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    • 2. 发明申请
    • Micro-Electromechanical System Memory Device and Method of Making the Same
    • 微机电系统存储器及其制作方法
    • US20090134522A1
    • 2009-05-28
    • US12085506
    • 2006-11-22
    • Charles Gordon SmithRobert KazincziRobertus P. Van Kampen
    • Charles Gordon SmithRobert KazincziRobertus P. Van Kampen
    • H01L29/45H01L21/441
    • B81C1/00666B81B3/001B81B2203/0118B81C2201/0109G11C23/00
    • A method of manufacturing a non-volatile memory bitcell comprises the steps of depositing a first layer of conductive material on a substrate and patterning and etching the first layer of conductive material to form three non-linearly disposed electrodes. The method also comprises the steps of depositing a first layer of sacrificial material on the electrodes and the substrate and providing an elongate cantilever structure on the first layer of sacrificial material such that the cantilever structure and at least a portion of each electrode overlap each other. The method also includes the steps of depositing a second layer of sacrificial material on the cantilever structure and the first layer of sacrificial material and providing a capping layer on the second layer of sacrificial material and providing holes in the capping layer such that at least a portion of the second layer of sacrificial material is exposed. Finally, the method provides the step of removing the first and second layers of sacrificial material through the holes provided in the capping layer, thereby defining a cavity in which the cantilever structure is suspended.
    • 一种制造非易失性存储器位单元的方法包括以下步骤:将第一层导电材料沉积在衬底上,并对第一层导电材料进行图案化和蚀刻以形成三个非线性布置的电极。 该方法还包括以下步骤:在电极和衬底上沉积牺牲材料的第一层,并在第一牺牲材料层上提供细长的悬臂结构,使得悬臂结构和每个电极的至少一部分彼此重叠。 该方法还包括以下步骤:将第二层牺牲材料沉积在悬臂结构和第一牺牲材料层上,并在牺牲材料的第二层上提供覆盖层,并在封盖层中提供孔,使得至少一部分 的第二层牺牲材料被暴露。 最后,该方法提供了通过设置在覆盖层中的孔去除第一层和第二层牺牲材料的步骤,从而限定悬臂悬臂结构的空腔。
    • 4. 发明授权
    • Method of enclosing a micro-electromechanical element
    • 封闭微机电元件的方法
    • US07867886B2
    • 2011-01-11
    • US12085428
    • 2006-11-22
    • Charles Gordon SmithRobertus P. Van Kampen
    • Charles Gordon SmithRobertus P. Van Kampen
    • H01L21/445B81C1/00H01L23/525
    • B81C1/00333H01L23/5256H01L2924/0002H01L2924/00
    • A method, in a complementary metal oxide semiconductor fabrication process, of creating a layered housing containing a micro-electromechanical system device, the method comprising the steps of providing a cavity in at least one layer of the housing, the cavity being accessible through via holes in a layer of insulating material deposited thereon, and the layer of insulating material being covered by a thin film layer of conductive material. The method further comprises the step of hydrophobically treating at least a portion of the inner surface of the cavity. Finally the method comprises the steps of submerging the wafer in an electroplating solution and electroplating a conductive layer onto the thin film layer of conductive material such that the cavity remains free of electroplating solution.
    • 在互补金属氧化物半导体制造工艺中,制造包含微机电系统器件的分层壳体的方法,所述方法包括以下步骤:在所述壳体的至少一层中提供空腔,所述空腔可通过通孔 在其上沉积的绝缘材料层中,并且绝缘材料层被导电材料的薄膜层覆盖。 该方法还包括对空腔的内表面的至少一部分进行疏水处理的步骤。 最后,该方法包括以下步骤:将晶片浸入电镀溶液中,并将导电层电镀到导电材料的薄膜层上,使得空腔保持不含电镀溶液。
    • 6. 发明申请
    • Method of Enclosing a Micro-Electromechanical Element
    • 封闭微机电元件的方法
    • US20090298215A1
    • 2009-12-03
    • US12085428
    • 2006-11-22
    • Charles Gordon SmithRobertus P. Van Kampen
    • Charles Gordon SmithRobertus P. Van Kampen
    • H01L21/50
    • B81C1/00333H01L23/5256H01L2924/0002H01L2924/00
    • A method, in a complementary metal oxide semiconductor fabrication process, of creating a layered housing containing a micro-electromechanical system device, the method comprising the steps of providing a cavity in at least one layer of the housing, the cavity being accessible through via holes in a layer of insulating material deposited thereon, and the layer of insulating material being covered by a thin film layer of conductive material. The method further comprises the step of hydrophobically treating at least a portion of the inner surface of the cavity. Finally the method comprises the steps of submerging the wafer in an electroplating solution and electroplating a conductive layer onto the thin film layer of conductive material such that the cavity remains free of electroplating solution.
    • 在互补金属氧化物半导体制造工艺中,制造包含微机电系统器件的分层壳体的方法,所述方法包括以下步骤:在所述壳体的至少一层中提供空腔,所述空腔可通过通孔 在其上沉积的绝缘材料层中,并且绝缘材料层被导电材料的薄膜层覆盖。 该方法还包括对空腔的内表面的至少一部分进行疏水处理的步骤。 最后,该方法包括以下步骤:将晶片浸入电镀溶液中,并将导电层电镀到导电材料的薄膜层上,使得空腔保持不含电镀溶液。
    • 7. 发明授权
    • Microfluidic movement
    • 微流控运动
    • US07063778B2
    • 2006-06-20
    • US10501440
    • 2003-01-14
    • Moeketsi MpholoBenjamin BrownCharles Gordon Smith
    • Moeketsi MpholoBenjamin BrownCharles Gordon Smith
    • G01N27/447
    • B01F13/0076B01L3/502707B01L3/50273B01L3/502784B01L2300/0887B01L2400/0415F04B19/006
    • An apparatus for driving small volumes of fluid. The apparatus comprises a substrate and a first array of electrically conductive electrodes formed on the substrate. A second array of electrically conductive electrodes formed on the substrate, the first and second array being interlaced and being arranged such that each of the electrodes in the second array has a width in a fluid driving direction which is greater than that of each of the electrodes in the first array and such that the first and second set electrodes are positioned so that each of the electrodes of the first set is not at a position equidistant from adjacent electrodes of the second set, wherein both of the arrays of the arrays of electrode having widths in the fluid flow direction and thickness selected such that, in use, by varying the peak value of an alternating drive voltage applied thereto the direction of flow of a fluid adjacent to the arrays of electrodes can be controlled.
    • 用于驱动小体积流体的装置。 该装置包括基板和形成在基板上的导电电极的第一阵列。 形成在基板上的第二导电电极阵列,第一和第二阵列交织并且被布置成使得第二阵列中的每个电极具有大于每个电极的电极的流体驱动方向上的宽度 在第一阵列中并且使得第一和第二固定电极被定位成使得第一组的每个电极不在与第二组的相邻电极等距的位置,其中电极阵列的两个阵列具有 流体流动方向上的宽度和厚度被选择,使得在使用中,通过改变施加到其上的交替驱动电压的峰值可以控制与电极阵列相邻的流体的流动方向。