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41. 发明申请

US20160056015A1 Radiation Sensor, and its Application in a Charged-Particle Microscope 审中-公开
标题翻译：辐射传感器及其在带电粒子显微镜中的应用
公开(公告)号：US20160056015A1
公开(公告)日：2016-02-25
申请号：US14833947
申请日：2015-08-24
申请人： FEI Company
发明人： Gerard Nicolaas Anne van Veen , Cornelis Sander Kooijman , Luc Roger Simonne Haspeslagh
IPC分类号： H01J37/244 , H01J37/04 , H01J37/285
CPC分类号： H01J37/244 , H01J2237/2441 , H01J2237/2447 , H01J2237/2802 , H01L27/1461 , H01L27/14643 , H01L31/105
摘要： A pixelated CMOS radiation sensor (e.g. in a 4T pinned photodiode device) that comprises a layered structure including: A p-type Si substrate; An n-doped region within said substrate; A p+-doped pinning layer that overlies said n-doped region; An SiOx layer that overlies said p+-doped pinning layer and serves as a Pre-Metal Dielectric or Inter-Metal Dielectric layer, in which a Boron film is deposited between said p+-doped pinning layer and said SiOx layer. Application of such a (pure) Boron film serves to reduce leakage current by one or more orders of magnitude. Even a relatively thin Boron film (e.g. thickness 1-2 nm) can produce this effect.
摘要翻译：包括层状结构的像素化CMOS辐射传感器（例如在4T钉扎光电二极管器件中）包括：P型Si衬底; 所述衬底内的n掺杂区域; 覆盖所述n掺杂区域的p +掺杂的钉扎层; 覆盖所述p +掺杂的钉扎层并用作预金属介电或金属间介电层的SiO x层，其中硼膜沉积在所述p +掺杂的钉扎层和所述SiO x层之间。这种（纯）硼膜的应用用于将泄漏电流减少一个或多个数量级。即使是相对薄的硼膜（例如厚度为1-2nm）也可以产生这种效果。

42. 发明授权

US09263229B2 Device and method for electron emission and device including such an electron emission system 有权
标题翻译：用于电子发射的装置和方法以及包括这种电子发射系统的装置
公开(公告)号：US09263229B2
公开(公告)日：2016-02-16
申请号：US14378386
申请日：2013-02-15
申请人： Arnaud Arbouet , Florent Houdellier
发明人： Arnaud Arbouet , Florent Houdellier
IPC分类号： G21K5/04 , H01J37/073 , H01J37/26 , H01J37/285
CPC分类号： H01J37/073 , H01J37/26 , H01J37/285 , H01J2237/022 , H01J2237/0432 , H01J2237/049 , H01J2237/06333 , H01J2237/06341 , H01J2237/21 , H01J2237/2614 , H01J2237/2626 , H01J2237/2802
摘要： A device and method for emitting electrons by a field effect. The device (10) includes a vacuum chamber (12) including a tip (14) having an end (18) and forming a cold cathode, an extracting anode (16), components adapted for generating a potential difference between the tip (14) and the anode (16); an electromagnetic wave source (22) outside the chamber (12); a system (24) for forwarding the electromagnetic wave emitted by the electromagnetic wave source from the outside to the inside of the chamber as far as the vicinity of the tip (14); a system (26) for focusing the electromagnetic wave, laid out inside the chamber (12); and a system (28) for aligning the electromagnetic wave outside the chamber and adapted for allowing alignment of the electromagnetic wave focused by the focusing system on the end of the tip.
摘要翻译：一种通过场效应发射电子的装置和方法。装置（10）包括一个真空室（12），该真空室包括具有端部（18）并形成冷阴极的尖端（14），提取阳极（16），适于产生尖端（14）和阳极（16）; 在室（12）外部的电磁波源（22）; 一个系统（24），用于将电磁波源发射的电磁波从外部传送到腔室的内部，直到尖端（14）附近; 用于聚焦放置在腔室（12）内的电磁波的系统（26）; 以及用于将所述电磁波对准所述室外并适于允许由所述聚焦系统聚焦的所述电磁波对准所述尖端的端部的系统（28）。

43. 发明授权

US08835842B2 Systems and methods for investigating a characteristic of a material using electron microscopy 有权
标题翻译：用电子显微镜研究材料特性的系统和方法
公开(公告)号：US08835842B2
公开(公告)日：2014-09-16
申请号：US13746382
申请日：2013-01-22
申请人： EDAX Inc.
发明人： Stuart I. Wright , Matthew M. Nowell , Lisa H Chan , Peter A. de Kloe , Tera Lyn Nylese
IPC分类号： H01J37/26 , G01T1/36 , H01J37/29 , H01J37/285 , G01N23/225
CPC分类号： H01J37/26 , G01N23/2251 , G01T1/36 , H01J37/265 , H01J37/285 , H01J37/29 , H01J2237/2505 , H01J2237/28
摘要： Various embodiments of the present invention provide systems and methods for determining an characteristic of a material. The characteristics may include, but are not limited to, crystallographic and chemical composition characteristics of a material.
摘要翻译：本发明的各种实施例提供用于确定材料特性的系统和方法。特征可以包括但不限于材料的晶体学和化学组成特征。

44. 发明申请

US20130332116A1 Electron Microscope and Method of Operating the Same 有权
标题翻译：电子显微镜及其操作方法
公开(公告)号：US20130332116A1
公开(公告)日：2013-12-12
申请号：US13915652
申请日：2013-06-12
申请人： JEOL Ltd.
发明人： Takashi Suzuki
IPC分类号： G06F17/18 , H01J37/285
CPC分类号： G06F17/18 , H01J37/28 , H01J37/285 , H01J2237/06341 , H01J2237/24495 , H01J2237/24507
摘要： An electron microscope and method of operating an electron microscope (1) has an electron beam source (11) for producing an electron beam, a noise canceling aperture (12) for detecting a part of the beam, an amplifier (42), an effective value calculating circuit (44) for extracting DC components of the output signal from the amplifier (42), a detector (15) for detecting a signal obtained in response to impingement of the beam on a sample (A), a preamplifier circuit (20), an amplifier circuit (30), a dividing circuit (54) for performing a division based on the output signal from the amplifier circuit (30) and on the output signal from the amplifier (42), and a multiplier circuit (58) for performing multiplication of the output signal from the dividing circuit (54) and the output from the effective value calculating circuit (44).
摘要翻译：电子显微镜和操作电子显微镜（1）的方法具有用于产生电子束的电子束源（11），用于检测光束的一部分的噪声消除孔（12），放大器（42），有效用于从放大器（42）提取输出信号的DC分量的检测器（15），用于检测响应于样品（A）上的束的撞击而获得的信号的检测器（15），前置放大器电路），放大器电路（30），分频电路（54），用于根据来自放大器电路（30）的输出信号和来自放大器（42）的输出信号进行分频;以及乘法器电路（58）用于执行来自分频电路（54）的输出信号和来自有效值计算电路（44）的输出的乘法运算。

45. 发明授权

US08530837B2 Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen 有权
标题翻译：用于检查样本的带电粒子束装置的对比度改善的布置和方法
公开(公告)号：US08530837B2
公开(公告)日：2013-09-10
申请号：US13204528
申请日：2011-08-05
申请人： Pavel Adamec
发明人： Pavel Adamec
IPC分类号： H01J37/285 , G01N23/00 , G21K7/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2449 , H01J2237/245
摘要： A charged particle beam device for inspecting a specimen includes a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; a retarding field device adapted to accelerate secondary charged particles starting from the specimen, a first detector device having a central opening, includes at least two azimuthal detector segments for detecting secondary particles, wherein the objective lens device is adapted such that particles with different starting angles from the specimen exhibit crossovers at substantially the same distance from the specimen between the objective lens and the detector device, and an aperture located between the objective lens and the crossovers, having an opening which is equal to or smaller than the central opening in the detector device.
摘要翻译：用于检查样本的带电粒子束装置包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 适于加速从样本开始的次级带电粒子的延迟场设备，具有中心开口的第一检测器装置包括至少两个用于检测次级粒子的方位角检测器段，其中物镜装置适于使得起始角度不同的颗粒来自该样本的物镜在与物镜和检测器装置之间的样本基本上相同的距离处展开交叉，以及位于物镜和交越器之间的孔，其具有等于或小于检测器中的中心开口的开口设备。

46. 发明申请

US20120273679A1 X-RAY ANALYSER 审中-公开
标题翻译： X射线分析仪
公开(公告)号：US20120273679A1
公开(公告)日：2012-11-01
申请号：US13511941
申请日：2009-12-07
申请人： Angus Bewick , Santokh Singh Bhadare
发明人： Angus Bewick , Santokh Singh Bhadare
IPC分类号： H01J37/285
CPC分类号： H01J37/244 , H01J37/26 , H01J2237/0203 , H01J2237/024 , H01J2237/2442 , H01J2237/2445 , H01J2237/25
摘要： An x-ray analyser for a transmission electron microscope is described. The analyser has a silicon drift detector moveable in use between an analysis position and a retracted position. The analyser has a housing having an end portion within which the silicon drift detector is retained. The end portion is formed from a material with a relative magnetic permeability of less than 1.004. The analyser also has an automatic retraction system adapted to move the silicon drift detector from the analysis position to the retracted position upon receipt of a trigger signal indicative of a condition in which the power level received by the silicon drift detector from impinging x-rays or electrons is above a predetermined threshold.
摘要翻译：描述透射电子显微镜的X射线分析仪。分析仪具有可在分析位置和缩回位置之间使用的硅漂移检测器。分析仪具有壳体，其具有保持硅漂移检测器的端部部分。端部由相对磁导率小于1.004的材料形成。分析仪还具有自动缩回系统，其适于在接收到指示由硅漂移检测器接收的功率电平撞击X射线的条件的触发信号时将硅漂移检测器从分析位置移动到缩回位置，或电子高于预定阈值。

47. 发明申请

US20120068065A1 PATTERN DEFECT INSPECTION APPARATUS AND PATTERN DEFECT INSPECTION METHOD 有权
标题翻译：图案缺陷检查装置和图案缺陷检查方法
公开(公告)号：US20120068065A1
公开(公告)日：2012-03-22
申请号：US13071360
申请日：2011-03-24
申请人： Tadashi MITSUI
发明人： Tadashi MITSUI
IPC分类号： H01J37/285
CPC分类号： H01J37/28 , H01J37/222 , H01J2237/24592 , H01J2237/2817
摘要： A pattern defect inspection method includes generating electron beam irradiation point track data on the basis of first data on an inspection target pattern, irradiating the electron beam to the inspection target pattern in accordance with the electron beam irradiation point track data, detecting secondary electrons generated from the inspection target pattern due to the irradiation of the electron beam, acquiring second data regarding a signal intensity of the secondary electrons from a signal of the detected secondary electrons, and detecting an abnormal point from the second data and outputting the abnormal point as a defect of the inspection target pattern. The electron beam irradiation point track data includes data on a track of irradiation points of an electron beam to the inspection target pattern and is intended to control over scanning with the electron beam, the electron beam irradiation point track data.
摘要翻译：图案缺陷检查方法包括根据检查目标图案上的第一数据产生电子束照射点轨道数据，根据电子束照射点轨迹数据将电子束照射到检查对象图案，检测从由于电子束的照射引起的检查对象图案，从检测到的二次电子的信号获取关于二次电子的信号强度的第二数据，并从第二数据检测出异常点，并将该异常点输出为缺陷的检查目标模式。电子束照射点轨道数据包括关于电子束到检查目标图案的照射点的轨迹的数据，并且旨在用电子束，电子束照射点轨迹数据控制扫描。

48. 发明申请

US20110278452A1 PATTERN CHECK DEVICE AND PATTERN CHECK METHOD 有权
标题翻译：图案检查装置和图案检查方法
公开(公告)号：US20110278452A1
公开(公告)日：2011-11-17
申请号：US13129201
申请日：2009-10-15
申请人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
发明人： Mari Nozoe , Hiroshi Miyai , Mitsuru Okamura , Makoto Suzuki , Yusuke Ominami
IPC分类号： H01J37/26 , H01J37/285
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/0048 , H01J2237/2008 , H01J2237/24564 , H01J2237/2817 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： Provided is a pattern inspection apparatus including: a charge formation means which forms charge on a surface of a substrate (7) by generating an electron beam from a second electron source (20) which is different from an electron source (I) which generates an electron beam before irradiating an electron beam (3), a current measuring means (34) which measures a value of current flowing in the substrate while the charge is formed on the surface of the substrate by the charge formation means; and an adjustment means (37) which adjusts the charge formed by the charge formation means so that the value of the current measured by the current measuring means is a predetermined target value. Provided is also a pattern inspection method which uses the pattern inspection apparatus. Thus, it is possible to easily set an optimal condition of precharge executed before inspection of a pattern formed by a semiconductor apparatus manufacturing process and automatically inspection whether the precharge is good. Then, the inspection result is fed back to the operation afterward. This prevents lowering of the reliability of the inspection result and always enables a stable inspection.
摘要翻译：提供了一种图案检查装置，包括：电荷形成装置，其通过从不同于电子源（I）的第二电子源（20）产生电子束，在基板（7）的表面上形成电荷，电子束（3）之前的电子束;电流测量装置（34），其通过电荷形成装置测量在基板的表面上形成电荷时在基板中流动的电流值; 以及调整装置，其调整由电荷形成装置形成的电荷，使得由电流测量装置测量的电流的值是预定的目标值。还提供了使用图案检查装置的图案检查方法。因此，可以容易地设定在由半导体装置制造工艺形成的图案的检查之前执行的预充电的最佳状态，并且自动检查预充电是否良好。然后，检查结果反馈给操作。这防止了检查结果的可靠性降低，并且始终能够进行稳定的检查。

49. 发明申请

US20110147585A1 CHARGED PARTICLE ENERGY ANALYSERS 有权
标题翻译：充电颗粒能量分析仪
公开(公告)号：US20110147585A1
公开(公告)日：2011-06-23
申请号：US12739513
申请日：2008-03-31
申请人： Nikolay Alekseevich Kholine , Dane Cubric , Ikuo Konishi
发明人： Nikolay Alekseevich Kholine , Dane Cubric , Ikuo Konishi
IPC分类号： H01J37/285
CPC分类号： H01J49/484
摘要： Charged particle energy analysers enabling simultaneous high transmission and energy resolution are described. The analysers have an electrode structure (11) comprising coaxial inner and outer electrodes (14, 15) having inner and outer electrode surfaces (IS, OS) respectively. The inner and outer electrode surfaces are defined, at least in part, by spheroidal surfaces having meridonal planes of symmetry orthogonal to a longitudinal axis of the electrode structure (11). The inner and outer electrode surfaces are generated by rotation, about the longitudinal axis, of arcs of two non-concentric circles having different radii R2 and R1 respectively, R2 being greater than R1. The distance of the outer electrode surface from the longitudinal axis in the respective meridonal plane is R01 and the distance of the inner electrode surface from the longitudinal axis in the respective plane is R02 and R1, R2, R01 and R02 have a defined relationship.
摘要翻译：描述了实现同时高传输和能量分辨率的带电粒子能量分析器。分析仪具有分别具有内外电极表面（IS，OS）的同轴内外电极（14,15）的电极结构（11）。内电极表面和外电极表面至少部分地由具有与电极结构（11）的纵向轴线正交的对称面对称平面的球形表面限定。内电极表面和外电极表面分别通过具有不同半径R2和R1的两个非同心圆的圆弧的纵轴旋转产生，R2大于R1。外电极表面与各个子午线平面中纵轴的距离为R01，内平面与纵轴的距离为R02，R1，R2，R01，R02为关系。

50. 发明授权

US07470901B2 Charged particle spectrometer and detector therefor 有权
标题翻译：带电粒子光谱仪及其检测器
公开(公告)号：US07470901B2
公开(公告)日：2008-12-30
申请号：US10533570
申请日：2003-11-04
申请人： Simon Charles Page , Colin Duncan Park , Christopher Michael Hopper
发明人： Simon Charles Page , Colin Duncan Park , Christopher Michael Hopper
IPC分类号： H01J47/00 , H01J49/00 , H01J37/02 , H01J37/285
CPC分类号： H01J49/48
摘要： A charged particle (e.g. photoelectron) spectrometer is operable in a first mode to produce an energy spectrum relating to the composition of a sample being analysed, and in a second mode to produce a charged particle image of the surface of the sample being analysed. A detector is used to detect charged particles produced in both modes of operation. A method of operation of the spectrometer includes the step of selecting which of said first and second modes to use and the detector being operated accordingly.
摘要翻译：带电粒子（例如光电子）光谱仪可在第一模式下操作以产生与所分析的样品的组成相关的能谱，并且在第二模式中产生被分析的样品的表面的带电粒子图像。检测器用于检测在两种操作模式下产生的带电粒子。光谱仪的操作方法包括以下步骤：选择要使用的所述第一和第二模式中的哪一种，并且相应地操作检测器。

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