections and measuring independent current values of at least one wire of the scanning system through which the electron beam passes from every pixel in each of the plurality of subsections. By providing relative movement between the scanning system and e-beam, the measured independent current values are analyzed to obtain the functional form of distribution of current density of the cross-section of the e-beam. The Faraday cup enables simultaneous measurement of the total value of the current.
摘要翻译：使用MOMS仪器引入电子束剖面测试和分析方法。 MOMS装置包括具有刀线扫描系统的法拉第杯，它们一起执行同时测量。扫描系统具有用于测量电子束的路径中的电子束轮廓的不同横截面的五维处理机构。使用扫描系统进行测量，通过将每个横截面实际上划分成多个子部分并且测量扫描系统的至少一根导线的独立电流值，电子束通过该电子束从多个子部分中的每一个中的每个像素通过。通过提供扫描系统和电子束之间的相对运动，分析测量的独立电流值以获得电子束横截面的电流密度分布的功能形式。法拉第杯可以同时测量电流的总值。

9. 发明申请

US20130068959A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE 失效
标题翻译：充电颗粒光束绘图设备及其制造方法
公开(公告)号：US20130068959A1
公开(公告)日：2013-03-21
申请号：US13623954
申请日：2012-09-21
申请人： CANON KABUSHIKI KAISHA
发明人： Takehiko SUZUKI , Yoshikiyo YUI
IPC分类号： G21K5/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/244 , H01J2237/043 , H01J2237/24514
摘要： A drawing apparatus includes: a detector configured to output a current in accordance with a pulse of a charged particle beam; and a processor including a capacitor and configured to detect a value of a voltage of the capacitor and to obtain an intensity of the pulse based on a value of a capacitance of the capacitor and the detected voltage value. The processor is configured to detect a current output from the detector in accordance with a charged particle beam incident thereon through a voltage drop, to supply a current having a value determined based on the detected current, to the capacitor to detect a value of a voltage of the capacitor, and to obtain the value of the capacitance based on the determined current value and the detected value of the voltage of the capacitor.
摘要翻译：一种绘图装置，包括：检测器，被配置为根据带电粒子束的脉冲输出电流; 以及包括电容器的处理器，被配置为检测电容器的电压的值，并且基于电容器的电容值和检测到的电压值来获得脉冲的强度。处理器被配置为根据通过电压降入射到其上的带电粒子束来检测来自检测器的电流输出，以将具有基于检测到的电流确定的值的电流提供给电容器，以检测电压值并且基于所确定的电流值和电容器的电压的检测值来获得电容值。

10. 发明授权

US08129695B2 System and method for controlling deflection of a charged particle beam within a graded electrostatic lens 有权
标题翻译：用于控制渐变静电透镜内的带电粒子束的偏转的系统和方法
公开(公告)号：US08129695B2
公开(公告)日：2012-03-06
申请号：US12647950
申请日：2009-12-28
申请人： Peter L. Kellerman , Frank Sinclair , Victor Benveniste , Jun Lu
发明人： Peter L. Kellerman , Frank Sinclair , Victor Benveniste , Jun Lu
IPC分类号： G21K1/06
CPC分类号： H01J37/3171 , H01J37/1477 , H01J2237/053 , H01J2237/12 , H01J2237/24514
摘要： A method and apparatus for controlling deflection, deceleration, and focus of an ion beam are disclosed. The apparatus may include a graded deflection/deceleration lens including a plurality of upper and lower electrodes disposed on opposite sides of an ion beam, as well as a control system for adjusting the voltages applied to the electrodes. The difference in potential between pairs of upper and lower electrodes are varied using a set of “virtual knobs” that are operable to independently control deflection and deceleration of the ion beam. The virtual knobs include control of beam focus and residual energy contamination, control of upstream electron suppression, control of beam deflection, and fine tuning of the final deflection angle of the beam while constraining the beam's position at the exit of the lens. In one embodiment, this is done by fine tuning beam deflection while constraining the beam position at the exit of the VEEF. In another embodiment, this is done by fine tuning beam deflection while measuring the beam position and angle at the wafer plane. In a further embodiment, this is done by tuning a deflection factor to achieve a centered beam at the wafer plane.
摘要翻译：公开了一种用于控制离子束的偏转，减速和聚焦的方法和装置。该装置可以包括梯度偏转/减速透镜，其包括设置在离子束的相对侧上的多个上下电极，以及用于调节施加到电极的电压的控制系统。使用一组“虚拟旋钮”来改变上下电极对之间的电位差，可以独立地控制离子束的偏转和减速。虚拟旋钮包括对束聚焦和剩余能量污染的控制，上游电子抑制的控制，光束偏转的控制以及光束的最终偏转角的微调，同时约束光束在透镜出射处的位置。在一个实施例中，这是通过微调光束偏转来实现的，同时约束在VEEF的出口处的光束位置。在另一个实施例中，这是通过在测量晶片平面处的光束位置和角度时微调光束偏转来完成的。在另一个实施例中，这通过调整偏转因子来实现在晶圆平面处的中心束。

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