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1. 发明申请

US20110291007A1 Movable Detector for Charged Particle Beam Inspection or Review 有权
标题翻译：用于带电粒子束检测或检查的可移动检测器
公开(公告)号：US20110291007A1
公开(公告)日：2011-12-01
申请号：US12787139
申请日：2010-05-25
申请人： YI-XIANG WANG , JOE WANG , XUEDONG LIU , ZHONGWEI CHEN
发明人： YI-XIANG WANG , JOE WANG , XUEDONG LIU , ZHONGWEI CHEN
IPC分类号： G01N23/22 , H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/024 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495 , H01J2237/2611 , H01J2237/2817
摘要： The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.
摘要翻译：本发明一般涉及带电粒子成像系统的检测单元。更具体地，检测单元的一部分可以作为所需的成像条件移入或移出检测系统。在Wein滤波器（也称为E×B带电粒子分析仪）和可移动检测器设计的帮助下，本发明提供了一种适用于低电流，高分辨率模式和高电流，高通量模式的立体成像系统。仅作为示例，本发明已经应用于扫描电子束检查系统。但是应当认识到，本发明可以应用于使用带电粒子束作为观测工具的其它系统。

2. 发明申请

US20110260055A1 Dynamic Focus Adjustment with Optical Height Detection Apparatus in Electron Beam system 有权
标题翻译：电子束系统中光学高度检测装置的动态聚焦调整
公开(公告)号：US20110260055A1
公开(公告)日：2011-10-27
申请号：US12764902
申请日：2010-04-21
申请人： JOE WANG , VAN-DUC NGUYEN , YI-XIANG WANG , JACK JAU , ZHONGWEI CHEN
发明人： JOE WANG , VAN-DUC NGUYEN , YI-XIANG WANG , JACK JAU , ZHONGWEI CHEN
IPC分类号： H01J37/21 , G01N23/22 , G01B11/24 , H01J37/28
CPC分类号： G01B11/22 , G01N23/04 , G01N23/20058 , G01N2223/32 , G01N2223/3301 , G01N2223/3302 , G01N2223/646 , H01J37/21 , H01J37/28 , H01J2237/216 , H01J2237/2482 , H01J2237/2487
摘要： The present invention generally relates to dynamic focus adjustment for an image system. With the assistance of a height detection sub-system, present invention provides an apparatus and methods for micro adjusting an image focusing according the specimen surface height variation by altering the field strength of an electrostatic lens between objective lens and sample stage/or a bias voltage applied to the sample surface. Merely by way of example, the invention has been applied to a scanning electron inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as observation tool with a height detection apparatus.
摘要翻译：本发明一般涉及图像系统的动态聚焦调整。本发明借助于高度检测子系统，提供了一种用于通过改变物镜和样品台之间的静电透镜的场强/或偏置电压来根据样本表面高度变化来微调整图像聚焦的装置和方法应用于样品表面。仅作为示例，本发明已经应用于扫描电子检查系统。但是应当认识到，本发明可以应用于使用带有带电粒子束的其它系统作为具有高度检测装置的观察工具。

3. 发明申请

US20100140498A1 OPERATION STAGE FOR WAFER EDGE INSPECTION AND REVIEW 失效
标题翻译：水边检查和审查的操作阶段
公开(公告)号：US20100140498A1
公开(公告)日：2010-06-10
申请号：US12331336
申请日：2008-12-09
申请人： JACK JAU , HONG XIAO , JOE WANG , ZHONGWEI CHEN , YI XIANG WANG , EDWARD TSENG
发明人： JACK JAU , HONG XIAO , JOE WANG , ZHONGWEI CHEN , YI XIANG WANG , EDWARD TSENG
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/202 , H01J2237/2817 , H01L21/67288 , H01L21/6831
摘要： The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review. In order to keep the substrate in focus and avoid a large position shift during altering the substrate observation angle by rotation the pendulum stage, one embodiment of the present invention discloses a method such that the rotation axis of the pendulum stage consist of the tangent of upper edge of the substrate to be inspected. The electrostatic chuck of the present invention has a diameter smaller than which of the substrate to be inspected. During the inspection process the substrate on the electrostatic chuck may be rotated about the central axis on the electrostatic chuck to a desired position, this design insures all position on the bevel and apex are able to be inspected.
摘要翻译：本发明涉及用于基板（晶片）边缘和背面缺陷检查或缺陷检查的扫描电子显微镜中的带电粒子束装置的操作阶段。然而，应当认识到，本发明具有更广泛的应用范围。根据本发明的系统和方法提供了用于衬底边缘检查或审查的操作阶段。检查区域包括顶部近边缘，斜面，顶点和底部斜面。操作台包括支撑台，z台，X-Y台，静电卡盘，摆台和旋转轨道。具有静电卡盘的摆台安装具有从0°摆动到180°的能力，同时执行基板顶部斜面，顶部和底部斜面检查或检查。为了将基板保持在对焦状态，并且通过旋转摆锤台来改变基板观察角度而避免大的位置偏移，本发明的一个实施例公开了一种方法，使得摆台的旋转轴线由上部的切线要检查的基板的边缘。本发明的静电卡盘的直径小于要检查的基板的直径。在检查过程中，静电卡盘上的基板可以围绕静电卡盘上的中心轴线旋转到期望的位置，该设计确保能够检查斜面上的所有位置和顶点。

4. 发明申请

US20100102227A1 ELECTRON BEAM APPARATUS 有权
标题翻译：电子束设备
公开(公告)号：US20100102227A1
公开(公告)日：2010-04-29
申请号：US12257304
申请日：2008-10-23
申请人： ZHONGWEI CHEN , WEIMING REN , JOE WANG , XUEDONG LIU , JUYING DOU , FUMIN HE , FENG CAO , YAN REN , XIAOLI GUO , WEI HE , QINGPO XI
发明人： ZHONGWEI CHEN , WEIMING REN , JOE WANG , XUEDONG LIU , JUYING DOU , FUMIN HE , FENG CAO , YAN REN , XIAOLI GUO , WEI HE , QINGPO XI
IPC分类号： G01N23/00 , H01J3/20
CPC分类号： H01J37/073 , H01J37/244 , H01J37/28 , H01J2237/06341 , H01J2237/24592
摘要： The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review.The present invent provides solution of improving imaging resolution by utilizing a field emission cathode tip with a large tip radius, applying a large accelerating voltage across ground potential between the cathode and anode, positioning the beam limit aperture before condenser lens, utilizing condenser lens excitation current to optimize image resolution, applying a high tube bias to shorten electron travel time, adopting and modifying SORIL objective lens to ameliorate aberration at large field of view and under electric drifting and reduce the urgency of water cooling objective lens while operating material analysis.The present invent provides solution of improving throughput by utilizing fast scanning ability of SORIL and providing a large voltage difference between sample and detectors.
摘要翻译：本发明涉及采用扫描电子显微镜进行样品检查和缺陷检查的带电粒子束装置。本发明提供了通过利用具有大的尖端半径的场致发射阴极尖端来提高成像分辨率的解决方案，在阴极和阳极之间的地电位上施加大的加速电压，将光束极限孔定位在聚光透镜之前，利用聚光透镜激发电流优化图像分辨率，应用高管偏压缩短电子行进时间，采用和修正SORIL物镜，以改善大视野和电漂移下的像差，并减少水冷物镜在操作材料分析时的紧迫性。本发明提供了通过利用SORIL的快速扫描能力并在样品和检测器之间提供大的电压差来提高产量的解决方案。

5. 发明申请

US20120280125A1 CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND REVIEW 有权
标题翻译：充电颗粒系统用于反渗透/缺陷检测和检查
公开(公告)号：US20120280125A1
公开(公告)日：2012-11-08
申请号：US13463208
申请日：2012-05-03
申请人： CHIYAN KUAN , YI-XIANG WANG , CHUNG-SHIH PAN , ZHONGHUA DONG , ZHONGWEI CHEN
发明人： CHIYAN KUAN , YI-XIANG WANG , CHUNG-SHIH PAN , ZHONGHUA DONG , ZHONGWEI CHEN
IPC分类号： G01N23/225 , G21K5/10
CPC分类号： G01N23/2251 , G01N2223/307 , G01N2223/611
摘要： The present invention relates to a charged particle system for reticle or semiconductor wafer defects inspection and review, and more particularly, relates to an E-beam inspection tool for reticle or semiconductor wafer defects inspection and review without gravitational AMC settling. The charged particle system is an upside down electron beam inspection system with an electron beam aimed upward. The face down design may prevent AMC from gravitational settling on the inspected face of the specimen during inspection, thereafter having a cleaner result compared with conventional face-up inspection system.
摘要翻译：本发明涉及一种用于掩模版或半导体晶片缺陷检查和审查的带电粒子系统，更具体地涉及一种用于掩模版或半导体晶片缺陷检查和检查的电子束检查工具，而不引力AMC沉降。带电粒子系统是一个向上的电子束检查系统。面朝下设计可以防止AMC在检查期间在试样的被检查面上引力沉降，之后与常规的面朝上检查系统相比具有更清洁的结果。

6. 发明申请

US20090121159A1 CLUSTER E-BEAM LITHOGRAPHY SYSTEM 审中-公开
标题翻译：集群电子束光刻系统
公开(公告)号：US20090121159A1
公开(公告)日：2009-05-14
申请号：US12259280
申请日：2008-10-27
申请人： ARCHI HWANG , YI XIANG WANG , JACK JAU , CHUNG-SHIH PAN , ZHONGWEI CHEN
发明人： ARCHI HWANG , YI XIANG WANG , JACK JAU , CHUNG-SHIH PAN , ZHONGWEI CHEN
IPC分类号： A61N5/00
CPC分类号： G03F7/7045
摘要： A hybrid lithography system is disclosed to achieve high throughput and high resolution of sub 32 nm lithography. The hybrid system contains an optical lithographer for expose pattern area where features above 32 nm, and a cluster e-beam lithography system for expose pattern area where features is sub 32 nm.
摘要翻译：公开了一种混合光刻系统，以实现32nm光刻的高通量和高分辨率。混合系统包含用于32nm以上特征的曝光图案区域的光学平版印刷机，以及用于曝光图案区域的簇电子束光刻系统，其特征在32nm以下。

7. 发明申请

US20110139996A1 MULTI-AXIS MAGNETIC LENS 有权
标题翻译：多轴磁性镜片
公开(公告)号：US20110139996A1
公开(公告)日：2011-06-16
申请号：US12636007
申请日：2009-12-11
申请人： ZHONGWEI CHEN , WEIMING REN , KENICHI KANAI , XUEDONG LIU
发明人： ZHONGWEI CHEN , WEIMING REN , KENICHI KANAI , XUEDONG LIU
IPC分类号： H01J1/50
CPC分类号： H01J37/141 , H01J2237/1405
摘要： The present invention relates to a multi-axis magnetic lens for a charged particle beam system. The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the desired axisymmetric field for focusing each particle beam employed within the system.
摘要翻译：本发明涉及带电粒子束系统的多轴磁透镜。该装置从由公共的励磁线圈产生的磁场中消除不期望的非轴对称的横向磁场分量，并且留下用于聚焦在系统内采用的每个粒子束的期望的轴对称场。

8. 发明申请

US20120145917A1 APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC LENS 有权
公开(公告)号：US20120145917A1
公开(公告)日：2012-06-14
申请号：US12968221
申请日：2010-12-14
申请人： ZHONGWEI CHEN , WEIMING REN , KENICHI KANAI , XUEDONG LIU
发明人： ZHONGWEI CHEN , WEIMING REN , KENICHI KANAI , XUEDONG LIU
IPC分类号： H01J3/32
CPC分类号： H01J37/141 , H01J37/28 , H01J2237/1035 , H01J2237/1415 , H01J2237/1534
摘要： An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens. In the apparatus, some additional magnetic shielding measures such as magnetic shielding tubes, plates and house are used to eliminate the non-axisymmetric transverse field on the charged particle path from each charged particle source to the entrance of each sub-lens and from the exit of each sub-lens to the sample surface.

9. 发明申请

US20120145900A1 APPARATUS OF PLURAL CHARGED PARTICLE BEAMS WITH MULTI-AXIS MAGNETIC LENS 有权
标题翻译：具有多轴磁镜的多重充电粒子的装置
公开(公告)号：US20120145900A1
公开(公告)日：2012-06-14
申请号：US12968201
申请日：2010-12-14
申请人： ZHONGWEI CHEN , WEIMING REN , KENICHI KANAI , XUEDONG LIU
发明人： ZHONGWEI CHEN , WEIMING REN , KENICHI KANAI , XUEDONG LIU
IPC分类号： G01N23/04
CPC分类号： G01N23/2251 , G01N2223/6116 , G01N2223/646 , H01J37/141 , H01J2237/2817
摘要： An apparatus basically uses a simple and compact multi-axis magnetic lens to focus each of a plurality of charged particle beams on sample surface at the same time. In each sub-lens module of the multi-axis magnetic lens, two magnetic rings are respectively inserted into upper and lower holes with non-magnetic radial gap. Each gap size is small enough to keep a sufficient magnetic coupling and large enough to get a sufficient axial symmetry of magnetic scale potential distribution in the space near to its optical axis. This method eliminates the non-axisymmetric transverse field in each sub-lens and the round lens field difference among all sub-lenses at the same time; both exist inherently in a conventional multi-axis magnetic lens. In the apparatus, some additional magnetic shielding measures such as magnetic shielding tubes, plates and house are used to eliminate the non-axisymmetric transverse field on the charged particle path from each charged particle source to the entrance of each sub-lens and from the exit of each sub-lens to the sample surface.
摘要翻译：设备基本上使用简单紧凑的多轴磁性透镜来同时将多个带电粒子束中的每一个聚焦在样品表面上。在多轴磁性透镜的每个子透镜模块中，两个磁环分别插入具有非磁性径向间隙的上孔和下孔中。每个间隙尺寸足够小以保持足够的磁耦合并且足够大以在靠近其光轴的空间中获得足够的磁标势电位分布的轴向对称性。该方法同时消除了每个子透镜中的非轴对称横向场和所有子透镜之间的圆透镜场差; 都存在于传统的多轴磁性透镜中。在该装置中，使用一些额外的磁屏蔽措施，例如磁屏蔽管，板和房子来消除带电粒子路径上从每个带电粒子源到每个子透镜的入口和从出口的入口处的非轴对称横向场每个子透镜到样品表面。

10. 发明申请

US20110192975A1 SELECTABLE COULOMB APERTURE IN E-BEAM SYSTEM 有权
标题翻译：电子束系统中可选择的COULOMB孔
公开(公告)号：US20110192975A1
公开(公告)日：2011-08-11
申请号：US13012710
申请日：2011-01-24
申请人： ZHONGWEI CHEN
发明人： ZHONGWEI CHEN
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/09 , H01J37/15 , H01J2237/0453 , H01J2237/0458
摘要： A selectable Coulomb aperture in charged particle system comprises a non-magnetic conductive plate with a plurality of holes therein. The plurality of holes has variant sizes or diameters to select different beam currents of primary beam in the charged particle system. The charged particle system may include a charged particle source for emitting a primary beam, a condenser lens for receiving the primary beam and condensing the primary beam, an objective lens for receiving the primary beam and focusing the primary beam on a surface of a specimen. The selectable Coulomb aperture is positioned between the charged particle source and the condenser lens.
摘要翻译：带电粒子系统中的可选择的库仑孔径包括其中具有多个孔的非磁性导电板。多个孔具有不同的尺寸或直径，以在带电粒子系统中选择主波束的不同束流。带电粒子系统可以包括用于发射主光束的带电粒子源，用于接收主光束并聚光主光束的聚光透镜，用于接收主光束并将主光束聚焦在样本表面上的物镜。可选择的库仑孔位于带电粒子源和聚光透镜之间。

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