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1. 发明申请

US20090090866A1 CHARGED PARTICLE DETECTION DEVICES 失效
标题翻译：充电颗粒检测装置
公开(公告)号：US20090090866A1
公开(公告)日：2009-04-09
申请号：US11668846
申请日：2007-01-30
申请人： Xu ZHANG , Joe WANG , Zhong-Wei CHEN
发明人： Xu ZHANG , Joe WANG , Zhong-Wei CHEN
IPC分类号： G01T1/20 , G01N23/00 , H01J3/14
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2443 , H01J2237/24435 , H01J2237/2445 , H01J2237/24465
摘要： A charged particle detector consists of four independent light guide modules assembled together to form a segmented on-axis annular detector, with a center opening for allowing the primary charged particle beam to pass through. One side of the assembly facing the specimen is coated with or bonded to scintillator material as the charged particle detection surface. Each light guide module is coupled to a photomultiplier tube to allow light signals transmitted through each light guide module to be amplified and processed separately. A charged particle detector is made from a single block of light guide material processed to have a cone shaped circular cutout from one face, terminating on the opposite face to an opening to allow the primary charged particle beam to pass through. The opposite face is coated with or bonded to scintillator material as the charged particle detection surface. The outer region of the light guide block is shaped into four separate light guide output channels and each light guide output channel is coupled to a photomultiplier tube to allow light signal output from each channel to be amplified and processed separately.
摘要翻译：带电粒子检测器由四个独立的光导模块组成，组合在一起以形成分段的轴上环形探测器，其中心开口允许初级带电粒子束通过。面向样品的组件的一侧作为带电粒子检测表面涂覆或结合到闪烁体材料。每个光导模块耦合到光电倍增管，以允许通过每个光导模块传输的光信号被单独放大和处理。带电粒子检测器由一块光导材料制成，被处理成具有从一个面的锥形圆形切口，终止在与开口相对的面上以允许初级带电粒子束通过。相反的面被涂覆或与闪烁体材料结合，作为带电粒子检测表面。导光块的外部区域被成形为四个分开的光导输出通道，并且每个光导输出通道耦合到光电倍增管，以允许来自每个通道的光信号输出被单独放大和处理。

2. 发明授权

US10109456B2 Apparatus of plural charged-particle beams 有权
公开(公告)号：US10109456B2
公开(公告)日：2018-10-23
申请号：US15633639
申请日：2017-06-26
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/28 , H01J37/147 , H01J37/12
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

3. 发明授权

US09799484B2 Charged particle source 有权
公开(公告)号：US09799484B2
公开(公告)日：2017-10-24
申请号：US14964221
申请日：2015-12-09
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J3/20 , H01J37/09
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

4. 发明授权

US09768082B2 Method and machine for examining wafers 有权
公开(公告)号：US09768082B2
公开(公告)日：2017-09-19
申请号：US13589378
申请日：2012-08-20
申请人： Chien-Hung Chou , Wen-Tin Tai
发明人： Chien-Hung Chou , Wen-Tin Tai
IPC分类号： G06F19/00 , H01L21/66 , G05B19/418 , G01N21/95 , G01N21/88
CPC分类号： H01L22/20 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G05B19/41875 , G05B2219/32205 , G05B2219/37224 , Y02P90/20 , Y02P90/22
摘要： Method and machine utilizes the real-time recipe to perform weak point inspection on a series of wafers during the fabrication of integrated circuits. Each real-time recipe essentially corresponds to a practical fabrication history of a wafer to be examined and/or the examination results of at least one examined wafer of same “lot”. Therefore, different wafers can be examined by using different recipes where each recipe corresponds to a specific condition of a wafer to be examined, even these wafers are received by a machine for examining at the same time.

5. 发明授权

US09754760B2 Charged particle source 有权
公开(公告)号：US09754760B2
公开(公告)日：2017-09-05
申请号：US15404694
申请日：2017-01-12
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/143 , H01J37/28 , H01J37/09
CPC分类号： H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
摘要： This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

6. 发明授权

US09691588B2 Apparatus of plural charged-particle beams 有权
公开(公告)号：US09691588B2
公开(公告)日：2017-06-27
申请号：US15065342
申请日：2016-03-09
申请人： Hermes Microvision, Inc.
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/28 , H01J37/147
CPC分类号： H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

7. 发明授权

US09601311B2 Laser SDE effect compensation by adaptive tuning 有权
公开(公告)号：US09601311B2
公开(公告)日：2017-03-21
申请号：US15060576
申请日：2016-03-03
申请人： Hermes Microvision Inc.
发明人： Ying Luo , KuoFeng Tseng , Zhonghua Dong
IPC分类号： H01J37/00 , H01J37/28
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/20292 , H01J2237/2817
摘要： Laser sub-divisional error (SDE) effect is compensated by using adaptive tuning. This compensated signal can be applied to position detection of stage in ebeam inspection tool, particularly for continuous moving stage.

8. 发明授权

US09460887B2 Discharging method for charged particle beam imaging 有权
标题翻译：带电粒子束成像放电方法
公开(公告)号：US09460887B2
公开(公告)日：2016-10-04
申请号：US12468026
申请日：2009-05-18
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： H01J37/28 , H01J37/02
CPC分类号： H01J37/02 , H01J37/28 , H01J2237/0041 , H01J2237/0044
摘要： A layer of conductive or semi-conductive material is formed on a surface of a sample and then the sample, when being charged particle beam imaged, is electrically coupled with an object having a large charge-receiving or charge-storage capacity (e.g., capacitance). Hence, the charging on the sample surface is removed and released quickly by the layer. The layer is then removed by reacting it with a predefined agent. The reaction forms a gaseous product which does not form a physical or chemical bond to the sample surface.
摘要翻译：在样品的表面上形成导电或半导体材料层，然后当带电粒子束成像时，样品与具有大的电荷接收或电荷存储容量（例如，电容）。因此，样品表面的充电被层除去并快速释放。然后通过与预定义的试剂反应来除去该层。该反应形成气态产物，其不与样品表面形成物理或化学键。

9. 发明授权

US09436985B1 Method and system for enhancing image quality 有权
公开(公告)号：US09436985B1
公开(公告)日：2016-09-06
申请号：US14595582
申请日：2015-01-13
申请人： Hermes Microvision Inc.
发明人： Chiyan Kuan , Joe Wang , Van-Duc Nguyen
IPC分类号： G06K9/00 , G06K9/54 , G06T5/50 , G06T5/40
CPC分类号： G06T5/50 , G01N21/9501 , G01N23/2251 , G01N2223/42 , G01N2223/6116 , G03F1/86 , G03F7/7065 , G06K9/40 , G06T5/005 , G06T5/006 , G06T5/40 , G06T2207/20172 , G06T2207/20216 , G06T2207/30148 , H01J37/222 , H01J37/28
摘要： This invention relates to methods and systems for enhance the signal-to-noise ratio of an image scanned by a charged particle beam. In an embodiment, a sequence of grayscales of a pixel is recorded first, extreme values of the sequence of grayscales are then identified and removed, and the remained grayscales are used to determine a nominated grayscale of the pixel.

10. 发明授权

US09184024B2 Selectable coulomb aperture in E-beam system 有权
标题翻译：电子束系统中可选的库仑孔径
公开(公告)号：US09184024B2
公开(公告)日：2015-11-10
申请号：US13012710
申请日：2011-01-24
申请人： Zhongwei Chen
发明人： Zhongwei Chen
IPC分类号： H01J37/09 , H01J37/15 , H01J37/28
CPC分类号： H01J37/28 , H01J37/09 , H01J37/15 , H01J2237/0453 , H01J2237/0458
摘要： A selectable Coulomb aperture in charged particle system comprises a non-magnetic conductive plate with a plurality of holes therein. The plurality of holes has variant sizes or diameters to select different beam currents of primary beam in the charged particle system. The charged particle system may include a charged particle source for emitting a primary beam, a condenser lens for receiving the primary beam and condensing the primary beam, an objective lens for receiving the primary beam and focusing the primary beam on a surface of a specimen. The selectable Coulomb aperture is positioned between the charged particle source and the condenser lens.
摘要翻译：带电粒子系统中的可选择的库仑孔径包括其中具有多个孔的非磁性导电板。多个孔具有不同的尺寸或直径，以在带电粒子系统中选择主波束的不同束流。带电粒子系统可以包括用于发射主光束的带电粒子源，用于接收主光束并聚光主光束的聚光透镜，用于接收主光束并将主光束聚焦在样本表面上的物镜。可选择的库仑孔位于带电粒子源和聚光透镜之间。

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