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1. 发明授权

US08552377B2 Particle detection system 有权
公开(公告)号：US08552377B2
公开(公告)日：2013-10-08
申请号：US12968229
申请日：2010-12-14
申请人： Yi-Xiang Wang , Joe Wang , Weiming Ren
发明人： Yi-Xiang Wang , Joe Wang , Weiming Ren
IPC分类号： H01J43/02 , H01J43/14
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24435 , H01J2237/2444 , H01J2237/2449
摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level. A condenser lens is configured to increase bandwidth of the detector that scan speed can be enhanced.

2. 发明授权

US08094924B2 E-beam defect review system 有权
标题翻译：电子束缺陷检查系统
公开(公告)号：US08094924B2
公开(公告)日：2012-01-10
申请号：US12335458
申请日：2008-12-15
申请人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
发明人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N23/04 , G01N2223/102 , G01N2223/426 , G01N2223/611 , G06T2207/10061 , G06T2207/30148
摘要： An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus; and a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam. The modified SORIL column further includes a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.
摘要翻译：一种装置包括成像单元以对待审查的晶片进行成像，其中成像单元是经修改的SORIL柱。改进的SORIL柱包括由于晶片表面拓扑而进行微聚焦的聚焦子系统，其中聚焦子系统验证从晶片表面反射的光栅图像的位置以调整焦点; 以及表面电荷控制，用于调节在复查过程期间由于电子辐射引起的电荷累积，其中气体分子在洪水枪光束下而不是在主光束下方注入。改进的SORIL列还包括用于存储晶片设计数据库的存储单元; 以及用于管理缺陷定位，缺陷采样和缺陷分类的主计算机，其中主计算机和存储单元通过高速网络链接。

3. 发明授权

US08624186B2 Movable detector for charged particle beam inspection or review 有权
标题翻译：用于带电粒子束检测或检查的可移动检测器
公开(公告)号：US08624186B2
公开(公告)日：2014-01-07
申请号：US12787139
申请日：2010-05-25
申请人： Yi-Xiang Wang , Joe Wang , Xuedong Liu , Zhongwei Chen
发明人： Yi-Xiang Wang , Joe Wang , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/024 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495 , H01J2237/2611 , H01J2237/2817
摘要： The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.
摘要翻译：本发明一般涉及带电粒子成像系统的检测单元。更具体地，检测单元的一部分可以作为所需的成像条件移入或移出检测系统。在Wein滤波器（也称为E×B带电粒子分析仪）和可移动检测器设计的帮助下，本发明提供了一种适用于低电流，高分辨率模式和高电流，高通量模式的立体成像系统。仅作为示例，本发明已经应用于扫描电子束检查系统。但是应当认识到，本发明可以应用于使用带电粒子束作为观测工具的其它系统。

4. 发明授权

US07919760B2 Operation stage for wafer edge inspection and review 失效
标题翻译：晶圆边缘检查和检查的操作阶段
公开(公告)号：US07919760B2
公开(公告)日：2011-04-05
申请号：US12331336
申请日：2008-12-09
申请人： Jack Jau , Hong Xiao , Joe Wang , Zhongwei Chen , Yi Xiang Wang , Edward Tseng
发明人： Jack Jau , Hong Xiao , Joe Wang , Zhongwei Chen , Yi Xiang Wang , Edward Tseng
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/20 , H01J2237/202 , H01J2237/2817 , H01L21/67288 , H01L21/6831
摘要： The present invention relates to an operation stage of a charged particle beam apparatus which is employed in a scanning electron microscope for substrate (wafer) edge and backside defect inspection or defect review. However, it would be recognized that the invention has a much broader range of applicability. A system and method in accordance with the present invention provides an operation stage for substrate edge inspection or review. The inspection region includes top near edge, to bevel, apex, and bottom bevel. The operation stage includes a supporting stand, a z-stage, an X-Y stage, an electrostatic chuck, a pendulum stage and a rotation track. The pendulum stage mount with the electrostatic chuck has the ability to swing from 0° to 180° while performing substrate top bevel, apex and bottom bevel inspection or review. In order to keep the substrate in focus and avoid a large position shift during altering the substrate observation angle by rotation the pendulum stage, one embodiment of the present invention discloses a method such that the rotation axis of the pendulum stage consist of the tangent of upper edge of the substrate to be inspected. The electrostatic chuck of the present invention has a diameter smaller than which of the substrate to be inspected. During the inspection process the substrate on the electrostatic chuck may be rotated about the central axis on the electrostatic chuck to a desired position, this design insures all position on the bevel and apex are able to be inspected.
摘要翻译：本发明涉及用于基板（晶片）边缘和背面缺陷检查或缺陷检查的扫描电子显微镜中的带电粒子束装置的操作阶段。然而，应当认识到，本发明具有更广泛的应用范围。根据本发明的系统和方法提供了用于衬底边缘检查或审查的操作阶段。检查区域包括顶部近边缘，斜面，顶点和底部斜面。操作台包括支撑台，z台，X-Y台，静电卡盘，摆台和旋转轨道。具有静电卡盘的摆台安装具有从0°摆动到180°的能力，同时执行基板顶部斜面，顶部和底部斜面检查或检查。为了将基板保持在对焦状态，并且通过旋转摆锤台来改变基板观察角度而避免大的位置偏移，本发明的一个实施例公开了一种方法，使得摆台的旋转轴线由上部的切线要检查的基板的边缘。本发明的静电卡盘的直径小于要检查的基板的直径。在检查过程中，静电卡盘上的基板可以围绕静电卡盘上的中心轴线旋转到期望的位置，该设计确保能够检查斜面上的所有位置和顶点。

5. 发明授权

US08237125B2 Particle detection system 有权
标题翻译：粒子检测系统
公开(公告)号：US08237125B2
公开(公告)日：2012-08-07
申请号：US12764890
申请日：2010-04-21
申请人： Yi-Xiang Wang , Joe Wang
发明人： Yi-Xiang Wang , Joe Wang
IPC分类号： G01T1/28
CPC分类号： H01J37/244 , H01J2237/2441 , H01J2237/2444 , H01J2237/2445 , H01J2237/2448 , H01J2237/2449
摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level.
摘要翻译：本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。通过这样的设计，检测系统可以以超过小于安培（mA）的电平产生多达1010个增益和最大信号输出。

6. 发明授权

US08791414B2 Dynamic focus adjustment with optical height detection apparatus in electron beam system 有权
标题翻译：电子束系统中光学高度检测装置的动态聚焦调整
公开(公告)号：US08791414B2
公开(公告)日：2014-07-29
申请号：US12764902
申请日：2010-04-21
申请人： Joe Wang , Van-Duc Nguyen , Yi-Xiang Wang , Jack Jau , Zhongwei Chen
发明人： Joe Wang , Van-Duc Nguyen , Yi-Xiang Wang , Jack Jau , Zhongwei Chen
IPC分类号： G01N23/00
CPC分类号： G01B11/22 , G01N23/04 , G01N23/20058 , G01N2223/32 , G01N2223/3301 , G01N2223/3302 , G01N2223/646 , H01J37/21 , H01J37/28 , H01J2237/216 , H01J2237/2482 , H01J2237/2487
摘要： The present invention generally relates to dynamic focus adjustment for an image system. With the assistance of a height detection sub-system, present invention provides an apparatus and methods for micro adjusting an image focusing according the specimen surface height variation by altering the field strength of an electrostatic lens between objective lens and sample stage/or a bias voltage applied to the sample surface. Merely by way of example, the invention has been applied to a scanning electron inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as observation tool with a height detection apparatus.
摘要翻译：本发明一般涉及图像系统的动态聚焦调整。本发明借助于高度检测子系统，提供了一种用于通过改变物镜和样品台之间的静电透镜的场强/或偏置电压来根据样本表面高度变化来微调整图像聚焦的装置和方法应用于样品表面。仅作为示例，本发明已经应用于扫描电子检查系统。但是应当认识到，本发明可以应用于使用带有带电粒子束的其它系统作为具有高度检测装置的观察工具。

7. 发明授权

US07960697B2 Electron beam apparatus 有权
标题翻译：电子束装置
公开(公告)号：US07960697B2
公开(公告)日：2011-06-14
申请号：US12257304
申请日：2008-10-23
申请人： Zhongwei Chen , Weiming Ren , Joe Wang , Xuedong Liu , Juying Dou , Fumin He , Feng Cao , Yan Ren , Xiaoli Guo , Wei He , Qingpo Xi
发明人： Zhongwei Chen , Weiming Ren , Joe Wang , Xuedong Liu , Juying Dou , Fumin He , Feng Cao , Yan Ren , Xiaoli Guo , Wei He , Qingpo Xi
IPC分类号： H01J49/44
CPC分类号： H01J37/073 , H01J37/244 , H01J37/28 , H01J2237/06341 , H01J2237/24592
摘要： The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review.The present invent provides solution of improving imaging resolution by utilizing a field emission cathode tip with a large tip radius, applying a large accelerating voltage across ground potential between the cathode and anode, positioning the beam limit aperture before condenser lens, utilizing condenser lens excitation current to optimize image resolution, applying a high tube bias to shorten electron travel time, adopting and modifying SORIL objective lens to ameliorate aberration at large field of view and under electric drifting and reduce the urgency of water cooling objective lens while operating material analysis.The present invent provides solution of improving throughput by utilizing fast scanning ability of SORIL and providing a large voltage difference between sample and detectors.
摘要翻译：本发明涉及采用扫描电子显微镜进行样品检查和缺陷检查的带电粒子束装置。本发明提供了通过利用具有大的尖端半径的场致发射阴极尖端来提高成像分辨率的解决方案，在阴极和阳极之间的地电位上施加大的加速电压，将光束极限孔定位在聚光透镜之前，利用聚光透镜激发电流优化图像分辨率，应用高管偏压缩短电子行进时间，采用和修正SORIL物镜，以改善大视野和电漂移下的像差，并减少水冷物镜在操作材料分析时的紧迫性。本发明提供了通过利用SORIL的快速扫描能力并在样品和检测器之间提供大的电压差来提高产量的解决方案。

8. 发明授权

US07629327B2 Chlamydia 60 Kda CRMP antigens and vaccine uses 失效
标题翻译：衣原体60 Kda CRMP抗原和疫苗用途
公开(公告)号：US07629327B2
公开(公告)日：2009-12-08
申请号：US11898220
申请日：2007-09-11
申请人： Andrew D. Murdin , Raymond P. Oomen , Joe Wang , Pamela Dunn
发明人： Andrew D. Murdin , Raymond P. Oomen , Joe Wang , Pamela Dunn
IPC分类号： A61K31/70
CPC分类号： A61K31/711 , A61K39/118 , A61K2039/53 , C07K14/295 , Y10S435/975
摘要： The present invention provides vaccines and methods for immunizing a host, including humans, against disease caused by infection by a strain of Chlamydia, specifically C. pneumoniae. The vaccine and method employ a 60 kDa cysteine-rich membrane protein of a strain of Chlamydia pneumoniae. Modifications are possible within the scope of this invention.
摘要翻译：本发明提供用于免疫宿主（包括人）免疫衣原体特异性肺炎衣原体感染引起的疾病的疫苗和方法。疫苗和方法使用肺炎衣原体菌株的60kDa富含半胱氨酸的膜蛋白。在本发明的范围内可以进行修改。

9. 发明授权

US07553493B2 Chlamydia flagellar protein antigen 有权
标题翻译：衣原体鞭毛蛋白抗原
公开(公告)号：US07553493B2
公开(公告)日：2009-06-30
申请号：US11905430
申请日：2007-10-01
申请人： Andrew D. Murdin , Raymond P. Oomen , Joe Wang
发明人： Andrew D. Murdin , Raymond P. Oomen , Joe Wang
IPC分类号： A61K39/118 , A61K39/02 , C12P21/04 , C12P21/06 , C07H21/04
CPC分类号： G01N33/56927 , A61K39/00 , C07K14/295 , C07K2319/00 , Y02A50/472 , Y02A50/476
摘要： The present invention provides purified and isolated polynucleotide molecules that encode Chlamydia polypeptides which can be used in methods to prevent, treat, and diagnose Chlamydia infection. In one form of the invention, the polynucleotide molecules encode polypeptides CPN100988 RY-68 (SEQ ID Nos:13 and 26).
摘要翻译：本发明提供了编码衣原体多肽的纯化和分离的多核苷酸分子，其可用于预防，治疗和诊断衣原体感染的方法。在本发明的一种形式中，多核苷酸分子编码多肽CPN100988 RY-68（SEQ ID NO：13和26）。

10. 发明授权

US07509821B1 Yarn measuring device for flat bed knitting machines 失效
标题翻译：平床针织机用纱线测量装置
公开(公告)号：US07509821B1
公开(公告)日：2009-03-31
申请号：US12122958
申请日：2008-05-19
申请人： Yu-Sheng Lin , Joe Wang
发明人： Yu-Sheng Lin , Joe Wang
IPC分类号： D04B15/48
CPC分类号： D04B35/12
摘要： A yarn measuring device for a flat bed knitting machine which has a chassis, a needle bed, a track and a carriage. The carriage has a cam controller and a mask plate. The yarn measuring device includes a counter, a detection unit and a programmable logic circuit controller. The programmable logic circuit controller, the counter, the detection unit, the carriage and the cam controller are electrically interconnected. Knitting stitches can be measured in a bidirectional fashion. Measuring accuracy improves, measured value can be read directly and easier, and the position of cams can be adjusted quickly. Total yarn requirement can be calculated accurately, fabric quality can be improved and production efficiency can be enhanced.
摘要翻译：一种用于平床机的纱线测量装置，其具有底盘，针床，轨道和托架。滑架具有凸轮控制器和掩模板。纱线测量装置包括计数器，检测单元和可编程逻辑电路控制器。可编程逻辑电路控制器，计数器，检测单元，托架和凸轮控制器电互连。针织针脚可以双向测量。测量精度提高，测量值可以直接读取更容易，凸轮位置可以快速调整。可以准确计算总纱需求量，提高织物质量，提高生产效率。

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