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1. 发明授权

US08475591B2 Method of controlling a thickness of a sheet formed from a melt 有权
标题翻译：控制由熔体形成的片材的厚度的方法
公开(公告)号：US08475591B2
公开(公告)日：2013-07-02
申请号：US12539125
申请日：2009-08-11
申请人： Peter L. Kellerman , Fredrick Carlson , Frank Sinclair
发明人： Peter L. Kellerman , Fredrick Carlson , Frank Sinclair
IPC分类号： C30B15/20
CPC分类号： C30B29/06 , C30B11/001 , C30B11/003 , C30B28/06 , C30B29/403 , C30B29/406 , C30B29/52 , C30B29/64 , H01L31/182 , Y02E10/546 , Y02P70/521 , Y10T117/1024
摘要： A method and apparatus for forming a sheet are disclosed. A melt is cooled and a sheet is formed on the melt. This sheet has a first thickness. The sheet is then thinned from the first thickness to a second thickness using, for example, a heater or the melt. The cooling may be configured to allow solutes to be trapped in a region of the sheet and this particular sheet may be thinned and the solutes removed. The melt may be, for example, silicon, silicon and germanium, gallium, or gallium nitride.
摘要翻译：公开了一种用于形成片材的方法和装置。将熔体冷却并在熔体上形成片材。该片材具有第一厚度。然后使用例如加热器或熔体将片材从第一厚度变薄至第二厚度。冷却可以被配置为允许溶质被捕获在片材的区域中，并且该特定片材可以变薄并且去除溶质。熔体可以是例如硅，硅和锗，镓或氮化镓。

2. 发明申请

US20110271901A1 REMOVAL OF A SHEET FROM A PRODUCTION APPARATUS 有权
标题翻译：从生产设备中取出一张纸
公开(公告)号：US20110271901A1
公开(公告)日：2011-11-10
申请号：US13187039
申请日：2011-07-20
申请人： Peter L. Kellerman , Frederick Carlson , Frank Sinclair
发明人： Peter L. Kellerman , Frederick Carlson , Frank Sinclair
IPC分类号： C30B35/00 , C30B15/06 , C30B11/02
CPC分类号： C30B11/003 , C30B11/001 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/403 , C30B29/64 , H01L31/182 , Y02E10/546 , Y02P70/521 , Y10S588/90 , Y10T117/1024 , Y10T117/1092
摘要： A melt of a material is cooled and a sheet of the material is formed in the melt. This sheet is transported, cut into at least one segment, and cooled in a cooling chamber. The material may be Si, Si and Ge, Ga, or GaN. The cooling is configured to prevent stress or strain to the segment. In one instance, the cooling chamber has gas cooling.
摘要翻译：将材料的熔体冷却，并在熔体中形成一片材料。将该片材运输，切割成至少一个片段，并在冷却室中冷却。该材料可以是Si，Si和Ge，Ga或GaN。冷却配置为防止应力或应变。在一种情况下，冷却室具有气体冷却。

3. 发明申请

US20110271899A1 REMOVING A SHEET FROM THE SURFACE OF A MELT USING GAS JETS 有权
标题翻译：从使用气体喷嘴的熔体表面去除表面
公开(公告)号：US20110271899A1
公开(公告)日：2011-11-10
申请号：US13037789
申请日：2011-03-01
申请人： Peter L. Kellerman , Gregory D. Thronson , Dawei Sun
发明人： Peter L. Kellerman , Gregory D. Thronson , Dawei Sun
IPC分类号： C30B15/06 , C30B11/02
CPC分类号： C30B35/00 , C30B9/00 , C30B11/00 , C30B15/00 , C30B15/002 , C30B15/06 , C30B15/22 , C30B15/24 , C30B15/34 , C30B28/10 , C30B29/06 , C30B29/52 , C30B29/64 , Y10T117/1048 , Y10T117/1092
摘要： In one embodiment, a sheet production apparatus comprises a vessel configured to hold a melt of a material. A cooling plate is disposed proximate the melt and is configured to form a sheet of the material on the melt. A first gas jet is configured to direct a gas toward an edge of the vessel. A sheet of a material is translated horizontally on a surface of the melt and the sheet is removed from the melt. The first gas jet may be directed at the meniscus and may stabilize this meniscus or increase local pressure within the meniscus.
摘要翻译：在一个实施例中，片材生产设备包括构造成容纳材料的熔体的容器。冷却板靠近熔体设置并且被配置成在熔体上形成材料片。第一气体喷射器构造成将气体引向容器的边缘。一片材料在熔体的表面上水平地平移，并且片材从熔体中移除。第一气体射流可以指向弯月面并且可以稳定该弯液面或增加弯液面内的局部压力。

4. 发明授权

US07855087B2 Floating sheet production apparatus and method 有权
标题翻译：浮板生产设备及方法
公开(公告)号：US07855087B2
公开(公告)日：2010-12-21
申请号：US12403206
申请日：2009-03-12
申请人： Peter L. Kellerman , Frank Sinclair
发明人： Peter L. Kellerman , Frank Sinclair
IPC分类号： H01L21/00
CPC分类号： H01L31/02 , C30B15/06 , C30B15/14 , C30B15/30 , C30B28/10 , C30B29/06
摘要： This sheet production apparatus comprises a vessel defining a channel configured to hold a melt. The melt is configured to flow from a first point to a second point of the channel. A cooling plate is disposed proximate the melt and is configured to form a sheet on the melt. A spillway is disposed at the second point of the channel. This spillway is configured to separate the sheet from the melt.
摘要翻译：该片材生产设备包括限定被配置为保持熔体的通道的容器。熔体构造成从通道的第一点流到第二点。冷却板靠近熔体设置并且被配置成在熔体上形成片材。溢流道设置在通道的第二点。该溢流道构造成将片材与熔体分离。

5. 发明申请

US20100171042A1 TECHNIQUES FOR INDEPENDENTLY CONTROLLING DEFLECTION, DECELERATION AND FOCUS OF AN ION BEAM 有权
标题翻译：用于独立控制离子束的偏转，减弱和聚焦的技术
公开(公告)号：US20100171042A1
公开(公告)日：2010-07-08
申请号：US12348091
申请日：2009-01-02
申请人： Peter L. KELLERMAN , Svetlana Radovanov , Frank Sinclair , Victor M. Benveniste
发明人： Peter L. KELLERMAN , Svetlana Radovanov , Frank Sinclair , Victor M. Benveniste
IPC分类号： H01J3/14
CPC分类号： H01J37/1471 , H01J37/12 , H01J37/3171
摘要： Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.
摘要翻译：公开了用于独立地控制离子束的偏转，减速和聚焦的技术。在一个特定的示例性实施例中，这些技术可以被实现为用于独立地控制离子束的偏转，减速和聚焦的装置。该装置可以包括电极配置，其包括设置在离子束上方的一组上电极和设置在离子束下方的一组下电极。所述上电极组和下电极组可以围绕离子束的中心射线轨迹对称地定位。上部电极组和下部电极组之间的电位差也可以沿着中心射线轨迹变化，以反映沿着中心射线轨迹的每个点处的离子束的能量，以独立地控制偏转，减速和聚焦的离子束。

6. 发明授权

US07675047B2 Technique for shaping a ribbon-shaped ion beam 有权
标题翻译：用于成形带状离子束的技术
公开(公告)号：US07675047B2
公开(公告)日：2010-03-09
申请号：US11536992
申请日：2006-09-29
申请人： Svetlana B. Radovanov , Peter L. Kellerman , Victor M. Benveniste , Robert C. Lindberg , Kenneth H. Purser , Tyler B. Rockwell , James S. Buff , Anthony Renau
发明人： Svetlana B. Radovanov , Peter L. Kellerman , Victor M. Benveniste , Robert C. Lindberg , Kenneth H. Purser , Tyler B. Rockwell , James S. Buff , Anthony Renau
IPC分类号： H01J37/10 , H01J37/317
CPC分类号： H01J37/12 , H01J37/3007 , H01J37/3171 , H01J2237/083 , H01J2237/121
摘要： A technique for shaping a ribbon-shaped ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for shaping a ribbon-shaped ion beam. The apparatus may comprise an electrostatic lens having a substantially rectangular aperture for a ribbon-shaped ion beam to pass through, wherein a plurality of focusing elements are positioned along short edges of the aperture, and wherein each focusing element is separately biased and oriented to shape the ribbon-shaped ion beam.
摘要翻译：公开了一种用于成形带状离子束的技术。在一个特定的示例性实施例中，该技术可以被实现为用于成形带状离子束的装置。该设备可以包括具有用于带状离子束通过的基本上矩形的孔的静电透镜，其中多个聚焦元件沿着孔的短边缘定位，并且其中每个聚焦元件被单独偏置并定向成形带状离子束。

7. 发明申请

US20090231597A1 FLOATING SHEET MEASUREMENT APPARATUS AND METHOD 有权
标题翻译：浮动片测量装置和方法
公开(公告)号：US20090231597A1
公开(公告)日：2009-09-17
申请号：US12403200
申请日：2009-03-12
申请人： Christopher A. ROWLAND , Peter L. Kellerman , Frank Sinclair , Julian G. Blake , Nicholas P.T. Bateman
发明人： Christopher A. ROWLAND , Peter L. Kellerman , Frank Sinclair , Julian G. Blake , Nicholas P.T. Bateman
IPC分类号： G01B11/02
CPC分类号： G01B21/12
摘要： A sheet measurement apparatus has a sheet disposed in a melt. The measurement system uses a beam to determine a dimension of the sheet. This dimension may be, for example, height or width. The beam may be, for example, collimated light, a laser, x-rays, or gamma rays. The production of the sheet may be altered based on the measurements.
摘要翻译：片材测量装置具有设置在熔体中的片材。测量系统使用光束来确定纸张的尺寸。该尺寸可以是例如高度或宽度。光束可以是例如准直光，激光，X射线或γ射线。可以基于测量来改变片材的生产。

8. 发明授权

US07394079B2 Architecture for ribbon ion beam ion implanter system 有权
标题翻译：带状离子束离子注入机系统的结构
公开(公告)号：US07394079B2
公开(公告)日：2008-07-01
申请号：US11275772
申请日：2006-01-27
申请人： Kourosh Saadatmand , Peter L. Kellerman
发明人： Kourosh Saadatmand , Peter L. Kellerman
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/3007 , H01J2237/0492
摘要： An architecture for a ribbon ion beam ion implanter system is disclosed. In one embodiment, the architecture includes an acceleration/deceleration parallelizing lens system for receiving a fanned ribbon ion beam and for at least parallelizing (and perhaps also accelerate or decelerate) the fanned ribbon ion beam into a substantially parallel ribbon ion beam, and an energy filter system downstream from the acceleration/deceleration parallelizing lens system and prior to a work piece to be implanted by the substantially parallel ribbon ion beam. The acceleration/deceleration parallelizing lens system includes lenses for at least parallelizing (and perhaps also accelerate or decelerate) the fanned ribbon ion beam and acceleration/deceleration lenses for accelerating or decelerating the substantially parallel ribbon ion beam. The parallelizing lens allows delivery of a high current ribbon ion beam to the work piece with energy that can extend down to as low as approximately 200 eV. The energy filter system provides a substantially parallel ribbon ion beam that is substantially free of energy contamination.
摘要翻译：公开了一种带状离子束离子注入机系统的结构。在一个实施例中，该架构包括用于接收扇形带状离子束的加速/减速并行化透镜系统，并且至少将扇形带状离子束并行（并且也可能加速或减速）到基本上平行的带状离子束中，并且能量过滤系统在加速/减速并行化透镜系统的下游，以及待通过基本上平行的带状离子束植入的工件之前。加速/减速并行化透镜系统包括用于至少并行（也可能加速或减速）扇形带状离子束和用于加速或减速基本上平行的带状离子束的加速/减速透镜的透镜。并行化透镜允许将高电流带状离子束以能够向下延伸至低至约200eV的能量传递到工件。能量过滤系统提供基本上没有能量污染的基本平行的带状离子束。

9. 发明授权

US5856674A Filament for ion implanter plasma shower 失效
标题翻译：离子注入机等离子体淋浴灯
公开(公告)号：US5856674A
公开(公告)日：1999-01-05
申请号：US931689
申请日：1997-09-16
申请人： Peter L. Kellerman
发明人： Peter L. Kellerman
IPC分类号： G21K5/04 , H01J1/16 , H01J37/02 , H01J37/06 , H01J37/08 , H01J37/317
CPC分类号： H01J37/026 , H01J1/16 , H01J2237/004 , H01J2237/31701
摘要： A ribbon filament (86) is provided for a thermionic emission device. The filament comprises an elongated body having a configuration defined by a length, a width, and a thickness. The length comprises a central portion (96) and first and second end portions (98) on either side of the central portion. The width of the central portion is greater than that of the first and second end portions. In addition, the thickness of the filament is substantially less than the width along its entire length. The ribbon filament (86) may be configured as a single helical coil having its first and second end portions (98) mounted to first and second legs (85), respectively, at locations of slots therein. Preferably, the filament (86) is comprised of tungsten and the first and second legs (85) are also comprised of tungsten.
摘要翻译：为热离子发射装置提供带状丝（86）。灯丝包括具有由长度，宽度和厚度限定的构造的细长主体。该长度包括在中心部分的任一侧的中心部分（96）和第一和第二端部（98）。中心部分的宽度大于第一和第二端部的宽度。此外，灯丝的厚度基本上小于其整个长度的宽度。带状丝（86）可以被配置为单个螺旋线圈，其中其第一和第二端部（98）分别在其中的狭槽的位置处分别安装到第一和第二腿部（85）。优选地，灯丝（86）由钨组成，并且第一和第二腿（85）也由钨构成。

10. 发明授权

US5198676A Ion beam profiling method and apparatus 失效
标题翻译：离子光束分布方法和装置
公开(公告)号：US5198676A
公开(公告)日：1993-03-30
申请号：US767027
申请日：1991-09-27
申请人： Victor M. Benveniste , Peter L. Kellerman , John J. Schussler
发明人： Victor M. Benveniste , Peter L. Kellerman , John J. Schussler
IPC分类号： G01T1/29 , C23C14/48 , H01J37/04 , H01J37/317 , H01L21/265
CPC分类号： H01J37/3171 , H01J2237/24465 , H01J2237/31703
摘要： An ion beam intensity and emittance measuring system. A substrate supports conductive zones or regions that are impacted by an ion beam. Periodically the conductive regions are discharged through an integrator circuit which produces an output corresponding to the charge buildup on the conductive region. By determining the charge for multiple such regions impacted by an ion beam, a two-dimensional mapping of ion beam intensity vs. position is obtained on essentially a real-time basis. An emittance mask is also placed over the substrate and a measure of the emittance or spread of the ion beam is obtained.

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