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61. 发明授权

US09390891B2 Apparatus for charged particle lithography system 有权
标题翻译：带电粒子光刻系统的装置
公开(公告)号：US09390891B2
公开(公告)日：2016-07-12
申请号：US14483740
申请日：2014-09-11
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Shih-Chi Wang , Tsung-Chih Chien , Hui-Min Huang , Jaw-Jung Shin , Shy-Jay Lin , Burn Jeng Lin
IPC分类号： H01J37/00 , H01J37/10 , H01J37/317 , H01J37/04
CPC分类号： H01J37/3177 , H01J37/045 , H01J37/10 , H01J37/12 , H01J37/20 , H01J2237/0435 , H01J2237/1205
摘要： An apparatus for use in a charged particle multi-beam lithography system is disclosed. The apparatus includes a plurality of charged particle doublets each having a first aperture and each configured to demagnify a beamlet incident upon the first aperture thereby producing a demagnified beamlet. The apparatus further includes a plurality of charged particle lenses each associated with one of the charged particle doublets, each having a second aperture, and each configured to receive the demagnified beamlet from the associated charged particle doublet and to realize one of two states: a switched-on state, wherein the demagnified beamlet is allowed to travel along a desired path, and a switched-off state, wherein the demagnified beamlet is prevented from traveling along the desired path. In embodiments, the first aperture is greater than the second aperture, thereby improving particle beam efficiency in the charged particle multi-beam lithography system.
摘要翻译：公开了一种用于带电粒子多光束光刻系统的装置。该装置包括多个带电荷的微粒双峰，每个具有第一孔，并且每个被配置成使入射在第一孔上的子束缩小，从而产生缩小的子束。该装置还包括多个带电粒子透镜，每个与带电粒子双重体中的一个相关联，每个具有第二孔径，并且每个被配置成从相关联的带电粒子双重体接收已缩小的子束并实现两种状态之一：在状态下，其中允许缩小的子束沿着期望的路径行进，并且关闭状态，其中防止了缩小的子束沿所需的路径行进。在实施例中，第一孔径大于第二孔径，从而提高带电粒子多光束光刻系统中的粒子束效率。

62. 发明授权

US09378925B2 TEM sample preparation 有权
公开(公告)号：US09378925B2
公开(公告)日：2016-06-28
申请号：US14869553
申请日：2015-09-29
申请人： FEI Company
发明人： Jeffrey Blackwood , Matthew Bray , Corey Senowitz , Cliff Bugge
IPC分类号： H01J37/00 , H01J37/305 , G01N1/28 , H01J37/26
CPC分类号： H01J37/3056 , G01N1/286 , G01N2001/2886 , H01J37/261 , H01J2237/31745
摘要： An improved method of preparing ultra-thin TEM samples that combines backside thinning with an additional cleaning step to remove surface defects on the FIB-facing substrate surface. This additional step results in the creation of a cleaned, uniform “hardmask” that controls the ultimate results of the sample thinning, and allows for reliable and robust preparation of samples having thicknesses down to the 10 nm range.

63. 发明授权

US09378923B2 Three-dimensional mapping using scanning electron microscope images 有权
公开(公告)号：US09378923B2
公开(公告)日：2016-06-28
申请号：US14609768
申请日：2015-01-30
申请人： APPLIED MATERIALS ISRAEL, LTD.
发明人： Ishai Schwarzband , Yakov Weinberg
IPC分类号： H01J37/00 , H01J37/24 , H01J37/244 , H01J37/28 , G01B21/30 , G01D18/00 , H01J37/26 , G01N23/225
CPC分类号： G01B21/30 , G01D18/008 , G01N23/2251 , G01N2223/6116 , H01J37/24 , H01J37/244 , H01J37/26 , H01J37/28 , H01J2237/22 , H01J2237/24465 , H01J2237/2448 , H01J2237/2814 , H01J2237/2826
摘要： A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.

64. 发明授权

US09355815B2 Electron microscope and electron beam detector 有权
标题翻译：电子显微镜和电子束检测器
公开(公告)号：US09355815B2
公开(公告)日：2016-05-31
申请号：US14423081
申请日：2013-08-09
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Shin Imamura , Takashi Ohshima , Yoichi Ose , Kenichi Hirane
IPC分类号： H01J37/00 , H01J37/244 , H01J37/28
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/063 , H01J2237/2443 , H01J2237/2445 , H01J2237/28 , H01J2237/2801
摘要： An electron microscope is provided with a scintillator (7) and a light guide (8). The scintillator (7) has an index of refraction greater than the index of refraction of the light guide (8), and an end surface (72) joined to the light guide (8) is formed from a curved surface with a convex shape on the outside. The scintillator (7) is formed by a Y—Al—O based ceramic sintered body represented by the compositional formula (Ln1-xCex)3M5O12 (wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).
摘要翻译：电子显微镜设有闪烁体（7）和光导（8）。闪烁体（7）的折射率大于导光体（8）的折射率，与导光体（8）接合的端面（72）由凸形的曲面形成外。闪烁体（7）由组成式（Ln1-xCex）3M5O12表示的Y-Al-O系陶瓷烧结体形成（其中Ln表示选自Y，Gd，La和 Lu和M表示Al和Ga中的任一个或两者）。

65. 发明授权

US09343263B2 Ion implanter, beam energy measuring device, and method of measuring beam energy 有权
标题翻译：离子注入机，光束能量测量装置和测量光束能量的方法
公开(公告)号：US09343263B2
公开(公告)日：2016-05-17
申请号：US14656132
申请日：2015-03-12
申请人： Sumitomo Heavy Industries Ion Technology Co., Ltd.
发明人： Haruka Sasaki , Kazuhiro Watanabe , Hiroyuki Kariya
IPC分类号： H01J37/00 , H01J37/244 , H01J37/317
CPC分类号： H01J37/244 , H01J37/3171 , H01J2237/057 , H01J2237/24514 , H01J2237/24528 , H01J2237/31703
摘要： A beam energy measuring device in an ion implanter includes a parallelism measuring unit that measures a parallelism of an ion beam at a downstream of a beam collimator of the ion implanter and an energy calculating unit that calculates an energy of the ion beam from the measured parallelism. The ion implanter may further include a control unit that controls a high energy multistage linear acceleration unit based on the measured energy of the ion beam so that the ion beam has a target energy.
摘要翻译：离子注入机中的光束能量测量装置包括平行度测量单元，其测量在离子注入机的光束准直器的下游处的离子束的平行度，以及能量计算单元，其计算来自所测量的平行度的离子束的能量。离子注入机还可以包括控制单元，其基于所测量的离子束的能量来控制高能量多级线性加速单元，使得离子束具有目标能量。

66. 发明授权

US09336994B2 Multi charged particle beam writing apparatus and multi charged particle beam writing method 有权
标题翻译：多带电粒子束写入装置和多带电粒子束写入方法
公开(公告)号：US09336994B2
公开(公告)日：2016-05-10
申请号：US14662612
申请日：2015-03-19
申请人： NuFlare Technology, Inc.
发明人： Yasuo Kato
IPC分类号： H01J37/00 , H01J37/317 , G03F1/78 , H01J37/302 , B82Y10/00 , B82Y40/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3026 , H01J2237/31764 , H01J2237/31771 , H01J2237/31776 , H01J2237/31796
摘要： A charged particle beam writing apparatus includes a storage unit to store each pattern data of plural figure patterns arranged in each of plural small regions made by virtually dividing a writing region of a target workpiece to be written on which resist being coated. The charged particle beam writing apparatus further including an assignment unit to assign each pattern data of each figure pattern to be arranged in each of the plural small regions concerned, and a writing unit to write, for each of plural groups, each figure pattern in each of the plural small regions concerned by using a charged particle beam.
摘要翻译：带电粒子束写入装置包括：存储单元，用于存储多个图形图案中的每个图案数据，所述多个图形图案布置在通过实际上划分要涂覆的抗蚀剂的目标工件的写入区域而制成的多个小区域中。所述带电粒子束写入装置还包括分配单元，用于分配要布置在所述多个小区域中的每一个中的每个图形模式的每个图案数据;以及写入单元，用于为每个所述多个组中的每一个写入每个图形模式的多个小区域使用带电粒子束。

67. 发明授权

US09321027B2 Machine and method for atmospheric plasma treatment of continuous substrates 有权
标题翻译：大气等离子体处理连续基板的机器和方法
公开(公告)号：US09321027B2
公开(公告)日：2016-04-26
申请号：US13519446
申请日：2011-01-31
申请人： Illya Kulyk
发明人： Illya Kulyk
IPC分类号： B01J19/08 , H01J37/00 , C23C16/50 , B05D3/14 , D06M10/02 , H01J37/32 , D06B19/00 , H05H1/48 , B29C59/14
CPC分类号： B01J19/088 , B01J2219/0809 , B01J2219/0818 , B01J2219/083 , B01J2219/0879 , B01J2219/0896 , B05D3/141 , B05D3/148 , B29C59/14 , C23C16/50 , D06B19/00 , D06M10/025 , H01J37/3277 , H01J37/32825 , H05H1/48 , H05H2001/485
摘要： A machine for atmospheric plasma treatment of continuous material substrates comprises means for feeding a substrate for moving it along a feed path; at least two electrodes each positioned at one face of the substrate, each electrode facing a respective face of the substrate, a difference in electric potential being applicable across the electrodes for generating an electric discharge; the feed means comprising at least one first roller and one second roller, the first roller and the second roller coinciding with respective electrodes and each acting on a respective face of the substrate.
摘要翻译：用于连续材料基板的大气等离子体处理的机器包括用于馈送基板以沿着进给路径移动基板的装置; 至少两个电极，每个电极分别位于所述基板的一个面上，每个电极面对所述基板的相应表面，所述电极的电位差可应用于用于产生放电的所述电极; 所述进给装置包括至少一个第一辊和一个第二辊，所述第一辊和所述第二辊与相应的电极重合并且各自作用在所述基板的相应表面上。

68. 发明授权

US09305742B2 Method and device for bunching a beam of charged particles 有权
标题翻译：用于聚束带电粒子束的方法和装置
公开(公告)号：US09305742B2
公开(公告)日：2016-04-05
申请号：US14397245
申请日：2012-05-31
申请人： Peter Simon Aptaker , Paul Beasley , Oliver Heid
发明人： Peter Simon Aptaker , Paul Beasley , Oliver Heid
IPC分类号： H01J37/00 , H01J37/147 , H05H7/18 , H05H7/22 , A61N5/10 , H05H7/02
CPC分类号： H01J37/1471 , A61N5/1077 , H05H7/18 , H05H7/22 , H05H2007/025
摘要： A method for packetizing a beam-charged particle, in which the particles pass through an electric field in a device is provided. The device includes an annular shaped central electrode which, in the direction of the beam, is arranged between a first outer electrode and a second outer electrode. A time-dependent electric voltage signal is applied to the central electrode, the temporal course thereof being selected such that particles inside the device undergo a position-dependent speed modification. The course of the speed modification is approximately sawtooth-shaped in the direction of the beam. An associated device is also provided.
摘要翻译：提供了一种用于打包粒子穿过器件中的电场的束带电粒子的方法。该装置包括一个环形中心电极，它在梁的方向上设置在第一外电极和第二外电极之间。时间依赖性电压信号被施加到中心电极，其时间过程被选择为使得器件内的颗粒经历位置相关的速度修改。速度改变的过程在梁的方向上是近似锯齿形的。还提供了相关联的设备。

69. 发明授权

US09202666B1 Method for operating a charged particle beam device with adjustable landing energies 有权
公开(公告)号：US09202666B1
公开(公告)日：2015-12-01
申请号：US14340335
申请日：2014-07-24
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Jürgen Frosien
IPC分类号： H01J37/00 , H01J37/147 , H01J37/28
CPC分类号： H01J37/147 , H01J37/28 , H01J2237/1508
摘要： A method of operating a charged particle beam device is provided. The charged particle beam device includes a beam separator that defines an optical axis, and includes a magnetic beam separation portion and an electrostatic beam separation portion. The method includes generating a primary charged particle beam, and applying a voltage to a sample, the voltage being set to a first value to determine a first landing energy of the primary charged particle beam. The method further includes creating an electric current in the magnetic beam separation portion, the current being set to a first value to generate a first magnetic field, and applying a voltage to the electrostatic beam separation portion, the voltage being set to a first value to generate a first electric field. The method includes guiding the primary charged particle beam to the beam separator, wherein the primary charged particle beam enters the beam separator at a first angle relative to the optical axis and, under the influence of the first magnetic field and the first electric field, leaves the beam separator at a second angle relative to the optical axis. The method includes generating a secondary charged particle beam by impingement of the primary charged particle beam on the sample to which the voltage with the first value is applied, and separating the secondary charged particle beam from the primary charged particle beam in the beam separator, wherein the secondary charged particle beam enters the beam separator at a third angle relative to the optical axis and, under the influence of the first magnetic field and the first electric field, leaves the beam separator at a fourth angle relative to the optical axis. The first angle and the fourth angle are different. The method further includes applying the voltage to the sample, the voltage being set to a second value to determine a second landing energy of the primary charged particle beam, creating the electric current in the magnetic beam separation portion, the electric current being set to a second value to generate a second magnetic field, applying the voltage to the electrostatic beam separation portion, the voltage being set to a second value to generate a second electric field, guiding the primary charged particle beam to the beam separator, wherein the primary charged particle beam enters the beam separator at the first angle relative to the optical axis and, under the influence of the second magnetic field and the second electric field, leaves the beam separator at the second angle relative to the optical axis, generating the secondary charged particle beam by impingement of the primary charged particle beam on the sample to which the voltage with the second value is applied, and separating the secondary charged particle beam from the primary charged particle beam in the beam separator, wherein the secondary charged particle beam enters the beam separator at the third angle relative to the optical axis and, under the influence of the second magnetic field and the second electric field, leaves the beam separator at the fourth angle relative to the optical axis.

70. 发明授权

US09082602B2 Mass analyser providing 3D electrostatic field region, mass spectrometer and methodology 有权
标题翻译：质量分析仪提供3D静电场区域，质谱仪和方法学
公开(公告)号：US09082602B2
公开(公告)日：2015-07-14
申请号：US14351703
申请日：2012-10-19
申请人： SHIMADZU CORPORATION
发明人： Vyacheslav Shchepunov , Roger Giles
IPC分类号： H01J49/40 , H01J37/00 , H01J49/06 , H01J49/42
CPC分类号： H01J49/062 , H01J49/40 , H01J49/408 , H01J49/4245
摘要： A mass analyzer for use in a mass spectrometer. The mass analyzer has a set of electrodes including electrodes arranged to form at least one electrostatic sector, the set of electrodes being spatially arranged to be capable of providing an electrostatic field in a reference plane suitable for guiding ions along a closed orbit in the reference plane, wherein the set of electrodes extend along a drift path that is locally orthogonal to the reference plane and that curves around a reference axis so that, in use, the set of electrodes provide a 3D electrostatic field region. The mass analyzer is configured so that, in use, the 3D electrostatic field region provided by the set of electrodes guides ions having different initial coordinates and velocities along a single predetermined 3D reference trajectory that curves around the reference axis.
摘要翻译：用于质谱仪的质量分析仪。质量分析器具有一组电极，其包括布置成形成至少一个静电扇区的电极，该组电极在空间上布置成能够在参考平面中提供适合于沿着参考平面中的闭合轨道引导离子的静电场，其中所述电极组沿着与所述参考平面局部正交并且围绕参考轴线弯曲的漂移路径延伸，使得在使用中所述电极组提供3D静电场区域。质量分析器被配置为使得在使用中由该组电极提供的3D静电场区域沿着围绕参考轴线弯曲的单个预定3D参考轨迹引导具有不同初始坐标和速度的离子。

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