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1. 发明申请

US20110291007A1 Movable Detector for Charged Particle Beam Inspection or Review 有权
标题翻译：用于带电粒子束检测或检查的可移动检测器
公开(公告)号：US20110291007A1
公开(公告)日：2011-12-01
申请号：US12787139
申请日：2010-05-25
申请人： YI-XIANG WANG , JOE WANG , XUEDONG LIU , ZHONGWEI CHEN
发明人： YI-XIANG WANG , JOE WANG , XUEDONG LIU , ZHONGWEI CHEN
IPC分类号： G01N23/22 , H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/024 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495 , H01J2237/2611 , H01J2237/2817
摘要： The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.
摘要翻译：本发明一般涉及带电粒子成像系统的检测单元。更具体地，检测单元的一部分可以作为所需的成像条件移入或移出检测系统。在Wein滤波器（也称为E×B带电粒子分析仪）和可移动检测器设计的帮助下，本发明提供了一种适用于低电流，高分辨率模式和高电流，高通量模式的立体成像系统。仅作为示例，本发明已经应用于扫描电子束检查系统。但是应当认识到，本发明可以应用于使用带电粒子束作为观测工具的其它系统。

2. 发明申请

US20110260055A1 Dynamic Focus Adjustment with Optical Height Detection Apparatus in Electron Beam system 有权
标题翻译：电子束系统中光学高度检测装置的动态聚焦调整
公开(公告)号：US20110260055A1
公开(公告)日：2011-10-27
申请号：US12764902
申请日：2010-04-21
申请人： JOE WANG , VAN-DUC NGUYEN , YI-XIANG WANG , JACK JAU , ZHONGWEI CHEN
发明人： JOE WANG , VAN-DUC NGUYEN , YI-XIANG WANG , JACK JAU , ZHONGWEI CHEN
IPC分类号： H01J37/21 , G01N23/22 , G01B11/24 , H01J37/28
CPC分类号： G01B11/22 , G01N23/04 , G01N23/20058 , G01N2223/32 , G01N2223/3301 , G01N2223/3302 , G01N2223/646 , H01J37/21 , H01J37/28 , H01J2237/216 , H01J2237/2482 , H01J2237/2487
摘要： The present invention generally relates to dynamic focus adjustment for an image system. With the assistance of a height detection sub-system, present invention provides an apparatus and methods for micro adjusting an image focusing according the specimen surface height variation by altering the field strength of an electrostatic lens between objective lens and sample stage/or a bias voltage applied to the sample surface. Merely by way of example, the invention has been applied to a scanning electron inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as observation tool with a height detection apparatus.
摘要翻译：本发明一般涉及图像系统的动态聚焦调整。本发明借助于高度检测子系统，提供了一种用于通过改变物镜和样品台之间的静电透镜的场强/或偏置电压来根据样本表面高度变化来微调整图像聚焦的装置和方法应用于样品表面。仅作为示例，本发明已经应用于扫描电子检查系统。但是应当认识到，本发明可以应用于使用带有带电粒子束的其它系统作为具有高度检测装置的观察工具。

3. 发明申请

US20120280125A1 CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND REVIEW 有权
标题翻译：充电颗粒系统用于反渗透/缺陷检测和检查
公开(公告)号：US20120280125A1
公开(公告)日：2012-11-08
申请号：US13463208
申请日：2012-05-03
申请人： CHIYAN KUAN , YI-XIANG WANG , CHUNG-SHIH PAN , ZHONGHUA DONG , ZHONGWEI CHEN
发明人： CHIYAN KUAN , YI-XIANG WANG , CHUNG-SHIH PAN , ZHONGHUA DONG , ZHONGWEI CHEN
IPC分类号： G01N23/225 , G21K5/10
CPC分类号： G01N23/2251 , G01N2223/307 , G01N2223/611
摘要： The present invention relates to a charged particle system for reticle or semiconductor wafer defects inspection and review, and more particularly, relates to an E-beam inspection tool for reticle or semiconductor wafer defects inspection and review without gravitational AMC settling. The charged particle system is an upside down electron beam inspection system with an electron beam aimed upward. The face down design may prevent AMC from gravitational settling on the inspected face of the specimen during inspection, thereafter having a cleaner result compared with conventional face-up inspection system.
摘要翻译：本发明涉及一种用于掩模版或半导体晶片缺陷检查和审查的带电粒子系统，更具体地涉及一种用于掩模版或半导体晶片缺陷检查和检查的电子束检查工具，而不引力AMC沉降。带电粒子系统是一个向上的电子束检查系统。面朝下设计可以防止AMC在检查期间在试样的被检查面上引力沉降，之后与常规的面朝上检查系统相比具有更清洁的结果。

4. 发明申请

US20120145898A1 PARTICLE DETECTION SYSTEM 有权
标题翻译：颗粒检测系统
公开(公告)号：US20120145898A1
公开(公告)日：2012-06-14
申请号：US12968229
申请日：2010-12-14
申请人： YI-XIANG WANG , JOE WANG , WEIMING REN
发明人： YI-XIANG WANG , JOE WANG , WEIMING REN
IPC分类号： G21K7/00 , H01J3/14
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24435 , H01J2237/2444 , H01J2237/2449
摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level. A condenser lens is configured to increase bandwidth of the detector that scan speed can be enhanced.
摘要翻译：本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。通过这样的设计，检测系统可以以超过小于安培（mA）的电平产生多达1010个增益和最大信号输出。配置聚光透镜以增加检测器的带宽，可以提高扫描速度。

5. 发明申请

US20110260069A1 PARTICLE DETECTION SYSTEM 有权
标题翻译：颗粒检测系统
公开(公告)号：US20110260069A1
公开(公告)日：2011-10-27
申请号：US12764890
申请日：2010-04-21
申请人： YI-XIANG WANG , JOE WANG
发明人： YI-XIANG WANG , JOE WANG
IPC分类号： G01T1/28 , G01T1/24
CPC分类号： H01J37/244 , H01J2237/2441 , H01J2237/2444 , H01J2237/2445 , H01J2237/2448 , H01J2237/2449
摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level.
摘要翻译：本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。通过这样的设计，检测系统可以以超过小于安培（mA）的电平产生多达1010个增益和最大信号输出。

6. 发明申请

US20110051306A1 WAFER GROUNDING AND BIASING METHOD, APPARATUS, AND APPLICATION 有权
标题翻译： WAFER接地和偏移方法，装置和应用
公开(公告)号：US20110051306A1
公开(公告)日：2011-03-03
申请号：US12552270
申请日：2009-09-01
申请人： YI-XIANG WANG , JUYING DOU , KENICHI KANAI
发明人： YI-XIANG WANG , JUYING DOU , KENICHI KANAI
IPC分类号： H05F3/00
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , H01J37/28 , H01J37/3174 , H01J2237/0044 , H01J2237/2008
摘要： A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A grounding pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the grounding pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.
摘要翻译：公开了适用于带电粒子束装置的晶片接地装置和方法。晶片基板由晶片支架支撑。接地销布置成与形成在晶片衬底的背面上的背面膜接触。接地脉冲发生器提供至少一个脉冲来驱动接地引脚，使得在背面薄膜处发生的电介质击穿导致建立通过背面薄膜的电流路径。因此，电流通过该电流路径流过晶片衬底，然后通过由晶片衬底和晶片座之间的电容耦合形成的至少一个电流返回路径流出晶片衬底。

7. 发明申请

US20100155596A1 METHOD AND SYSTEM FOR HEATING SUBSTRATE IN VACUUM ENVIRONMENT AND METHOD AND SYSTEM FOR IDENTIFYING DEFECTS ON SUBSTRATE 有权
标题翻译：用于加热真空环境中的基板的方法和系统以及用于识别基板上的缺陷的方法和系统
公开(公告)号：US20100155596A1
公开(公告)日：2010-06-24
申请号：US12339558
申请日：2008-12-19
申请人： HONG XIAO , YI-XIANG WANG
发明人： HONG XIAO , YI-XIANG WANG
IPC分类号： G01N23/00 , A21B1/00
CPC分类号： H05B3/0047 , G01N23/2202
摘要： A method for heating a substrate in a vacuum environment and a system therefor is provided. The system includes a chamber capable of holding the substrate located in the vacuum environment and a light source capable of projecting a light beam only on a portion of the substrate. The method includes the following steps. First, the substrate is placed in the vacuumed chamber. Thereafter, the light beam emitted from the light source is projected on the portion of the substrate, such that the portion is significantly heated before whole the substrate is heated. When the light beam is a charged particle beam projected by a charged particle beam assembly and projected on defects located on the substrate, the defects are capable of being identified by an examination result provided by an examination assembly after termination of light beam projection.
摘要翻译：提供一种在真空环境中加热基板的方法及其系统。该系统包括能够保持位于真空环境中的衬底的腔室和能够仅将光束投射到衬底的一部分上的光源。该方法包括以下步骤。首先，将基板放置在真空室中。此后，从光源发射的光束被投射在基板的部分上，使得该部分在整个基板被加热之前被显着地加热。当光束是由带电粒子束组件投射并投影在基板上的缺陷上的带电粒子束时，能够通过在光束投影终止之后由检查组件提供的检查结果来识别缺陷。

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