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1. 发明申请

US20120088035A1 PLATEN CONTROL 有权
标题翻译：板控制
公开(公告)号：US20120088035A1
公开(公告)日：2012-04-12
申请号：US13270644
申请日：2011-10-11
申请人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan , Antonella Cucchetti
发明人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan , Antonella Cucchetti
IPC分类号： C23C14/48 , B21C51/00
CPC分类号： H01L21/67109 , H01L21/67288
摘要： A system and method for maintain a desired degree of platen flatness is disclosed. A laser system is used to measure the flatness of a platen. The temperature of the platen is then varied to achieve the desired level of flatness. In some embodiments, this laser system is only used during a set up period and the resulting desired temperature is then used during normal operation. In other embodiments, a laser system is used to measure the flatness of the platen, even while the workpiece is being processed.
摘要翻译：公开了一种用于保持期望的压板平整度的系统和方法。激光系统用于测量压板的平整度。然后改变压板的温度以达到所需的平坦度水平。在一些实施例中，该激光系统仅在建立周期期间使用，然后在正常操作期间使用所得到的期望温度。在其他实施例中，即使在正在处理工件时，也使用激光系统来测量压板的平坦度。

2. 发明授权

US09012337B2 Platen control 有权
标题翻译：压板控制
公开(公告)号：US09012337B2
公开(公告)日：2015-04-21
申请号：US13270644
申请日：2011-10-11
申请人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan , Antonella Cucchetti
发明人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan , Antonella Cucchetti
IPC分类号： H01L21/027 , H01L21/66 , H01L21/67
CPC分类号： H01L21/67109 , H01L21/67288
摘要： A system and method for maintain a desired degree of platen flatness is disclosed. A laser system is used to measure the flatness of a platen. The temperature of the platen is then varied to achieve the desired level of flatness. In some embodiments, this laser system is only used during a set up period and the resulting desired temperature is then used during normal operation. In other embodiments, a laser system is used to measure the flatness of the platen, even while the workpiece is being processed.
摘要翻译：公开了一种用于保持期望的压板平整度的系统和方法。激光系统用于测量压板的平整度。然后改变压板的温度以达到所需的平坦度水平。在一些实施例中，该激光系统仅在建立周期期间使用，然后在正常操作期间使用所得到的期望温度。在其他实施例中，即使在正在处理工件时，也使用激光系统来测量压板的平坦度。

3. 发明授权

US08330125B2 Ion beam tuning 有权
标题翻译：离子束调谐
公开(公告)号：US08330125B2
公开(公告)日：2012-12-11
申请号：US12887068
申请日：2010-09-21
申请人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan
发明人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan
IPC分类号： H01J37/10
CPC分类号： H01J37/3171 , H01J37/21 , H01J2237/216 , H01J2237/24405 , H01J2237/24528 , H01J2237/24542
摘要： A beam line ion implanter includes an ion source configured to generate an ion beam, a scanner configured to scan the ion beam to produce a scanned ion beam having trajectories which diverge from a scan origin, and a focusing element having a focusing field positioned upstream of the scanner configured to focus the ion beam to a focal point at the scan origin. A method of ion beam tuning includes generating an ion beam, focusing the ion beam to a focal point positioned at a scan origin, and scanning the ion beam to produce a scanned ion beam having trajectories which diverge from the scan origin.
摘要翻译：束线离子注入机包括被配置为产生离子束的离子源，扫描器，被配置为扫描离子束以产生具有从扫描原点发散的轨迹的扫描离子束;以及聚焦元件，其具有位于扫描器被配置为将离子束聚焦到扫描原点处的焦点。离子束调谐的方法包括产生离子束，将离子束聚焦到位于扫描原点的焦点，并扫描离子束以产生具有与扫描原点分离的轨迹的扫描离子束。

4. 发明申请

US20120068081A1 ION BEAM TUNING 有权
标题翻译：离子束调谐
公开(公告)号：US20120068081A1
公开(公告)日：2012-03-22
申请号：US12887068
申请日：2010-09-21
申请人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan
发明人： Shengwu Chang , Joseph C. Olson , Frank Sinclair , Matthew P. McClellan
IPC分类号： H01J37/317 , H01J37/12 , H01J37/147
CPC分类号： H01J37/3171 , H01J37/21 , H01J2237/216 , H01J2237/24405 , H01J2237/24528 , H01J2237/24542
摘要： A beam line ion implanter includes an ion source configured to generate an ion beam, a scanner configured to scan the ion beam to produce a scanned ion beam having trajectories which diverge from a scan origin, and a focusing element having a focusing field positioned upstream of the scanner configured to focus the ion beam to a focal point at the scan origin. A method of ion beam tuning includes generating an ion beam, focusing the ion beam to a focal point positioned at a scan origin, and scanning the ion beam to produce a scanned ion beam having trajectories which diverge from the scan origin.
摘要翻译：束线离子注入机包括被配置为产生离子束的离子源，扫描器，被配置为扫描离子束以产生具有从扫描原点发散的轨迹的扫描离子束;以及聚焦元件，其具有位于扫描器被配置为将离子束聚焦到扫描原点处的焦点。离子束调谐的方法包括产生离子束，将离子束聚焦到位于扫描原点的焦点，并扫描离子束以产生具有与扫描原点分离的轨迹的扫描离子束。

5. 发明授权

US07622724B2 High voltage insulator for preventing instability in an ion implanter due to triple-junction breakdown 有权
标题翻译：高压绝缘子，用于防止由于三结击穿引起的离子注入机的不稳定性
公开(公告)号：US07622724B2
公开(公告)日：2009-11-24
申请号：US11767657
申请日：2007-06-25
申请人： Shengwu Chang , Frank Sinclair
发明人： Shengwu Chang , Frank Sinclair
IPC分类号： G21K5/00
CPC分类号： H01B17/64
摘要： A high voltage insulator for preventing instability in an ion implanter due to triple junction breakdown is described. In one embodiment, there is an apparatus for preventing triple junction instability in an ion implanter. In this embodiment, there is a first metal electrode and a second metal electrode. An insulator is disposed between the first metal electrode and the second metal electrode. The insulator has at least one surface between the first metal electrode and the second metal electrode that is exposed to a vacuum that transports an ion beam generated by the ion implanter. A first conductive layer is located between the first metal electrode and the insulator. The first conductive layer prevents triple junction breakdown from occurring at an interface of the first electrode, insulator and vacuum. A second conductive layer is located between the second metal electrode and the insulator opposite the first conductive layer. The second conductive layer prevents triple junction breakdown from occurring at an interface of the second electrode, insulator and vacuum.
摘要翻译：描述了一种用于防止由于三结击穿引起的离子注入机不稳定性的高压绝缘体。在一个实施例中，存在用于防止离子注入机中的三重连接不稳定性的装置。在本实施例中，存在第一金属电极和第二金属电极。绝缘体设置在第一金属电极和第二金属电极之间。绝缘体具有在第一金属电极和第二金属电极之间的至少一个表面，其暴露于输送由离子注入机产生的离子束的真空。第一导电层位于第一金属电极和绝缘体之间。第一导电层防止在第一电极，绝缘体和真空的界面处发生三结击穿。第二导电层位于第二金属电极和与第一导电层相对的绝缘体之间。第二导电层防止在第二电极，绝缘体和真空的界面处发生三结击穿。

6. 发明申请

US20110124186A1 APPARATUS AND METHOD FOR CONTROLLABLY IMPLANTING WORKPIECES 有权
标题翻译：用于控制工件的装置和方法
公开(公告)号：US20110124186A1
公开(公告)日：2011-05-26
申请号：US12947078
申请日：2010-11-16
申请人： Anthony Renau , Ludovic Godet , Timothy J. Miller , Joseph C. Olson , Vikram Singh , James Buonodono , Frank Sinclair , Deepak A. Ramappa , Russell Low , Atul Gupta , Kevin M. Daniels
发明人： Anthony Renau , Ludovic Godet , Timothy J. Miller , Joseph C. Olson , Vikram Singh , James Buonodono , Frank Sinclair , Deepak A. Ramappa , Russell Low , Atul Gupta , Kevin M. Daniels
IPC分类号： H01L21/265 , G21K5/10
CPC分类号： B01J19/081 , H01J37/3171 , H01J37/32357 , H01J37/32422 , H01J37/32623 , H01J2237/0453 , H01J2237/1205 , H01L21/2236 , H01L31/022425 , H01L31/068 , H01L31/08 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.
摘要翻译：等离子体处理装置包括等离子体源，其被配置为在等离子体室中产生等离子体，使得等离子体包含用于注入工件的离子。该装置还包括聚焦板装置，该聚焦板装置具有孔结构，其被配置为修改离开聚焦板附近的等离子体鞘的等离子体鞘的形状，使得离开孔结构的孔的离子限定聚焦离子。该设备还包括处理室，其包含与聚焦板间隔开的工件，使得在工件处的聚焦离子的固定注入区域基本上比孔更窄。该装置被配置为通过在离子注入期间扫描工件来在工件中产生多个图案化区域。

7. 发明授权

US08263941B2 Mass analysis magnet for a ribbon beam 有权
标题翻译：质量分析用于带状束的磁体
公开(公告)号：US08263941B2
公开(公告)日：2012-09-11
申请号：US12616589
申请日：2009-11-11
申请人： Victor Benveniste , James S. Buff , Frank Sinclair , Joseph C. Olson
发明人： Victor Benveniste , James S. Buff , Frank Sinclair , Joseph C. Olson
IPC分类号： H01J49/20
CPC分类号： H01J37/05 , H01J37/08 , H01J37/3171 , H01J49/30 , H01J2237/022 , H01J2237/055 , H01J2237/057 , H01J2237/083 , H01J2237/31705
摘要： A ribbon beam mass analyzer having a first and second solenoid coils and steel yoke arrangement. Each of the solenoid coils have a substantially “racetrack” configuration defining a space through which an ion ribbon beam travels. The solenoid coils are spaced apart along the direction of travel of the ribbon beam. Each of the solenoid coils generates a uniform magnetic field to accommodate mass resolution of wide ribbon beams to produce a desired image of ions generated from an ion source.
摘要翻译：带状光束质量分析仪，具有第一和第二电磁线圈和钢轭装置。每个电磁线圈具有大致“跑道”结构，其限定了离子带束通过该空间行进的空间。螺线管线圈沿着带状束的行进方向间隔开。每个电磁线圈产生均匀的磁场以适应宽带束的质量分辨率，以产生从离子源产生的离子的期望图像。

8. 发明申请

US20100116983A1 MASS ANALYSIS MAGNET FOR A RIBBON BEAM 有权
标题翻译： RIBBON梁的质量分析磁铁
公开(公告)号：US20100116983A1
公开(公告)日：2010-05-13
申请号：US12616589
申请日：2009-11-11
申请人： Victor Benveniste , James S. Buff , Frank Sinclair , Joseph C. Olson
发明人： Victor Benveniste , James S. Buff , Frank Sinclair , Joseph C. Olson
IPC分类号： H01J49/30 , G21K5/00 , H01J37/08
CPC分类号： H01J37/05 , H01J37/08 , H01J37/3171 , H01J49/30 , H01J2237/022 , H01J2237/055 , H01J2237/057 , H01J2237/083 , H01J2237/31705
摘要： A ribbon beam mass analyzer having a first and second solenoid coils and steel yoke arrangement. Each of the solenoid coils have a substantially “racetrack” configuration defining a space through which an ion ribbon beam travels. The solenoid coils are spaced apart along the direction of travel of the ribbon beam. Each of the solenoid coils generates a uniform magnetic field to accommodate mass resolution of wide ribbon beams to produce a desired image of ions generated from an ion source.
摘要翻译：带状光束质量分析仪，具有第一和第二电磁线圈和钢轭装置。每个电磁线圈具有大致“跑道”结构，其限定了离子带束通过该空间行进的空间。螺线管线圈沿着带状束的行进方向间隔开。每个电磁线圈产生均匀的磁场以适应宽带束的质量分辨率，以产生从离子源产生的离子的期望图像。

9. 发明授权

US09567691B2 Melt purification and delivery system 有权
标题翻译：熔体净化和输送系统
公开(公告)号：US09567691B2
公开(公告)日：2017-02-14
申请号：US12487119
申请日：2009-06-18
申请人： Peter L. Kellerman , Frank Sinclair , Frederick Carlson , Julian G. Blake
发明人： Peter L. Kellerman , Frank Sinclair , Frederick Carlson , Julian G. Blake
IPC分类号： C01B33/02 , C30B11/00 , C01B33/037 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/40 , C30B29/60
CPC分类号： C30B11/003 , C01B33/037 , C30B11/001 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/406 , C30B29/60
摘要： An apparatus to purify a melt is disclosed. A first portion of a melt in a chamber is frozen in a first direction. A fraction of the first portion is melted in the first direction. A second portion of the melt remains frozen. The melt flows from the chamber and the second portion is removed from the chamber. The freezing concentrates solutes in the melt and second portion. The second portion may be a slug with a high solute concentration. This system may be incorporated into a sheet forming apparatus with other components such as, for example, pumps, filters, or particle traps.
摘要翻译：公开了一种净化熔体的设备。室中的熔体的第一部分在第一方向上被冷冻。第一部分的一部分在第一方向熔化。熔体的第二部分保持冷冻。熔体从腔室流出，第二部分从腔室中移出。冷冻浓缩物溶解在熔体和第二部分中。第二部分可以是高溶质浓度的塞子。该系统可以结合到具有其它部件例如泵，过滤器或颗粒捕集器的片材成形设备中。

10. 发明授权

US08519353B2 Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam 有权
标题翻译：围绕离子束的中心射线轨迹控制非对称静电透镜的方法和装置
公开(公告)号：US08519353B2
公开(公告)日：2013-08-27
申请号：US12981096
申请日：2010-12-29
申请人： Svetlana Radovanov , Peter L. Kellerman , Frank Sinclair , Robert C. Lindberg
发明人： Svetlana Radovanov , Peter L. Kellerman , Frank Sinclair , Robert C. Lindberg
IPC分类号： H01J1/88 , H01J3/18 , H01J3/38 , G21K1/06
CPC分类号： H01J37/12 , H01J37/15 , H01J37/3171 , H01J2237/121 , H01J2237/151
摘要： A method of controlling deflection of a charged particle beam in an electrostatic lens includes establishing a symmetrical electrostatic lens configuration comprising a plurality of electrodes disposed at unadjusted positions that are symmetric with respect to the central ray trajectory with applied unadjusted voltages that create fields symmetric with respect to the central ray trajectory. A symmetric electric field is calculated corresponding to the set of unadjusted voltages. A plurality of lower electrodes is arranged at adjusted positions that are asymmetric with respect to the central ray trajectory. A set of adjusted voltages is obtained for the plurality of lower electrodes, wherein the set of adjusted voltages corresponds to a set of respective potentials of the symmetric electric field at respective adjusted asymmetric positions. The adjusted voltages are applied to the asymmetric lens configuration when the charged particle beam passes therethrough.
摘要翻译：控制带电粒子束在静电透镜中的偏转的方法包括建立对称静电透镜配置，其包括设置在相对于中心射线轨迹对称的未调整位置的多个电极，其中施加的未调节电压产生对称的场到中心射线轨迹。对应于未调整电压组的对称电场。多个下电极被布置在相对于中心射线轨迹不对称的调整位置处。对于多个下电极获得一组调整的电压，其中所述一组调整的电压对应于在各自调整的非对称位置处的对称电场的各个电位的集合。当带电粒子束通过时，经调整的电压施加到非对称透镜构型。

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