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1. 发明授权

US09368514B2 Semiconductor device and manufacturing method thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US09368514B2
公开(公告)日：2016-06-14
申请号：US14737672
申请日：2015-06-12
申请人： Semiconductor Energy Laboratory Co., Ltd.
发明人： Shunpei Yamazaki , Hideaki Kuwabara , Yasuyuki Arai
IPC分类号： H01L29/04 , H01L27/12 , H01L29/786 , G02F1/1362 , G02F1/1333 , G02F1/1345 , G02F1/1368 , H01L21/67 , H01L29/66
CPC分类号： H01L27/1222 , G02F1/133345 , G02F1/1339 , G02F1/134309 , G02F1/13439 , G02F1/13452 , G02F1/13458 , G02F1/136204 , G02F1/136227 , G02F1/136286 , G02F1/1368 , G02F2001/136231 , G02F2001/136295 , G02F2201/123 , G02F2202/103 , G02F2202/105 , G02F2202/28 , H01L21/67161 , H01L21/67167 , H01L21/67207 , H01L21/67225 , H01L21/67236 , H01L27/1218 , H01L27/124 , H01L27/1244 , H01L27/1255 , H01L27/1288 , H01L29/66765 , H01L29/78669
摘要： [Problem]A TFT is manufactured using at least five photomasks in a conventional liquid crystal display device, and therefore the manufacturing cost is high.[Solving Means]By performing the formation of the pixel electrode 127, the source region 123 and the drain region 124 by using three photomasks in three photolithography steps, a liquid crystal display device prepared with a pixel TFT portion, having a reverse stagger type n-channel TFT, and a storage capacitor can be realized.
摘要翻译： [问题]在传统的液晶显示装置中使用至少五个光掩模制造TFT，因此制造成本高。 [解决方案]通过在三个光刻步骤中使用三个光掩模来执行像素电极127，源极区域123和漏极区域124的形成，制备具有反向交错型n型的像素TFT部分的液晶显示装置通道TFT和存储电容器。

2. 发明授权

US09359672B2 Reaction system for growing a thin film 有权
公开(公告)号：US09359672B2
公开(公告)日：2016-06-07
申请号：US13529223
申请日：2012-06-21
申请人： Mohith Verghese , Kyle Fondurulia , Carl White , Eric Shero , Darko Babic , Herbert Terhorst , Marko Peussa , Min Yan
发明人： Mohith Verghese , Kyle Fondurulia , Carl White , Eric Shero , Darko Babic , Herbert Terhorst , Marko Peussa , Min Yan
IPC分类号： C23C16/455 , C23C16/458 , C23C16/44 , C30B35/00 , H01L21/67 , H01L21/687
CPC分类号： H01L21/68785 , C23C16/4408 , C23C16/455 , C23C16/45517 , C23C16/45525 , C23C16/45544 , C23C16/45561 , C23C16/45563 , C23C16/45582 , C23C16/45587 , C23C16/45591 , C23C16/458 , C23C16/4582 , C23C16/4583 , C23C16/4586 , C30B35/00 , H01L21/67236 , H01L21/68714 , H01L21/68742
摘要： An atomic deposition (ALD) thin film deposition apparatus includes a deposition chamber configured to deposit a thin film on a wafer mounted within a space defined therein. The deposition chamber comprises a gas inlet that is in communication with the space. A gas system is configured to deliver gas to the gas inlet of the deposition chamber. At least a portion of the gas system is positioned above the deposition chamber. The gas system includes a mixer configured to mix a plurality of gas streams. A transfer member is in fluid communication with the mixer and the gas inlet. The transfer member comprising a pair of horizontally divergent walls configured to spread the gas in a horizontal direction before entering the gas inlet.

3. 发明授权

US09348237B2 Mask carrier, mask handling module and method for adjusting a mask 有权
标题翻译：掩模载体，掩模处理模块和调整掩模的方法
公开(公告)号：US09348237B2
公开(公告)日：2016-05-24
申请号：US12860533
申请日：2010-08-20
申请人： Michael Heumüller , Heike Landgraf , Michael König
发明人： Michael Heumüller , Heike Landgraf , Michael König
IPC分类号： G01N21/00 , G03F7/20 , C23C14/04 , C23C14/56 , C23C16/04 , C23C16/54 , H01L21/67 , H01L21/677 , G03F7/12
CPC分类号： G03F7/70733 , C23C14/042 , C23C14/56 , C23C16/042 , C23C16/54 , G03F7/12 , G03F7/2014 , G03F7/707 , H01L21/67173 , H01L21/67184 , H01L21/67236 , H01L21/67754 , H01L21/6776
摘要： Mask carriers and mask alignment in vacuum deposition processes, mask handling modules, and methods for aligning a mask. A mask handling module can include a substrate carrier for carrying at least one substrate; a mask carrier for carrying at least two masks. The mask carrier can include at least two mask carrier sections each being adapted to carry a mask and a mask carrier positioning device for moving the mask carrier relative to the substrate carrier. The mask carrier sections are arranged so that the masks carried on the mask carrier sections can be positioned on the mask carrier in respective planes forming an angle with respect to each other so that only one of the at least two masks can be aligned to one of the at least one substrates.
摘要翻译：真空沉积工艺中的掩模载体和掩模对准，掩模处理模块以及对准掩模的方法。掩模处理模块可以包括用于承载至少一个基板的基板载体; 用于承载至少两个掩模的掩模载体。掩模载体可以包括至少两个掩模载体部分，每个掩模载体部分适于携带掩模和掩模载体定位装置，用于相对于基板载体移动掩模载体。掩模载体部分被布置成使得携带在掩模载体部分上的掩模可以在形成相对于彼此的角度的各个平面中定位在掩模载体上，使得至少两个掩模中的仅一个可以对准所述至少一个基底。

4. 发明授权

US09059045B2 Semiconductor device and manufacturing method thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US09059045B2
公开(公告)日：2015-06-16
申请号：US14082659
申请日：2013-11-18
申请人： Semiconductor Energy Laboratory Co., Ltd.
发明人： Shunpei Yamazaki , Hideaki Kuwabara , Yasuyuki Arai
IPC分类号： H01L29/04 , H01L27/12 , G02F1/1345 , G02F1/1362 , G02F1/1368 , H01L21/67 , H01L29/66
CPC分类号： H01L27/1222 , G02F1/133345 , G02F1/1339 , G02F1/134309 , G02F1/13439 , G02F1/13452 , G02F1/13458 , G02F1/136204 , G02F1/136227 , G02F1/136286 , G02F1/1368 , G02F2001/136231 , G02F2001/136295 , G02F2201/123 , G02F2202/103 , G02F2202/105 , G02F2202/28 , H01L21/67161 , H01L21/67167 , H01L21/67207 , H01L21/67225 , H01L21/67236 , H01L27/1218 , H01L27/124 , H01L27/1244 , H01L27/1255 , H01L27/1288 , H01L29/66765 , H01L29/78669
摘要： A TFT is manufactured using at least five photomasks in a conventional liquid crystal display device, and therefore the manufacturing cost is high. By performing the formation of the pixel electrode 127, the source region 123 and the drain region 124 by using three photomasks in three photolithography steps, a liquid crystal display device prepared with a pixel TFT portion, having a reverse stagger type n-channel TFT, and a storage capacitor can be realized, FIG. 2.
摘要翻译：在传统的液晶显示装置中使用至少五个光掩模制造TFT，因此制造成本高。通过在三个光刻步骤中通过使用三个光掩模来执行像素电极127，源极区域123和漏极区域124的形成，制备具有反向交错型n沟道TFT的像素TFT部分的液晶显示装置，并且可以实现存储电容器。 2。

5. 发明授权

US08790951B2 Laminating assembly 有权
标题翻译：复合组装
公开(公告)号：US08790951B2
公开(公告)日：2014-07-29
申请号：US13262902
申请日：2010-04-07
申请人： Yakov Safir
发明人： Yakov Safir
IPC分类号： H01L21/00
CPC分类号： H01L21/6838 , B32B37/1018 , B32B2309/02 , B32B2309/04 , B32B2309/10 , B32B2457/12 , B32B2457/14 , B65G49/065 , B65G2249/02 , H01L21/67201 , H01L21/67236 , H01L31/048 , H01L31/1876 , Y02E10/50 , Y02P70/521 , Y10T29/5317 , Y10T29/53187 , Y10T29/53261
摘要： A carrier assembly is provided for solar cell laminates that include an encapsulating layer and that are conveyed through a lamination plant having a conveying surface. The assembly includes a housing of heat conductive material defining an inner volume, the housing having an upper plate for receiving the laminates and a lower plate defining a plurality of apertures, the inner volume including at least one connecting element interconnecting the first and second plates. An air supply system provides a continuous outward air flow through the apertures when the lower plate is received on the conveying surface, wherein the airflow yields an elevated pressure on the lower plate for providing lift to the housing, allowing substantially friction-free movement of the housing relative to the conveying surface. A thermal transfer system provides thermal energy to the upper plate for melting and curing the encapsulating layer.
摘要翻译：为太阳能电池层叠体提供载体组件，其包括封装层，并且通过具有输送表面的层压设备输送。组件包括限定内部体积的导热材料的壳体，该壳体具有用于容纳层叠体的上板和限定多个孔的下板，所述内部容积包括互连第一和第二板的至少一个连接元件。当下板接收在输送表面上时，空气供应系统提供通过孔的连续向外的空气流，其中气流在下板上产生升高的压力，用于向壳体提供升力，从而允许基本上无摩擦的运动壳体相对于输送表面。热传递系统向上板提供热能以熔化和固化封装层。

6. 发明授权

US08586988B2 Semiconductor device and manufacturing method thereof 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US08586988B2
公开(公告)日：2013-11-19
申请号：US13488926
申请日：2012-06-05
申请人： Shunpei Yamazaki , Hideaki Kuwabara , Yasuyuki Arai
发明人： Shunpei Yamazaki , Hideaki Kuwabara , Yasuyuki Arai
IPC分类号： H01L29/04
CPC分类号： H01L27/1222 , G02F1/133345 , G02F1/1339 , G02F1/134309 , G02F1/13439 , G02F1/13452 , G02F1/13458 , G02F1/136204 , G02F1/136227 , G02F1/136286 , G02F1/1368 , G02F2001/136231 , G02F2001/136295 , G02F2201/123 , G02F2202/103 , G02F2202/105 , G02F2202/28 , H01L21/67161 , H01L21/67167 , H01L21/67207 , H01L21/67225 , H01L21/67236 , H01L27/1218 , H01L27/124 , H01L27/1244 , H01L27/1255 , H01L27/1288 , H01L29/66765 , H01L29/78669
摘要： [Summary][Problem]A TFT is manufactured using at least five photomasks in a conventional liquid crystal display device, and therefore the manufacturing cost is high.[Solving Means]By performing the formation of the pixel electrode 127, the source region 123 and the drain region 124 by using three photomasks in three photolithography steps, a liquid crystal display device prepared with a pixel TFT portion, having a reverse stagger type n-channel TFT, and a storage capacitor can be realized.
摘要翻译：发明内容问题在常规液晶显示装置中，使用至少五个光掩模制造TFT，因此制造成本高。 [解决方案]通过在三个光刻步骤中使用三个光掩模来执行像素电极127，源极区域123和漏极区域124的形成，制备具有反向交错型n型的像素TFT部分的液晶显示装置通道TFT和存储电容器。

7. 发明授权

US08506711B2 Apparatus for manufacturing flat-panel display 失效
标题翻译：用于制造平板显示器的装置
公开(公告)号：US08506711B2
公开(公告)日：2013-08-13
申请号：US12358752
申请日：2009-01-23
申请人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Byung-Oh Yoon , Gyeong-Hoon Kim , Hong-Gi Jeong
发明人： Young Jong Lee , Jun Young Choi , Saeng Hyun Jo , Byung-Oh Yoon , Gyeong-Hoon Kim , Hong-Gi Jeong
IPC分类号： C23C16/44 , C23F1/00 , H01L21/306 , C23C16/22 , C23C16/06
CPC分类号： H01L21/67126 , H01L21/67196 , H01L21/67201 , H01L21/67236 , H01L51/56
摘要： An flat-panel display (FPD) manufacturing apparatus is provided. The apparatus is flexibly configured so that it is capable of easily processing large-size substrates while also simplifying manufacturing, transporting, operating, and repair processes.
摘要翻译：提供了一种平板显示器（FPD）制造装置。该装置灵活地构造成能够容易地处理大尺寸基板，同时也简化了制造，运输，操作和修理过程。

8. 发明申请

US20130095578A1 APPARATUS AND METHOD FOR THE PRODUCTION OF PHOTOVOLTAIC MODULES 审中-公开
标题翻译：用于生产光伏模块的装置和方法
公开(公告)号：US20130095578A1
公开(公告)日：2013-04-18
申请号：US13651241
申请日：2012-10-12
申请人： Andrea Baccini , Marco Gajotto , Thomas Micheletti , Diego Tonini , John Telle , Marco Maiolini , Andrea Sartoretto
发明人： Andrea Baccini , Marco Gajotto , Thomas Micheletti , Diego Tonini , John Telle , Marco Maiolini , Andrea Sartoretto
IPC分类号： H01L31/18
CPC分类号： H01L31/18 , B32B17/10018 , B32B17/10788 , B32B17/10807 , H01L21/67132 , H01L21/67161 , H01L21/6719 , H01L21/67196 , H01L21/67236 , H01L21/67712 , H01L21/67718 , H01L21/67721 , H01L21/67727 , H01L21/67736 , H01L21/67742 , H01L21/67748 , H01L21/67754 , H01L31/048 , H01L31/188 , Y02E10/50 , Y10T29/5317 , Y10T29/53187 , Y10T29/53191 , Y10T29/53261
摘要： Embodiments of the invention may provide a system for the production of photovoltaic modules that comprises at least a first work line having a plurality of positioning stations in which a series of first processing operations are performed and a second work line consisting of at least a positioning station in which at least a second processing operation is performed. The process sequence may include, for example, printing a layer material used to form one or more electric contacts on a base layer, and then positioning photovoltaic cells and various layers of insulating material in a desired orientation over the base layer to form a photovoltaic module.
摘要翻译：本发明的实施例可以提供一种用于生产光伏模块的系统，该系统至少包括具有多个定位站的第一工作线，其中执行一系列第一处理操作，以及由至少一个定位站组成的第二工作线其中执行至少第二处理操作。处理顺序可以包括例如印刷用于在基底层上形成一个或多个电触头的层材料，然后将光伏电池和各种绝缘材料层定位在基底层上的期望取向上以形成光伏模块。

9. 发明授权

US08309374B2 Advanced platform for processing crystalline silicon solar cells 失效
标题翻译：晶硅太阳能电池加工平台
公开(公告)号：US08309374B2
公开(公告)日：2012-11-13
申请号：US12575088
申请日：2009-10-07
申请人： Keith Brian Porthouse , Peter G. Borden , Tristan R. Holtam , Lisong Zhou , Ian Scott Latchford , Derek Aqui , Vinay K. Shah
发明人： Keith Brian Porthouse , Peter G. Borden , Tristan R. Holtam , Lisong Zhou , Ian Scott Latchford , Derek Aqui , Vinay K. Shah
IPC分类号： H01L21/00 , H01L21/677
CPC分类号： H01L21/67236 , H01L21/67069 , H01L21/67167 , H01L21/67201 , H01L21/67213 , H01L31/1876 , Y02E10/50 , Y02P70/521
摘要： The present invention generally provides a batch substrate processing system, or cluster tool, for in-situ processing of a film stack used to form regions of a solar cell device. In one configuration, the film stack formed on each of the substrates in the batch contains one or more silicon-containing layers and one or more metal layers that are deposited and further processed within the various chambers contained in the substrate processing system. In one embodiment, a batch of solar cell substrates is simultaneously transferred in a vacuum or inert environment to prevent contamination from affecting the solar cell formation process.
摘要翻译：本发明通常提供用于原位处理用于形成太阳能电池装置区域的薄膜叠层的批量基板处理系统或集群工具。在一种构造中，在批次中形成在每个基板上的薄膜叠层包含一个或多个含硅层和一个或多个金属层，其在包含在基板处理系统中的各个室内被沉积和进一步处理。在一个实施例中，一批太阳能电池基板在真空或惰性环境中同时转移，以防止污染影响太阳能电池的形成过程。

10. 发明授权

US08173971B2 Sample transfer unit and sample transferring method 失效
标题翻译：样品转印单元和样品转印方法
公开(公告)号：US08173971B2
公开(公告)日：2012-05-08
申请号：US12788037
申请日：2010-05-26
申请人： Takashi Gunji , Hidetoshi Sato , Katsuya Kawakami , Hideki Yatabe
发明人： Takashi Gunji , Hidetoshi Sato , Katsuya Kawakami , Hideki Yatabe
IPC分类号： G01B15/00 , H01L21/677
CPC分类号： H01L21/67769 , H01J37/20 , H01J37/28 , H01J2237/201 , H01J2237/204 , H01J2237/2816 , H01J2237/2817 , H01L21/67236 , H01L21/67259 , H01L21/67742
摘要： There is provided a mini environment type transfer unit which can efficiently transfer a sample to a critical dimension scanning electron microscope (CD-SEM) even in the case of use of a SMIF pod which can store only one photomask. In addition to a load port, a stocker which can store a plurality of photomasks is provided in the mini environment type transfer unit. A mask storage slot in which a plurality of storage units are stacked is provided in the stocker, and one photomask is stored in each storage unit. A sensor is provided in each storage unit to determine whether or not the photomask is normally stored. Additionally, a sensor is provided in each storage unit to detect whether or not the photomask exists.
摘要翻译：提供了即使在使用只能存储一个光掩模的SMIF盒的情况下也可以将样品有效地转移到临界尺寸扫描电子显微镜（CD-SEM）的微型环境型转印单元。除了负载端口之外，可以存储多个光掩模的储料器设置在迷你环境型转印单元中。储存器中设置有多个存储单元堆叠的掩模存储槽，并且在每个存储单元中存储一个光掩模。在每个存储单元中提供传感器以确定光掩模是否正常存储。此外，在每个存储单元中提供传感器以检测是否存在光掩模。

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