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51. 发明授权

US5859364A Scanning probe microscope 失效
标题翻译：扫描探针显微镜
公开(公告)号：US5859364A
公开(公告)日：1999-01-12
申请号：US656075
申请日：1996-05-31
申请人： Akitoshi Toda , Takeshi Konada
发明人： Akitoshi Toda , Takeshi Konada
IPC分类号： G01B9/04 , G01B21/30 , G01Q30/04 , G01Q60/18 , G01Q70/14 , G01B11/30
CPC分类号： G01Q60/22 , B82Y20/00 , B82Y35/00 , G01B9/04 , Y10S977/87
摘要： A slide glass with a sample rested thereon is placed on an interior total reflection prism with a matching oil between them. A laser beam is applied through a prism to the sample, and evanescent light is generated on the sample surface. Above the sample, a probe supported at a free end of a cantilever is located, and an objective is provided above the probe. The objective has an angular aperture exceeding a vertical angle of the probe, where the angular aperture indicates an angle from a focal point of the objective to a diameter of entrance pupil. A scattering light detection lens barrel is provided above the objective, and cooperates with the objective to constitute a scattering light detection optical system. The optical system detects scattering light generated when the probe is introduced to the evanescent light.
摘要翻译：放置在其上的样品的载玻片放置在内部全反射棱镜之间，其间具有匹配的油。通过棱镜将激光束施加到样品，并且在样品表面上产生ev逝的光。在样品上方，位于悬臂的自由端处的探针位于探针上方。该物镜的角度孔径超过探头的垂直角度，其中角度孔径指示从物镜的焦点到入射光瞳直径的角度。在物镜上方设有散射光检测镜筒，与物镜配合构成散射光检测光学系统。光学系统检测当探针被引入渐逝光时产生的散射光。

52. 发明授权

US5844803A Method of sorting a group of integrated circuit devices for those devices requiring special testing 失效
公开(公告)号：US5844803A
公开(公告)日：1998-12-01
申请号：US801565
申请日：1997-02-17
申请人： Raymond J. Beffa
发明人： Raymond J. Beffa
IPC分类号： G01Q30/04 , G01Q70/00 , G01Q90/00 , G01R31/319 , G06F11/00 , G06F19/00 , G06G7/64
CPC分类号： G01R31/2894 , G01R31/31718 , G01R31/319 , H01L22/20 , G06F11/006 , H01L21/67271 , H01L22/14 , H01L2223/5444
摘要： A method for sorting integrated circuit (IC) devices of the type having a fuse identification (ID) into those devices requiring enhanced reliability testing and those requiring standard testing includes storing fabrication deviation data, probe data, and test data in association with the fuse ID of each of the devices indicating each of the devices requires either enhanced reliability testing or standard testing. The fuse ID of each of the devices is then automatically read before, during, or after standard testing of the devices. The testing process requirement data stored in association with the fuse ID of each of the devices is then accessed, and the devices are sorted in accordance with the accessed data into those devices requiring enhanced reliability testing and those requiring standard testing. The method thus directs those devices needing enhanced reliability testing to such testing without the need for all devices from the same wafer or wafer lot to proceed through special testing.

53. 发明授权

US5836996A Artificial retina 失效
标题翻译：人造视网膜
公开(公告)号：US5836996A
公开(公告)日：1998-11-17
申请号：US777075
申请日：1996-12-30
申请人： John F. Doorish
发明人： John F. Doorish
IPC分类号： A61F9/08 , A61N1/36 , G01Q30/04 , G01Q60/00 , G01Q70/08 , G01Q80/00 , G01Q90/00 , A61N1/05
CPC分类号： A61N1/36046 , A61F9/08
摘要： The present invention is an artificial retina system that is sufficiently small so as to be fully implantable in the human eye. The artificial retina system comprises an array of artificial retinas. Each artificial retina comprises a light sensing element; an emitter element, where the emitter element is coupled to the light sensing element; and a detector element, where the detector element receives signals from the emitter element. The light sensing element intercepts light and transmits an electrical signal to the emitter element. In response to the electrical signal received from the light sensing element, the emitter element emits a signal. In response to the signal emitted by the emitter element, the detector element transmits an electrical signal to the retinal nerves. The intensity of the electrical signal sent to the retinal nerves is directly proportional to the intensity of the incoming light. In a preferred embodiment, a color filter is placed in front of the light sensing elements such that the light sensing element is limited to receiving light having wavelengths in a wavelength band corresponding to a particular color. In a preferred embodiment, each of the color filters allow passage of a different color of light such that each of the light sensing elements receives light of a different color. Also in a preferred embodiment, the artificial retina includes either a scanning tunneling microscope (STM) tip, a metal sheet, preferably made of copper, or a metal wire disposed between the detector element and the retinal nerves. Each STM tip, metal sheet or metal wire is coupled to a detector element, receives an electrical signal from the detector element and transmits an electrical signal to the retinal nerves.
摘要翻译：本发明是足够小的人造视网膜系统，以便完全植入人眼。人造视网膜系统包括人造视网膜阵列。每个人造视网膜包括光感测元件; 发射极元件，其中所述发射极元件耦合到所述光感测元件; 和检测器元件，其中检测器元件接收来自发射器元件的信号。光感测元件截取光并将电信号发送到发射器元件。响应于从感光元件接收的电信号，发射器元件发出信号。响应于由发射体元件发射的信号，检测器元件将电信号传输到视网膜神经。发送到视网膜神经的电信号的强度与入射光的强度成正比。在优选实施例中，将滤色器放置在光感测元件的前面，使得光感测元件被限制为接收具有对应于特定颜色的波长带的波长的光。在优选实施例中，每个滤色器允许不同颜色的光通过，使得每个光感测元件接收不同颜色的光。同样在优选实施例中，人造视网膜包括扫描隧道显微镜（STM）尖端，优选由铜制成的金属片或设置在检测器元件和视网膜神经之间的金属线。每个STM尖端，金属片或金属线耦合到检测器元件，从检测器元件接收电信号并将电信号传输到视网膜神经。

54. 发明授权

US5821549A Through-the-substrate investigation of flip-chip IC's 失效
公开(公告)号：US5821549A
公开(公告)日：1998-10-13
申请号：US811104
申请日：1997-03-03
申请人： Christopher Graham Talbot , James Henry Brown
发明人： Christopher Graham Talbot , James Henry Brown
IPC分类号： G01Q30/04 , G01Q10/06 , G01Q20/02 , G01Q60/00 , G01Q80/00 , H01L21/02 , H01L21/66 , H01J37/30
CPC分类号： H01L22/12
摘要： Methods are provided for exposing a selected feature of an IC device, such as a selected conductor, from the back side of the substrate without disturbing adjacent features of the device, such as active regions. One such method comprises: (a) determining a region of the IC device in which the selected feature is located; (b) acquiring from the back side of the substrate an IR optical microscope image of the region; (c) aligning the IR optical microscope image with a coordinate system of a milling system; and (d) using structures visible in the IR optical microscope image as a guide, operating the milling system to expose the selected feature from the back side of the IC device without disturbing adjacent features.

55. 发明授权

US5778134A Apparatus for recording and reproducing image information in a recording medium wherein scanning probes are controlled based on editing information 失效
标题翻译：用于在其中基于编辑信息控制扫描探针的记录介质中记录和再现图像信息的装置
公开(公告)号：US5778134A
公开(公告)日：1998-07-07
申请号：US711306
申请日：1996-09-03
申请人： Kunihiro Sakai , Takahiro Oguchi , Akihiko Yamano , Shunichi Shido
发明人： Kunihiro Sakai , Takahiro Oguchi , Akihiko Yamano , Shunichi Shido
IPC分类号： G01N37/00 , G01Q30/04 , G01Q60/10 , G01Q80/00 , G11B9/00 , G11B9/14 , G11B27/031 , G11B27/10 , G11B31/00 , H04N5/76 , H04N5/907 , H04N5/91
CPC分类号： B82Y15/00 , B82Y10/00 , G11B27/031 , G11B27/102 , G11B9/14 , G11B9/1418 , G11B9/1427 , H04N5/907 , H04N5/91 , G11B31/006 , Y10S358/906 , Y10S977/947
摘要： Apparatus for storing image information in a recording medium, and outputting image information based on editing information includes dividing structure for dividing input image information. A memory is provided for storing each of the divided input image information. The memory includes a plurality of probes, each probe being arranged to oppose the recording medium. The memory also includes scanning structure for relatively moving the probes and the recording medium so that the probes scan a surface of the recording medium. The memory also includes recording and reproducing structure for recording the divided information on the recording medium by using the probes, and for reproducing the divided information recorded on the recording medium. Control circuitry is provided for controlling the scanning structure according to scanning procedures for each of the probes based on the editing information.
摘要翻译：用于将图像信息存储在记录介质中并基于编辑信息输出图像信息的装置包括用于分割输入图像信息的分割结构。提供用于存储分割的输入图像信息中的每一个的存储器。存储器包括多个探针，每个探针被布置成与记录介质相对。存储器还包括用于使探针和记录介质相对移动的扫描结构，使得探针扫描记录介质的表面。存储器还包括用于通过使用探针在记录介质上记录划分的信息并用于再现记录在记录介质上的分割信息的记录和再现结构。提供控制电路，用于根据编辑信息根据每个探针的扫描程序控制扫描结构。

56. 发明授权

US5654547A Method for particle wave reconstruction in a particle-optical apparatus 失效
标题翻译：粒子光学装置中的粒子波重建方法
公开(公告)号：US5654547A
公开(公告)日：1997-08-05
申请号：US617655
申请日：1996-03-15
申请人： Willem M. J. Coene , Augustus J. E. M. Janssen
发明人： Willem M. J. Coene , Augustus J. E. M. Janssen
IPC分类号： G01Q20/02 , G01Q30/04 , G01Q60/00 , G02B7/38 , G02B21/00 , G03F7/20 , H01J37/22 , H01J37/295 , H01J37/26
CPC分类号： G03F7/705 , H01J37/222 , H01J2237/223
摘要： In a method for the iterative formation of an image of a specimen in a particle-optical apparatus a series of experimental images (the experimental series) is recorded with each time a different setting of an imaging parameter (for example, the focal distance), and a comparable series of images is calculated on the basis of the electron wave at the specimen (the estimation). The two series are compared and on the basis thereof an electron wave is calculated (the feedback) with which a new series of images is calculated which better approximates the experimental series. This iteration step is repeated until the correspondence between the experimental series and the calculated series is sufficient, after which the associated electron wave is considered to be the desired image of the specimen. A substantial gain as regards calculation time can be achieved during the estimation step as well as during the feedback step by executing the operation of the invention by means of FFTs. This is possible by writing the correlation expressions to be calculated in both steps in accordance with the invention in such a manner that they occur as pure correlation integrals which can be calculated by means of FFTs. The calculation time required when use is made of FFTs is substantially shorter than in the case of explicit calculation of the correlation expressions in conformity with the state of the art. The calculation time can thus be reduced by a factor of the order of magnitude of 50,000.
摘要翻译：在用于在粒子光学装置中迭代形成样本的图像的方法中，每次成像参数的不同设置（例如，焦距）记录一系列实验图像（实验系列），并根据样品的电子波（估计）计算出可比较的一系列图像。比较两个系列，并且基于此计算电子波（反馈），利用该电子波计算更接近实验系列的新系列图像。重复该迭代步骤，直到实验系列和计算出的系列之间的对应关系是足够的，之后相关的电子波被认为是样品的期望图像。关于计算时间的实质增益可以在估计步骤期间以及在反馈步骤期间通过FFT执行本发明的操作来实现。这可以通过根据本发明的两个步骤中计算的相关表达式以使它们作为可以通过FFT计算的纯相关积分的方式出现。当使用FFT时所需的计算时间基本上比根据现有技术的显式计算相关表达式的情况更短。因此，计算时间可以降低5万个数量级。

57. 发明授权

US5633595A IC analysis system and electron beam probe system and fault isolation method therefor 失效
标题翻译： IC分析系统和电子束探测系统及其故障隔离方法
公开(公告)号：US5633595A
公开(公告)日：1997-05-27
申请号：US418418
申请日：1995-04-07
申请人： Koshi Ueda , Akira Goishi , Masayuki Kuribara
发明人： Koshi Ueda , Akira Goishi , Masayuki Kuribara
IPC分类号： G01Q30/02 , G01Q30/04 , G01Q60/30 , G01R31/307 , G01R31/305
CPC分类号： G01R31/307
摘要： A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patterns set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pattern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.
摘要翻译：提供了一种停止模式设置部件203，其允许在其中设置用于停止测试图案生成器210的测试图案更新操作的多个模式，并且在每次生成设置在停止模式设置部件203中的测试图案时，测试模式发生器210停止模式更新操作。每次测试模式停止时，停止信号被施加到电子束探测器系统300，使其开始图像数据获取操作。在图像数据获取完成时，写入完成信号生成部件308生成写入完成信号，该写入完成信号被施加到测试图案生成器210，使其恢复图案更新操作。通过将不同的测试图案交替地应用于被测设备，并且显示所得到的图像数据之间的差异的图像数据，可以提高潜在的对比度图像。

58. 发明授权

US5621652A System and method for verifying process models in integrated circuit process simulators 失效
标题翻译：集成电路过程模拟器验证过程模型的系统和方法
公开(公告)号：US5621652A
公开(公告)日：1997-04-15
申请号：US408856
申请日：1995-03-21
申请人： John C. Eakin
发明人： John C. Eakin
IPC分类号： G01Q30/04 , G01Q60/00 , G06F17/50 , G06G7/48
CPC分类号： G06F17/5009 , B82Y35/00 , Y10S977/854
摘要： An apparatus and method for verifying a semiconductor process model. The apparatus consists of an atomic force microscope (AFM), a semiconductor process model and a model updater. The AFM measures an actual cross sectional profile of a submicron semiconductor device feature created by an IC processing step which could be photolithography. The semiconductor process model predicts the feature's cross sectional profile under a set of model conditions specified to match the actual conditions under which the IC processing step took place. The semiconductor process model is driven by a set of model parameters that relate feature profiles to processing conditions and details of the processing step being modelled. The model updater adjusts, if necessary, the model parameters of the semiconductor process model so that the predicted profile more closely approximates the actual cross sectional profile. If the parameters are adjusted, the process model generates an updated predicted profile, which the model updater again compares to the actual profile. This process iterates until the model updater determines that the predicted and actual profiles are suitably correlated, at which point the process model is verified. Once verified, the process model of the present invention can be configured to output a sequence of processing steps compatible with an IC manufacturing process. Thus, the verified process model can specify the steps by which a device characterized by a specified profile can be manufactured.
摘要翻译：一种验证半导体工艺模型的装置和方法。该装置由原子力显微镜（AFM），半导体工艺模型和模型更新器组成。 AFM测量由可以是光刻的IC处理步骤产生的亚微米半导体器件特征的实际横截面轮廓。半导体工艺模型在特定的模型条件的一组模型条件下预测特征的横截面轮廓，该模型条件被指定以匹配发生IC处理步骤的实际条件。半导体工艺模型由一组模型参数驱动，这些模型参数将特征轮廓与处理条件相关联，以及正在建模的处理步骤的细节。如果需要，模型更新器调整半导体工艺模型的模型参数，使得预测的轮廓更接近实际的横截面轮廓。如果参数被调整，则过程模型生成更新的预测轮廓，模型更新者再次与实际轮廓进行比较。该过程重复，直到模型更新器确定预测和实际轮廓被适当地相关，此时验证过程模型。一旦验证，本发明的过程模型可被配置为输出与IC制造过程兼容的一系列处理步骤。因此，经过验证的过程模型可以指定可以制造由特定轮廓表征的装置的步骤。

59. 发明授权

US5589780A IC Analysis system and electron beam probe system and fault isolation method therefor 失效
标题翻译： IC分析系统和电子束探测系统及其故障隔离方法
公开(公告)号：US5589780A
公开(公告)日：1996-12-31
申请号：US312953
申请日：1994-09-30
申请人： Koshi Ueda , Akira Goishi , Masayuki Kuribara
发明人： Koshi Ueda , Akira Goishi , Masayuki Kuribara
IPC分类号： G01Q30/02 , G01Q30/04 , G01Q60/30 , G01R31/307 , G01R31/305
CPC分类号： G01R31/307
摘要： A stop pattern setting part 203 is provided which permits setting therein a plurality of patterns for stopping the test pattern updating operation of a test pattern generator 210, and upon each generation of the test patters set in the stop pattern setting part 203, the test pattern generator 210 is stopped from the pattern updating operation. Each time the test pattern stops, a stop signal is applied to an electron beam probe system 300, causing it to start an image data acquiring operation. Upon completion of the image data acquisition, a write completion signal generating part 308 generates a write completion signal, which is applied to the test pattern generator 210 to cause it to resume the pattern updating operation. By applying different test patterns to a device under test alternately with each other and displaying image data of the difference between resulting pieces of image data, a potential contrast image can be improved.
摘要翻译：提供了一种停止模式设置部分203，其允许在其中设置用于停止测试图案生成器210的测试图案更新操作的多个模式，并且在每次生成设置在停止模式设置部分203中的测试模式时，测试模式发生器210停止模式更新操作。每次测试模式停止时，停止信号被施加到电子束探测器系统300，使其开始图像数据获取操作。在图像数据获取完成时，写入完成信号生成部件308生成写入完成信号，该写入完成信号被施加到测试图案生成器210，使其恢复图案更新操作。通过将不同的测试图案交替地应用于被测设备，并且显示所得到的图像数据之间的差异的图像数据，可以提高潜在的对比度图像。

60. 发明授权

US5557156A Scan control for scanning probe microscopes 失效
公开(公告)号：US5557156A
公开(公告)日：1996-09-17
申请号：US353399
申请日：1994-12-02
申请人： Virgil Elings
发明人： Virgil Elings
IPC分类号： G01B7/00 , G01Q10/06 , G01Q20/04 , G01Q30/04 , G01Q40/00 , G01Q60/26 , G05D3/12 , G01N23/00
CPC分类号： G01Q40/00 , B82Y35/00 , G01B7/003 , Y10S977/851
摘要： A method of controlling a scanner, particularly a scanner for use in scanning probe microscopes such as an atomic force microscope, including the steps of generating a scan voltage which varies as a parametric function of time, applying the scan voltage to the scanner, sensing plural positions of the scanner upon application of the scan voltage, fitting a parametric function to the sensed scanner positions, and controlling at least one parameter of the scan voltage function based on the parametric function fitted to the sensed scanner positions in the fitting step. In a preferred embodiment, the scan voltage is a polynomial parametric function of time and the order of terms of the polynomial is set in relation to the size of the scan being controlled, with small scans having at least one order term and relatively larger scans having plural order terms. Thus, the sensed position data are used, not to control the motion of the scanner directly in a closed loop system, but instead to optimize the transducer calibration parameters for subsequent open looped scan control of a portion of a total scan, with the calibration of the transducer scan voltage parameters periodically occurring.

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