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1. 发明授权

US07919760B2 Operation stage for wafer edge inspection and review 失效
标题翻译：晶圆边缘检查和检查的操作阶段
公开(公告)号：US07919760B2
公开(公告)日：2011-04-05
申请号：US12331336
申请日：2008-12-09
申请人： Jack Jau , Hong Xiao , Joe Wang , Zhongwei Chen , Yi Xiang Wang , Edward Tseng
发明人： Jack Jau , Hong Xiao , Joe Wang , Zhongwei Chen , Yi Xiang Wang , Edward Tseng
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/202 , H01J2237/2817 , H01L21/67288 , H01L21/6831
摘要： The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review. In order to keep the substrate in focus and avoid a large position shift during altering the substrate observation angle by rotation the pendulum stage, one embodiment of the present invention discloses a method such that the rotation axis of the pendulum stage consist of the tangent of upper edge of the substrate to be inspected. The electrostatic chuck of the present invention has a diameter smaller than which of the substrate to be inspected. During the inspection process the substrate on the electrostatic chuck may be rotated about the central axis on the electrostatic chuck to a desired position, this design insures all position on the bevel and apex are able to be inspected.
摘要翻译：本发明涉及用于基板（晶片）边缘和背面缺陷检查或缺陷检查的扫描电子显微镜中的带电粒子束装置的操作阶段。然而，应当认识到，本发明具有更广泛的应用范围。根据本发明的系统和方法提供了用于衬底边缘检查或审查的操作阶段。检查区域包括顶部近边缘，斜面，顶点和底部斜面。操作台包括支撑台，z台，X-Y台，静电卡盘，摆台和旋转轨道。具有静电卡盘的摆台安装具有从0°摆动到180°的能力，同时执行基板顶部斜面，顶部和底部斜面检查或检查。为了将基板保持在对焦状态，并且通过旋转摆锤台来改变基板观察角度而避免大的位置偏移，本发明的一个实施例公开了一种方法，使得摆台的旋转轴线由上部的切线要检查的基板的边缘。本发明的静电卡盘的直径小于要检查的基板的直径。在检查过程中，静电卡盘上的基板可以围绕静电卡盘上的中心轴线旋转到期望的位置，该设计确保能够检查斜面上的所有位置和顶点。

2. 发明授权

US08791414B2 Dynamic focus adjustment with optical height detection apparatus in electron beam system 有权
标题翻译：电子束系统中光学高度检测装置的动态聚焦调整
公开(公告)号：US08791414B2
公开(公告)日：2014-07-29
申请号：US12764902
申请日：2010-04-21
申请人： Joe Wang , Van-Duc Nguyen , Yi-Xiang Wang , Jack Jau , Zhongwei Chen
发明人： Joe Wang , Van-Duc Nguyen , Yi-Xiang Wang , Jack Jau , Zhongwei Chen
IPC分类号： G01N23/00
CPC分类号： G01B11/22 , G01N23/04 , G01N23/20058 , G01N2223/32 , G01N2223/3301 , G01N2223/3302 , G01N2223/646 , H01J37/21 , H01J37/28 , H01J2237/216 , H01J2237/2482 , H01J2237/2487
摘要： The present invention generally relates to dynamic focus adjustment for an image system. With the assistance of a height detection sub-system, present invention provides an apparatus and methods for micro adjusting an image focusing according the specimen surface height variation by altering the field strength of an electrostatic lens between objective lens and sample stage/or a bias voltage applied to the sample surface. Merely by way of example, the invention has been applied to a scanning electron inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as observation tool with a height detection apparatus.
摘要翻译：本发明一般涉及图像系统的动态聚焦调整。本发明借助于高度检测子系统，提供了一种用于通过改变物镜和样品台之间的静电透镜的场强/或偏置电压来根据样本表面高度变化来微调整图像聚焦的装置和方法应用于样品表面。仅作为示例，本发明已经应用于扫描电子检查系统。但是应当认识到，本发明可以应用于使用带有带电粒子束的其它系统作为具有高度检测装置的观察工具。

3. 发明授权

US08094924B2 E-beam defect review system 有权
标题翻译：电子束缺陷检查系统
公开(公告)号：US08094924B2
公开(公告)日：2012-01-10
申请号：US12335458
申请日：2008-12-15
申请人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
发明人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N23/04 , G01N2223/102 , G01N2223/426 , G01N2223/611 , G06T2207/10061 , G06T2207/30148
摘要： An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus; and a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam. The modified SORIL column further includes a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.
摘要翻译：一种装置包括成像单元以对待审查的晶片进行成像，其中成像单元是经修改的SORIL柱。改进的SORIL柱包括由于晶片表面拓扑而进行微聚焦的聚焦子系统，其中聚焦子系统验证从晶片表面反射的光栅图像的位置以调整焦点; 以及表面电荷控制，用于调节在复查过程期间由于电子辐射引起的电荷累积，其中气体分子在洪水枪光束下而不是在主光束下方注入。改进的SORIL列还包括用于存储晶片设计数据库的存储单元; 以及用于管理缺陷定位，缺陷采样和缺陷分类的主计算机，其中主计算机和存储单元通过高速网络链接。

4. 发明授权

US08624186B2 Movable detector for charged particle beam inspection or review 有权
标题翻译：用于带电粒子束检测或检查的可移动检测器
公开(公告)号：US08624186B2
公开(公告)日：2014-01-07
申请号：US12787139
申请日：2010-05-25
申请人： Yi-Xiang Wang , Joe Wang , Xuedong Liu , Zhongwei Chen
发明人： Yi-Xiang Wang , Joe Wang , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/024 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495 , H01J2237/2611 , H01J2237/2817
摘要： The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.
摘要翻译：本发明一般涉及带电粒子成像系统的检测单元。更具体地，检测单元的一部分可以作为所需的成像条件移入或移出检测系统。在Wein滤波器（也称为E×B带电粒子分析仪）和可移动检测器设计的帮助下，本发明提供了一种适用于低电流，高分辨率模式和高电流，高通量模式的立体成像系统。仅作为示例，本发明已经应用于扫描电子束检查系统。但是应当认识到，本发明可以应用于使用带电粒子束作为观测工具的其它系统。

5. 发明申请

US20100270468A1 SYSTEM AND METHOD FOR A CHARGED PARTICLE BEAM 有权
标题翻译：充电颗粒束的系统和方法
公开(公告)号：US20100270468A1
公开(公告)日：2010-10-28
申请号：US12832127
申请日：2010-07-08
申请人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
发明人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
IPC分类号： H01J37/145 , H01J37/28
CPC分类号： H01J37/145 , H01J37/28 , H01J2237/0475 , H01J2237/12 , H01J2237/14 , H01J2237/24485 , H01J2237/2807
摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
摘要翻译：带电粒子束的系统和方法。根据实施例，本发明提供一种带电粒子束装置。该装置包括用于产生初级带电粒子束的带电粒子源。该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。样品包括样品表面。复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

6. 发明申请

US20080121810A1 SYSTEM AND METHOD FOR A CHARGED PARTICLE BEAM 有权
标题翻译：充电颗粒束的系统和方法
公开(公告)号：US20080121810A1
公开(公告)日：2008-05-29
申请号：US11923012
申请日：2007-10-24
申请人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
发明人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
IPC分类号： H01J1/50
CPC分类号： H01J37/145 , H01J37/28 , H01J2237/0475 , H01J2237/12 , H01J2237/14 , H01J2237/24485 , H01J2237/2807
摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
摘要翻译：带电粒子束的系统和方法。根据实施例，本发明提供一种带电粒子束装置。该装置包括用于产生初级带电粒子束的带电粒子源。该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。样品包括样品表面。复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

7. 发明授权

US08164060B2 System and method for a charged particle beam 有权
标题翻译：带电粒子束的系统和方法
公开(公告)号：US08164060B2
公开(公告)日：2012-04-24
申请号：US12832127
申请日：2010-07-08
申请人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
发明人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
IPC分类号： H01J37/244 , H01J37/145
CPC分类号： H01J37/145 , H01J37/28 , H01J2237/0475 , H01J2237/12 , H01J2237/14 , H01J2237/24485 , H01J2237/2807
摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
摘要翻译：带电粒子束的系统和方法。根据实施例，本发明提供一种带电粒子束装置。该装置包括用于产生初级带电粒子束的带电粒子源。该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。样品包括样品表面。复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

8. 发明授权

US07825386B2 System and method for a charged particle beam 有权
标题翻译：带电粒子束的系统和方法
公开(公告)号：US07825386B2
公开(公告)日：2010-11-02
申请号：US11923012
申请日：2007-10-24
申请人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
发明人： Xuedong Liu , Xu Zhang , Joe Wang , Edward Tseng , Zhongwei Chen
IPC分类号： H01J37/244
CPC分类号： H01J37/145 , H01J37/28 , H01J2237/0475 , H01J2237/12 , H01J2237/14 , H01J2237/24485 , H01J2237/2807
摘要： System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
摘要翻译：带电粒子束的系统和方法。根据实施例，本发明提供一种带电粒子束装置。该装置包括用于产生初级带电粒子束的带电粒子源。该装置还包括用于预聚焦初级充电粒子束的至少一个聚光透镜。此外，该装置包括用于形成磁场的复合物镜和静电场，以将初级带电粒子束聚焦到带电粒子束路径中的样本上。样品包括样品表面。复合物镜包括锥形磁性透镜，浸没式磁透镜和静电透镜，该圆锥形磁性透镜包括上极片，与上极片电绝缘的共用极片和励磁线圈。

9. 发明授权

US08552377B2 Particle detection system 有权
公开(公告)号：US08552377B2
公开(公告)日：2013-10-08
申请号：US12968229
申请日：2010-12-14
申请人： Yi-Xiang Wang , Joe Wang , Weiming Ren
发明人： Yi-Xiang Wang , Joe Wang , Weiming Ren
IPC分类号： H01J43/02 , H01J43/14
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24435 , H01J2237/2444 , H01J2237/2449
摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level. A condenser lens is configured to increase bandwidth of the detector that scan speed can be enhanced.

10. 发明授权

US08237125B2 Particle detection system 有权
标题翻译：粒子检测系统
公开(公告)号：US08237125B2
公开(公告)日：2012-08-07
申请号：US12764890
申请日：2010-04-21
申请人： Yi-Xiang Wang , Joe Wang
发明人： Yi-Xiang Wang , Joe Wang
IPC分类号： G01T1/28
CPC分类号： H01J37/244 , H01J2237/2441 , H01J2237/2444 , H01J2237/2445 , H01J2237/2448 , H01J2237/2449
摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level.
摘要翻译：本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。通过这样的设计，检测系统可以以超过小于安培（mA）的电平产生多达1010个增益和最大信号输出。

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