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    • 1. 发明授权
    • Method and system for heating substrate in vacuum environment and method and system for identifying defects on substrate
    • 在真空环境中加热基材的方法和系统以及用于识别基材上的缺陷的方法和系统
    • US08809779B2
    • 2014-08-19
    • US12339558
    • 2008-12-19
    • Hong XiaoYi-Xiang Wang
    • Hong XiaoYi-Xiang Wang
    • G01N23/00G01N23/22H05B3/00
    • H05B3/0047G01N23/2202
    • A method for heating a substrate in a vacuum environment and a system therefor is provided. The system includes a chamber capable of holding the substrate located in the vacuum environment and a light source capable of projecting a light beam only on a portion of the substrate. The method includes the following steps. First, the substrate is placed in the vacuumed chamber. Thereafter, the light beam emitted from the light source is projected on the portion of the substrate, such that the portion is significantly heated before whole the substrate is heated. When the light beam is a charged particle beam projected by a charged particle beam assembly and projected on defects located on the substrate, the defects are capable of being identified by an examination result provided by an examination assembly after termination of light beam projection.
    • 提供一种在真空环境中加热基板的方法及其系统。 该系统包括能够保持位于真空环境中的衬底的腔室和能够仅将光束投射到衬底的一部分上的光源。 该方法包括以下步骤。 首先,将基板放置在真空室中。 此后,从光源发射的光束被投射在基板的部分上,使得该部分在整个基板被加热之前被显着地加热。 当光束是由带电粒子束组件投射并投影在基板上的缺陷上的带电粒子束时,能够通过在光束投影终止之后由检查组件提供的检查结果来识别缺陷。
    • 2. 发明授权
    • Operation stage for wafer edge inspection and review
    • 晶圆边缘检查和检查的操作阶段
    • US07919760B2
    • 2011-04-05
    • US12331336
    • 2008-12-09
    • Jack JauHong XiaoJoe WangZhongwei ChenYi Xiang WangEdward Tseng
    • Jack JauHong XiaoJoe WangZhongwei ChenYi Xiang WangEdward Tseng
    • G21K5/10
    • H01J37/28H01J37/20H01J2237/202H01J2237/2817H01L21/67288H01L21/6831
    • The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review. In order to keep the substrate in focus and avoid a large position shift during altering the substrate observation angle by rotation the pendulum stage, one embodiment of the present invention discloses a method such that the rotation axis of the pendulum stage consist of the tangent of upper edge of the substrate to be inspected. The electrostatic chuck of the present invention has a diameter smaller than which of the substrate to be inspected. During the inspection process the substrate on the electrostatic chuck may be rotated about the central axis on the electrostatic chuck to a desired position, this design insures all position on the bevel and apex are able to be inspected.
    • 本发明涉及用于基板(晶片)边缘和背面缺陷检查或缺陷检查的扫描电子显微镜中的带电粒子束装置的操作阶段。 然而,应当认识到,本发明具有更广泛的应用范围。 根据本发明的系统和方法提供了用于衬底边缘检查或审查的操作阶段。 检查区域包括顶部近边缘,斜面,顶点和底部斜面。 操作台包括支撑台,z台,X-Y台,静电卡盘,摆台和旋转轨道。 具有静电卡盘的摆台安装具有从0°摆动到180°的能力,同时执行基板顶部斜面,顶部和底部斜面检查或检查。 为了将基板保持在对焦状态,并且通过旋转摆锤台来改变基板观察角度而避免大的位置偏移,本发明的一个实施例公开了一种方法,使得摆台的旋转轴线由上部的切线 要检查的基板的边缘。 本发明的静电卡盘的直径小于要检查的基板的直径。 在检查过程中,静电卡盘上的基板可以围绕静电卡盘上的中心轴线旋转到期望的位置,该设计确保能够检查斜面上的所有位置和顶点。
    • 4. 发明授权
    • Method and apparatus for identifying plug-to-plug short from a charged particle microscopic image
    • 用于从带电粒子显微镜图像识别插头插头的方法和装置
    • US08759762B2
    • 2014-06-24
    • US12483220
    • 2009-06-11
    • Hong XiaoWei Fang
    • Hong XiaoWei Fang
    • H01J37/26H01J37/28H01J37/147
    • H01J37/26H01J37/1474H01J37/263H01J37/28H01L22/12
    • A method of inspecting for plug-to-plug short (short circuit) defects on a sample is disclosed. A charged particle beam for imaging the sample is repeatedly line-scanned over the sample with a line-to-line advancement direction perpendicular to the line-scan direction. The method includes scanning the sample with a line-to-line advancement along a first and a second direction, to obtain a first and a second image of the sample, respectively. Then, the method includes identifying plug patterns, represented in the obtained images with abnormal grey levels, as abnormal plug patterns. Next, the method compares the locations of the abnormal plug patterns to determine the presence of plug-to-plug short defects on the sample.
    • 公开了一种检查样品上插头短插(短路)缺陷的方法。 用于对样品进行成像的带电粒子束在垂直于线扫描方向的线对线前进方向上在样品上重复线扫描。 该方法包括沿着第一和第二方向以线对线前进扫描样品,以分别获得样品的第一和第二图像。 然后,该方法包括将获得的具有异常灰度级的图像表示的插头图案识别为异常插头图案。 接下来,该方法比较异常插头图案的位置,以确定样品上插头到插头短缺陷的存在。
    • 6. 发明授权
    • Methods and apparatus to review defects using scanning electron microscope with multiple electron beam configurations
    • 使用具有多个电子束配置的扫描电子显微镜检查缺陷的方法和装置
    • US08716662B1
    • 2014-05-06
    • US13549847
    • 2012-07-16
    • Paul MacDonaldHong Xiao
    • Paul MacDonaldHong Xiao
    • H01J37/28
    • H01J37/28H01J37/222H01J2237/24592
    • One embodiment relates to a method of reviewing defects using a scanning electron microscope (SEM). A defect location having a defect for review is selected, and the SEM is configured to be in a first imaging configuration. The selected defect location is imaged using the SEM to generate a first SEM image of the selected defect location. A determination is made as to whether the defect is visible or non-visible in the first SEM image. If the defect is non-visible in the first SEM image, then the SEM is configured to be into a second imaging configuration, the selected defect location is imaged using the SEM to generate a second SEM image of the selected defect location, and a further determination is made as to whether the defect is visible or non-visible in the second SEM image. Other embodiments, aspects and features are also disclosed.
    • 一个实施例涉及使用扫描电子显微镜(SEM)检查缺陷的方法。 选择具有检查缺陷的缺陷位置,并且将SEM配置为处于第一成像配置。 使用SEM成像所选择的缺陷位置,以产生所选缺陷位置的第一SEM图像。 确定在第一SEM图像中缺陷是可见的还是不可见的。 如果缺陷在第一SEM图像中不可见,则将SEM配置为进入第二成像配置,使用SEM成像所选择的缺陷位置以产生所选缺陷位置的第二SEM图像, 确定在第二SEM图像中缺陷是可见的还是不可见的。 还公开了其它实施例,方面和特征。
    • 9. 发明申请
    • DRUG CARRIER FOR TUMOR-TARGETED THERAPY, ITS PREPARATION METHOD AND ITS USE
    • 用于肿瘤定向治疗的药物载体,其制备方法及其用途
    • US20140004199A1
    • 2014-01-02
    • US13994680
    • 2012-03-21
    • Hong Xiao
    • Hong Xiao
    • A61K47/18A61K45/06A61K31/713
    • A61K47/186A61K9/0019A61K9/0073A61K9/1272A61K31/7088A61K31/713A61K45/06C12N15/88C12N2810/10
    • The present invention discloses a drug carrier with the capability of systemic administration through intravenous injection, its preparation methods and it is used for tumor gene therapy, it is belong to the field of tumor-targeted therapy. The carrier of the present invention is a novel liposome which is composed of DOTAP or its analogue and lecithin or its derivative in molar ratio of 20:(7-13), it can form stable complex with bioactive materials, and can deliver these bioactive material to the targeted cells cultured in vitro or in vivo. The complex of the present invention has a larger packaging capability, and the particle size is greatly reduced, that is optimized to 200 nm and below, in an environment of high serum concentration, it maintains high transfection efficiency. The carrier of the present invention packages DNA of tumor suppressor genes or cell suicide gene by forming complexes which can be specifically delivered into tumor cells in vitro, ex vivo or in vivo for gene therapeutic purposes.
    • 本发明公开了一种通过静脉注射全身给药能力的药物载体,其制备方法用于肿瘤基因治疗,属于肿瘤靶向治疗领域。 本发明的载体是由DOTAP或其类似物和卵磷脂或其衍生物以摩尔比为20:7(7-13)组成的新型脂质体,可与生物活性物质形成稳定的复合物,并可输送这些生物活性物质 到在体外或体内培养的靶细胞。 本发明的复合物具有较大的包装能力,并且在高血清浓度的环境中,粒径大大降低,优化至200nm以下,保持高的转染效率。 本发明的载体通过形成可以体外,离体或体内用于基因治疗目的特异性递送到肿瘤细胞中的复合物来包装肿瘤抑制基因或细胞自杀基因的DNA。