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71. 发明授权

US06969853B2 Pattern width measuring apparatus, pattern width measuring method, and electron beam exposure apparatus 失效
标题翻译：图案宽度测量装置，图案宽度测量方法和电子束曝光装置
公开(公告)号：US06969853B2
公开(公告)日：2005-11-29
申请号：US10664440
申请日：2003-09-18
申请人： Mitsuyuki Asaki , Akira Kintaka
发明人： Mitsuyuki Asaki , Akira Kintaka
IPC分类号： G01B15/00 , G01Q20/00 , G01Q30/02 , G03F1/84 , G03F1/86 , G03F7/20 , H01J37/00 , H01J37/244 , H01J37/28 , H01J37/305 , H01L21/027 , H01L21/66 , H01J27/244
CPC分类号： H01J37/28 , H01J2237/2814 , H01J2237/2817
摘要： A pattern width measuring apparatus for accurately measuring pattern width of a pattern formed on a wafer using an electron beam. The pattern width measuring apparatus includes: an electron gun for generating the electron beam; a deflector for scanning the pattern with the electron beam by deflecting the electron beam; a first secondary electron detector and a second secondary electron detector for detecting secondary electrons generated when the electron beam is irradiated on the pattern; a first edge detector for detecting position of a first edge of the pattern based on the quantity of the secondary electrons detected by the first secondary electron detector; a second edge detector for detecting position of a second edge of the pattern based on the quantity of the secondary electrons detected by the second secondary electron detector; and a pattern width computing section for computing pattern width of the pattern based on the position of the first edge and the position of the second edge detected by the first edge detector and the second edge detector.
摘要翻译：一种用于使用电子束精确测量在晶片上形成的图案的图形宽度的图案宽度测量装置。图案宽度测量装置包括：用于产生电子束的电子枪; 用于通过偏转电子束用电子束扫描图案的偏转器; 第一二次电子检测器和第二二次电子检测器，用于检测当电子束照射在图案上时产生的二次电子; 第一边缘检测器，用于基于由第一二次电子检测器检测到的二次电子的量来检测图案的第一边缘的位置; 第二边缘检测器，用于基于由第二二次电子检测器检测到的二次电子的量来检测图案的第二边缘的位置; 以及图案宽度计算部分，用于基于由第一边缘检测器和第二边缘检测器检测到的第一边缘的位置和第二边缘的位置来计算图案的图案宽度。

72. 发明授权

US06967328B2 Method for the electron-microscopic observation of a semiconductor arrangement and apparatus therefor 有权
标题翻译：半导体装置的电子显微镜观察方法及其装置
公开(公告)号：US06967328B2
公开(公告)日：2005-11-22
申请号：US10614825
申请日：2003-07-09
申请人： Oliver Kienzle , Rainer Knippelmeyer , Ingo Müller
发明人： Oliver Kienzle , Rainer Knippelmeyer , Ingo Müller
IPC分类号： H01L21/66 , G01N23/00 , G01N23/225 , G01Q20/00 , G01Q30/02 , G01Q30/04 , G21K7/00 , H01J37/05 , H01J37/244 , H01J37/28 , H01J37/29
CPC分类号： H01J37/28 , H01J2237/2817
摘要： A method for the electron-microscopic observation of a semiconductor arrangement is provided. It includes providing an electron microscopy optics for imaging secondary electrons emanating from the semiconductor arrangement within an extended object field on a position-sensitive detector, providing an illumination device for emitting a primary energy beam, directing the primary energy beam to at least the object field for extracting there secondary electrons from the semiconductor arrangement. The semiconductor arrangement comprises a region with an upper surface provided by a first material and a recess with a high aspect ratio which is surrounded by the upper surface and has a bottom provided by a second material.
摘要翻译：提供了一种用于电子显微镜观察半导体装置的方法。它包括提供电子显微镜光学器件，用于对在位置敏感检测器上的扩展物体场内的半导体布置发射的二次电子进行成像，提供用于发射一次能量束的照明装置，将一次能量束引导至少一个物场用于从半导体装置中提取二次电子。半导体装置包括具有由第一材料提供的上表面的区域和具有高纵横比的凹槽，其被上表面包围并具有由第二材料提供的底部。

73. 发明授权

US06930308B1 SEM profile and surface reconstruction using multiple data sets 有权
标题翻译：使用多个数据集的SEM轮廓和表面重构
公开(公告)号：US06930308B1
公开(公告)日：2005-08-16
申请号：US10265520
申请日：2002-10-03
申请人： Gian Francesco Lorusso , Robert Anthony Watts , Alexander Jozef Gubbens , Laurence Stuart Hordon
发明人： Gian Francesco Lorusso , Robert Anthony Watts , Alexander Jozef Gubbens , Laurence Stuart Hordon
IPC分类号： G01Q20/00 , G01Q30/02 , G01N23/00 , G01N23/225 , G01Q30/04
CPC分类号： G01N23/2251 , H01J2237/226 , H01J2237/2611 , H01J2237/28
摘要： A highly accurate technique for inspecting semiconductor devices is described. The technique involves utilizing multiple sets of measurement data obtained by a scanning electron microscope (SEM) to determine the dimensional parameters of a semiconductor device. The SEM collects each set of data from a different angular orientation with respect to the device. The dimensional parameters of the semiconductor device are determined by analyzing the relationship between the SEM inspection angle and the collected data sets. Various configurations of an SEM can be used to implement this invention. For instance an electron beam inspection system of the present invention can have at least two sets of deflectors for guiding the electron beam, a swiveling specimen stage, and/or a set of detectors set about the specimen at different angular orientations.
摘要翻译：描述了用于检查半导体器件的高精度技术。该技术涉及利用扫描电子显微镜（SEM）获得的多组测量数据来确定半导体器件的尺寸参数。 SEM从相对于设备的不同角度取向收集每组数据。通过分析SEM检查角度与收集的数据集之间的关系来确定半导体器件的尺寸参数。可以使用SEM的各种构造来实现本发明。例如，本发明的电子束检查系统可以具有用于引导电子束的至少两组偏转器，旋转样品台和/或在不同角度方向上围绕样本设置的一组检测器。

74. 发明授权

US06927400B2 Sample manipulation system 有权
标题翻译：样品操作系统
公开(公告)号：US06927400B2
公开(公告)日：2005-08-09
申请号：US10801477
申请日：2004-03-12
申请人： Jørgen Rasmussen
发明人： Jørgen Rasmussen
IPC分类号： G01N1/04 , G01N1/08 , G01N1/28 , G01Q20/00 , G01Q60/00 , H01J37/20
CPC分类号： H01J37/20 , G01N1/04 , G01N1/08 , G01N1/286 , G01N2001/282 , H01J2237/2007 , H01J2237/204
摘要： A sample manipulator that includes a shaft, a proximal end, a distal end that includes a sample holder and a support arm having both a retracted position and a deployed position. The support arm is configured to support a sample associated with the sample holder when the support arm is in the deployed position.
摘要翻译：一种样品操纵器，其包括轴，近端，包括样品保持器的远端和具有缩回位置和展开位置的支撑臂。支撑臂配置成当支撑臂处于展开位置时支撑与样品架相关联的样品。

75. 发明申请

US20050151077A1 Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope 有权
公开(公告)号：US20050151077A1
公开(公告)日：2005-07-14
申请号：US11077904
申请日：2005-03-11
申请人： Masahiro Watanabe , Toshihiko Nakata
发明人： Masahiro Watanabe , Toshihiko Nakata
IPC分类号： G01B21/16 , G01B21/30 , G01Q10/00 , G01Q10/02 , G01Q10/04 , G01Q10/06 , G01Q20/00 , G01Q20/02 , G01Q30/02 , G01Q30/20 , G01Q60/24 , G01Q60/32 , H01L21/66 , G01B5/28
CPC分类号： G01Q10/06 , G01Q10/02 , G01Q20/02 , G01Q60/32 , Y10S977/852
摘要： In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.

76. 发明申请

US20050082476A1 Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the same 有权
标题翻译：电子束检查方法及装置及半导体制造方法及其制造线
公开(公告)号：US20050082476A1
公开(公告)日：2005-04-21
申请号：US11003506
申请日：2004-12-06
申请人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
发明人： Takashi Hiroi , Maki Tanaka , Masahiro Watanabe , Asahiro Kuni , Yukio Matsuyama , Yuji Takagi , Hiroyuki Shinada , Mari Nozoe , Aritoshi Sugimoto
IPC分类号： G01Q20/00 , G01Q30/04 , G01Q30/02 , G01Q60/00 , H01J37/20 , H01J37/22 , H01J37/256 , H01J37/28 , H01L21/66 , G01N23/00
CPC分类号： H01J37/28 , H01J2237/2817
摘要： An inspection method and apparatus includes control of an acceleration voltage of an electron beam, irradiation of the electron beam to an object to be inspected mounted on a stage which is continuously moving at least in one direction, and detection of at least one of secondary electrons and reflected electrons emanated from the object in response to the irradiation. An image of the object is obtained from the detected electron by using positional information of the stage and inspection or measurement of the object is conducted using and obtained image. In the detection, an electric field in the vicinity of the object mounted on the stage is controlled so that at least one secondary electrons and the reflected electrons emanated from the object in response to the irradiation of the electron beam are decelerated.
摘要翻译：检查方法和装置包括控制电子束的加速电压，将电子束照射到安装在至少在一个方向上连续移动的台上的被检查物体，以及二次电子中的至少一个的检测以及响应于照射从物体发射的反射电子。通过使用舞台的位置信息从被检测的电子获得对象的图像，并使用获得的图像进行对象的检查或测量。在检测中，控制安装在平台上的物体附近的电场，使得响应于电子束的照射而从物体发出的至少一个二次电子和反射电子减速。

77. 发明申请

US20050005688A1 Dual stage instrument for scanning a specimen 有权
标题翻译：用于扫描样品的双级仪器
公开(公告)号：US20050005688A1
公开(公告)日：2005-01-13
申请号：US10867922
申请日：2004-06-14
申请人： Amin Samsavar , William Wheeler , Steven Eaton , Jian-Ping Zhuang
发明人： Amin Samsavar , William Wheeler , Steven Eaton , Jian-Ping Zhuang
IPC分类号： G01Q70/06 , G01B3/00 , G01B5/28 , G01B7/34 , G01B21/30 , G01Q10/02 , G01Q10/04 , G01Q20/00 , G01Q60/00 , G01Q90/00 , G12B5/00
CPC分类号： G01Q10/04 , G01B3/008 , G01B7/34 , G01Q10/02 , G01Q30/02 , G01Q70/06 , Y10S977/834 , Y10S977/849 , Y10S977/852 , Y10S977/867 , Y10S977/868 , Y10S977/872 , Y10S977/874
摘要： A dual stage scanning instrument includes a sensor for sensing a parameter of a sample and coarse and fine stages for causing relative motion between the sensor and the sample. The coarse stage has a resolution of about 1 micrometer and the fine stage has a resolution of 1 nanometer or better. The sensor is used to sense the parameter when both stages cause relative motion between the sensor assembly and the sample. The sensor may be used to sense height variations of the sample surface as well as thermal variations, electrostatic, magnetic, light reflectivity or light transmission parameters at the same time when height variation is sensed. By performing along scan at a coarser resolution and short scans a high resolution using the same probe tip or two probe tips at fixed relative positions, data obtained from the long and short scans can be correlated accurately.
摘要翻译：双级扫描仪器包括用于感测样品参数的传感器和用于引起传感器和样品之间的相对运动的粗细级和细级级的传感器。粗糙度分辨率约为1微米，细微分辨率为1纳米或更好。当传感器组件和样品之间产生相对运动时，传感器用于检测参数。传感器可用于在检测到高度变化的同时检测样品表面的高度变化以及热变化，静电，磁性，光反射率或光传输参数。通过以更粗糙的分辨率执行扫描，并且在固定的相对位置使用相同的探针尖端或两个探针尖端短扫描高分辨率，可以精确地相关联从长扫描和短扫描得到的数据。

78. 发明授权

US5929643A Scanning probe microscope for measuring the electrical properties of the surface of an electrically conductive sample 失效
标题翻译：扫描探针显微镜，用于测量导电样品表面的电性能
公开(公告)号：US5929643A
公开(公告)日：1999-07-27
申请号：US757131
申请日：1996-12-03
申请人： Nobuaki Sakai , Katsuhiro Matsuyama
发明人： Nobuaki Sakai , Katsuhiro Matsuyama
IPC分类号： G01Q20/00 , G01R1/067 , G01R11/00
CPC分类号： G01R1/06705 , B82Y35/00 , G01Q60/30 , Y10S977/852 , Y10S977/864
摘要： A scanning probe microscope for measuring the electrical properties of the surface of a sample comprises a first sensor for detecting electrical information for the sample surface and outputting a first electrical signal corresponding thereto, the first sensor including an electrically conductive probe located near the surface of the sample, a second sensor for detecting the distance between the probe and the sample and outputting a second electrical signal corresponding thereto, an actuator for relatively moving the probe and the sample in a three-dimensional manner, a servo control mechanism for adjusting the distance between the probe and the sample to a desired value by servo control in accordance with the second electrical signal while the electrical information is being detected by the first sensor, and a processing unit for processing the first electrical signal.
摘要翻译：用于测量样品表面的电性能的扫描探针显微镜包括用于检测样品表面的电信息并输出与其对应的第一电信号的第一传感器，所述第一传感器包括位于所述样品表面的表面附近的导电探针样品，用于检测探针和样品之间的距离并输出与其对应的第二电信号的第二传感器，用于以三维方式相对移动探针和样品的致动器，用于调节探针和样品之间的距离的伺服控制机构，所述探针和所述样品在所述电信息被所述第一传感器检测到的同时根据所述第二电信号进行伺服控制而达到期望值;以及处理单元，用于处理所述第一电信号。

79. 发明授权

US5675145A Scanning probe microscope having an optical system for enabling identification of the scanning region and sample observation during a scanning operation 失效
标题翻译：扫描探针显微镜具有用于在扫描操作期间能够识别扫描区域和样品观察的光学系统
公开(公告)号：US5675145A
公开(公告)日：1997-10-07
申请号：US498661
申请日：1995-07-03
申请人： Akitoshi Toda , Takeshi Konada
发明人： Akitoshi Toda , Takeshi Konada
IPC分类号： G01B11/30 , G01N37/00 , G01Q20/00 , G01Q30/02 , G01Q60/18 , H01J3/14
CPC分类号： G01Q60/22 , B82Y20/00 , B82Y35/00 , Y10S977/862
摘要： A scanning probe microscope includes a probe having a minute aperture formed in a distal end thereof. The probe allows light to propagate therethrough and is located close to a sample. A moving device is provided for relatively moving the probe across a surface of the sample, and an observation optical system is provided for optically observing the sample. A light source emits a light beam for generating evanescent waves, and a beam irradiation device is provided for irradiating the light beam on the sample so that the light beam is totally reflected by an optical interface of the sample. The beam irradiation means and the observation optical system share an objective located on a side of the sample opposite to the probe. A light detecting device is provided for detecting an intensity of the light introduced into the probe through the aperture formed in the distal end of the probe.
摘要翻译：扫描探针显微镜包括在其远端形成有微小孔的探针。探头允许光线通过其传播并位于样品附近。提供移动装置用于使探针相对移动穿过样品的表面，并且提供用于光学观察样品的观察光学系统。光源发射用于产生ev逝波的光束，并且提供束照射装置用于将光束照射在样品上，使得光束被样品的光学界面全反射。光束照射装置和观察光学系统共享位于与探针相对的样品一侧的物镜。提供了一种光检测装置，用于通过形成在探针的远端中的孔来检测引入探针的光的强度。

80. 发明授权

US5620854A Method for identifying biochemical and chemical reactions and micromechanical processes using nanomechanical and electronic signal identification 失效
标题翻译：使用纳米机电和电子信号识别识别生物化学和化学反应和微机械过程的方法
公开(公告)号：US5620854A
公开(公告)日：1997-04-15
申请号：US402800
申请日：1995-03-13
申请人： John F. Holzrichter , Wigbert J. Siekhaus
发明人： John F. Holzrichter , Wigbert J. Siekhaus
IPC分类号： C12P19/34 , C12Q1/68 , G01Q20/00 , G01Q60/04 , G01Q60/18 , G01Q60/24 , G01Q60/42 , G01N21/00 , G01N33/53
CPC分类号： G01Q60/42 , B82Y35/00 , C12Q1/6869 , G01Q60/04 , Y10S977/853
摘要： A scanning probe microscope, such as an atomic force microscope (AFM) or a scanning tunneling microscope (STM), is operated in a stationary mode on a site where an activity of interest occurs to measure and identify characteristic time-varying micromotions caused by biological, chemical, mechanical, electrical, optical, or physical processes. The tip and cantilever assembly of an AFM is used as a micromechanical detector of characteristic micromotions transmitted either directly by a site of interest or indirectly through the surrounding medium. Alternatively, the exponential dependence of the tunneling current on the size of the gap in the STM is used to detect micromechanical movement. The stationary mode of operation can be used to observe dynamic biological processes in real time and in a natural environment, such as polymerase processing of DNA for determining the sequence of a DNA molecule.
摘要翻译：诸如原子力显微镜（AFM）或扫描隧道显微镜（STM）的扫描探针显微镜在静息模式下在感兴趣的活动位置进行操作，以测量和识别由生物引起的特征性时变微型，化学，机械，电气，光学或物理过程。 AFM的尖端和悬臂组件被用作直接由感兴趣的位置或间接地通过周围介质传输的特征微观测量的微机械探测器。或者，隧道电流对STM中间隙大小的指数依赖性用于检测微机械运动。固定操作模式可以用于实时和自然环境中观察动态生物过程，例如用于确定DNA分子序列的DNA的聚合酶处理。

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